Base proliferating agent, and base-reactive resin composition containing said base proliferating agent
US-11905361-B2 · Feb 20, 2024 · US
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TERADA Kiwamu patents
TERADA Kiwamu is listed as an inventor on 13 patents in our database. Major assignees and classification codes are summarized below.
| Metric | Value |
|---|---|
| Inventor | TERADA Kiwamu |
| Total patents | 13 |
| First publication | Oct 12, 2017 |
| Latest publication | Feb 20, 2024 |
Notable patents
Publications ranked by popularity score, then publication date.
Compound, photopolymerization initiator containing said compound, and photosensitive resin composition containing said photopolymerization initiator
US-11608316-B2 · Mar 21, 2023 · US
Base Proliferating Agent, and Base-Reactive Resin Composition Containing Said Base Proliferating Agent
US-2022332886-A1 · Oct 20, 2022 · US
Compound, photopolymerization initiator containing said compound, and photosensitive resin composition containing said photopolymerization initiator
US-11414382-B2 · Aug 16, 2022 · US
Base proliferating agent, and base-reactive resin composition containing said base proliferating agent
US-11401370-B2 · Aug 2, 2022 · US
Photosensitive Resin Composition
US-2021292472-A1 · Sep 23, 2021 · US
Compound, Photopolymerization Initiator Containing Said Compound, and Photosensitive Resin Composition Containing Said Photopolymerization Initiator
US-2021002216-A1 · Jan 7, 2021 · US
Base Proliferating Agent, and Base-Reactive Resin Composition Containing Said Base Proliferating Agent
US-2020407487-A1 · Dec 31, 2020 · US
Compound, Photopolymerization Initiator Containing Said Compound, and Photosensitive Resin Composition Containing Said Photopolymerization Initiator
US-2020392079-A1 · Dec 17, 2020 · US
Compound, photopolymerization initiator comprising said compound, and photosensitive resin composition containing said photopolymerization initiator
US-10508078-B2 · Dec 17, 2019 · US
Recent patents
Latest publications not already listed above.
Photosensitive resin composition and cured product thereof
US-10197913-B2 · Feb 5, 2019 · US
Novel compound, photopolymerization initiator comprising said compound, and photosensitive resin composition containing said photopolymerization initiator
US-2018370908-A1 · Dec 27, 2018 · US
Photosensitive resin composition and cured product thereof
US-2017293225-A1 · Oct 12, 2017 · US
Major assignees
Companies most often associated with this inventor's publications.
| Assignee | Patents |
|---|---|
| Nippon Kayaku Kk | 13 |
| Univ Tokyo Science Found | 4 |
Top CPC classifications
Most common classification codes across this inventor's patents.
| CPC | Patents |
|---|---|
| G03F7/038 | 10 |
| G03F7/0045 | 9 |
| G03F7/004 | 9 |
| C08F2/50 | 6 |
| C07D213/75 | 6 |