Extreme ultraviolet source temperature monitoring using confocal sensor
US-12572066-B2 · Mar 10, 2026 · US
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Tae Patrick patents
Tae Patrick is listed as an inventor on 29 patents in our database. Major assignees and classification codes are summarized below.
| Metric | Value |
|---|---|
| Inventor | Tae Patrick |
| Total patents | 29 |
| First publication | Feb 4, 2021 |
| Latest publication | Mar 10, 2026 |
Notable patents
Publications ranked by popularity score, then publication date.
Process characterization and correction using optical wall process sensor (OWPS)
US-12469686-B2 · Nov 11, 2025 · US
Transmission corrected plasma emission using in-situ optical reflectometry
US-12442765-B2 · Oct 14, 2025 · US
Smart camera substrate
US-12432461-B2 · Sep 30, 2025 · US
Confocal chromatic metrology for EUV source condition monitoring
US-12418972-B2 · Sep 16, 2025 · US
Transmission corrected plasma emission using in-situ optical reflectometry
US-2024361239-A1 · Oct 31, 2024 · US
Smart camera substrate
US-2024365013-A1 · Oct 31, 2024 · US
Differential capacitive sensor for in-situ film thickness and dielectric constant measurement
US-12123090-B2 · Oct 22, 2024 · US
Smart camera substrate
US-12114083-B2 · Oct 8, 2024 · US
Thin film, in-situ measurement through transparent crystal and transparent substrate within processing chamber wall
US-2024290592-A1 · Aug 29, 2024 · US
Recent patents
Latest publications not already listed above.
Transmission corrected plasma emission using in-situ optical reflectometry
US-12031910-B2 · Jul 9, 2024 · US
Extreme ultraviolet source temperature monitoring using confocal sensor
US-2024201581-A1 · Jun 20, 2024 · US
Thin film, in-situ measurement through transparent crystal and transparent substrate within processing chamber wall
US-12009191-B2 · Jun 11, 2024 · US
Processing chamber condition and process state monitoring using optical reflector attached to processing chamber liner
US-12000041-B2 · Jun 4, 2024 · US
Confocal Chromatic Metrology for EUV Source Condition Monitoring
US-2024090110-A1 · Mar 14, 2024 · US
Differential capacitive sensor for in-situ film thickness and dielectric constant measurement
US-2024002999-A1 · Jan 4, 2024 · US
Smart camera substrate
US-2023345137-A1 · Oct 26, 2023 · US
Differential capacitive sensors for in-situ film thickness and dielectric constant measurement
US-11781214-B2 · Oct 10, 2023 · US
Processing chamber condition and process state monitoring using optical reflector attached to processing chamber liner
US-2023304150-A1 · Sep 28, 2023 · US
Process characterization and correction using optical wall process sensor (owps)
US-2023298872-A1 · Sep 21, 2023 · US
Smart camera substrate
US-11736818-B2 · Aug 22, 2023 · US
Processing chamber condition and process state monitoring using optical reflector attached to processing chamber liner
US-11708635-B2 · Jul 25, 2023 · US
Transmission corrected plasma emission using in-situ optical reflectometry
US-2023078567-A1 · Mar 16, 2023 · US
Smart camera substrate
US-2022272278-A1 · Aug 25, 2022 · US
Smart camera substrate
US-11284018-B1 · Mar 22, 2022 · US
Smart camera substrate
US-2022086364-A1 · Mar 17, 2022 · US
Thin film, in-situ measurement through transparent crystal and transparent substrate within processing chamber wall
US-2021391157-A1 · Dec 16, 2021 · US
Processing chamber condition and process state monitoring using optical reflector attached to processing chamber liner
US-2021388494-A1 · Dec 16, 2021 · US
Differential capacitive sensors for in-situ film thickness and dielectric constant measurement
US-2021033557-A1 · Feb 4, 2021 · US
Major assignees
Companies most often associated with this inventor's publications.
| Assignee | Patents |
|---|---|
| Applied Materials Inc | 25 |
| Kla Corp | 4 |
Top CPC classifications
Most common classification codes across this inventor's patents.
| CPC | Patents |
|---|---|
| H10P72/0604 | 14 |
| H10P72/0612 | 10 |
| H01J37/32972 | 9 |
| G01N21/55 | 8 |
| H10P72/0602 | 8 |