Photosensitive Resin Composition

Patent metadata

Field	Value
Publication number	US-2021292472-A1
Application number	US-201917257621-A
Country	US
Kind code	A1
Filing date	Jul 2, 2019
Priority date	Jul 5, 2018
Publication date	Sep 23, 2021
Grant date	—

Abstract

A novel compound which absorbs long-wavelength active energy rays and generates with high-efficiency radicals and strong bases, and which has excellent reaction efficiency in a base generating chain reaction; a photopolymerization initiator which contains said compound; and a photosensitive resin composition which contains said photopolymerization initiator are provided, where the novel compound is represented by formula (1), where, in formula (1), R1, R2, R3, R5 and R6 independently represent a hydroxyl group, an alkoxy group, or an organic group other than those substituents, the R4's independently represent an organic group including a thioether bond, ‘A’ represents a substituent represented by formula (1-1) or (1-2), where, in formula (1-1), R7 and R8 independently represent a hydrogen atom, an alkyl group or a heterocyclic group, and where, in formula (1-2), R9 and R10 independently represent an amino group or a substituted amino group.

First claim

1 - 6 . (canceled)

7 . A resin composition comprising (A) a photobase generator containing a compound represented by a following chemical formula (1):

wherein in formula (1), R 1 represents a hydrogen atom, a hydroxy group, an alkoxy group or an organic group other than the aforementioned substituents; R 2 , R 3 , R 5 and R 6 each independently represent a hydrogen atom, halogen atom, hydroxy group, alkoxy group, mercapto group, sulfide group, silyl group, silanol group, nitro group, nitroso group, cyano group, sulfino group, sulfo group, sulfonato group, phosphino group, phosphinyl group, phosphono group, phosphonato group, amino group, ammonio group or an organic group other than the aforementioned substituents, each of R 2 , R 3 , R 5 and R 6 plurally existing may be the same or different from each other; R 2 and R 3 on the same benzene ring may be connected to form a ring structure and R 5 and R 6 on the same benzene ring may be connected to form a ring structure; R 4 each independently represents a hydrogen atom or an organic group having a thioether bond, and at least one of R 4 is the organic group having a thioether bond; the organic group having a thioether bond represented by R 4 and R 3 or R 5 may be connected to form a ring structure; A is a substituent having a formula (1-1):

wherein in formula (1-1), R 7 and R 8 each independently represent a hydrogen atom or a linear or a branched alkyl group having a carbon number of 2 to 6 or a heterocyclic group, or R 7 and R 8 may be connected to form a heterocyclic structure, (B) an alkali developable resin, and (C) a thermally reactive compound.

8 . The resin composition according to claim 7 , wherein the resin composition can provide negative pattern formed by conducting alkali-developing after selective irradiation of the light and subsequent heating to the resin composition to provide addition reaction of (B) the alkali developable resin with (C) the thermally reactive compound.

9 . A dry film obtained from the resin composition according to claim 7 .

10 . A cured product of the resin composition according to claim 7 .

11 . A cured product of the dry film according to claim 9 .

12 . A printed wiring board comprising the cured product according to claim 10 .

13 . The resin composition according to claim 7 , wherein in (A) the photobase generator containing the compound represented by the formula (1), R 7 and R 8 of the formula (1-1) each independently represent a hydrogen atom, ethyl group or heterocyclic group, or R 7 and R 8 may be connected to form a heterocyclic structure.

Assignees

• Nippon Kayaku Kk

Inventors

• TERADA Kiwamu
• Kuwabara Hirokazu

Classifications

• H05K3/287

  Photosensitive compositions · CPC title

• C08L33/068

  containing glycidyl groups · CPC title

• C09D4/00

  Coating compositions, e.g. paints, varnishes or lacquers, based on organic non-macromolecular compounds having at least one polymerisable carbon-to-carbon unsaturated bond {; Coating compositions, based on monomers of macromolecular compounds of groups C09D183/00 - C09D183/16} · CPC title

• C08G59/245 Primary

  aromatic · CPC title

• G03F7/0382

  the macromolecular compound being present in a chemically amplified negative photoresist composition · CPC title