Process characterization and correction using optical wall process sensor (OWPS)

US12469686B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-12469686-B2
Application numberUS-202217696791-A
CountryUS
Kind codeB2
Filing dateMar 16, 2022
Priority dateMar 16, 2022
Publication dateNov 11, 2025
Grant dateNov 11, 2025

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  1. Title

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  2. Abstract

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  5. First independent claim

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Abstract

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A method includes receiving, by a processing device, first sensor data indicating a state of a wall corresponding to a first processing chamber. The first sensor data includes optical spectral data. The method further includes determining, by the processing device, a first value based on the first sensor data. The first value corresponds to a first amount of a product disposed along a surface of the wall at a first time. The method further includes determining, by the processing device, a first update to a first process operation associated with the first processing chamber based on the first value. The method further includes performing, by the processing device, one or more of (i) preparing a notification indicating the first update for presentation on a graphical user interface (GUI), or (ii) causing performance of the first process operation in accordance with the first update.

First claim

Opening claim text (preview).

What is claimed is: 1 . A method comprising: receiving, by a processing device, first sensor data indicating a state of a wall corresponding to a first processing chamber, the first sensor data comprising optical spectral data associated at least with light reflected off of a surface of a product disposed along a surface of the wall, a distal surface of a window in the wall, and a film on the distal surface of the window; determining, by the processing device, a first value based on the first sensor data, the first value corresponding to a first amount of the product disposed along the surface of the wall at a first time; determining, by the processing device, a first update to a first process operation associated with the first processing chamber based on the first value; and performing, by the processing device, one or more of (i) preparing a notification indicating the first update for presentation on a graphical user interface (GUI) or (ii) causing performance of the first process operation in accordance with the first update. 2 . The method of claim 1 , wherein the first sensor data is received from an optical wall process sensor (OWPS), the method further comprising: determining, by the processing device, an update to at least one of a sensor gain value or a sensor offset value corresponding to the OWPS based on the first value. 3 . The method of claim 1 , wherein the first value corresponds to the first amount of the product disposed along the surface at the first time, the method further comprising: determining, by the processing device, a second value based on the first sensor data, wherein the second value corresponds to a second amount of the product disposed along the surface of the wall at a second time; and determining, by the processing device, a process rate associated with the first process operation using the first value and the second value, wherein the first update is determined further using the process rate. 4 . The method of claim 3 , wherein the first update corresponds to at least one of a duration of the first process operation or an endpoint condition of the first process operation. 5 . The method of claim 4 , wherein at least one of the process rate or the endpoint condition is associated with at least one of a cleaning rate, an etch rate, or a deposition rate corresponding to the first processing chamber. 6 . The method of claim 1 , wherein the first value indicates a thickness of the product disposed along the surface of the wall. 7 . The method of claim 1 , further comprising: receiving, by the processing device, second sensor data indicating a second state of a second wall corresponding to a second processing chamber, wherein the second sensor data comprises second optical spectral data; and determining, by the processing device, a second value based on the second sensor data, wherein the second value corresponds to a second amount of the product disposed along a second surface of the second wall at a second time, wherein the first update is determined further using the second value. 8 . The method of claim 7 , further comprising: causing, by the processing device, a performance of a calibration of one or more sensors associated with the first processing chamber based on a comparison between the first value and the second value. 9 . The method of claim 1 , further comprising: performing, by the processing device, a data normalization using the first sensor data to determine the first value, wherein the first value comprises a normalized dimensionless value. 10 . The method of claim 1 , further comprising: using, by the processing device, the first sensor data as input to a machine learning (ML) model; and receiving, by the processing device, one or more outputs of the ML model, the one or more outputs indicating the first update. 11 . A system comprising: a first processing chamber comprising a first wall with an inner surface positioned within the first processing chamber; an optical sensor coupled to the processing chamber, the optical sensor configured to acquire spectral data associated with the inner surface; a memory; and a processing device coupled to the memory, the processing device to: receive first sensor data indicating a state of the first wall of the first processing chamber, the first sensor data comprising optical spectral data associated at least with light reflected off of a surface of a product disposed along the inner surface of the wall, a distal surface of a window in the wall, and a film on the distal surface of the window; determine a first value based on the first sensor data, the first value corresponding to a first amount of the product disposed along the inner surface of the first wall at a first time; determine a first update to a first process operation associated with the first processing chamber based on the first value; and perform one or more of (i) prepare a notification indicating the first update for presentation on a graphical user interface (GUI) or (ii) cause performance of the first process operation in accordance with the first update. 12 . The system of claim 11 , wherein the first sensor data is received from an optical wall process sensor (OWPS), and wherein the processing device is further to: determine an update to at least one of a sensor gain value or a sensor offset value corresponding to the OWPS based on the first value. 13 . The system of claim 11 , wherein the first value corresponds to the first amount of the product disposed along the surface at the first time, and wherein the processing device is further to: determine a second value based on the first sensor data, wherein the second value corresponds to a second amount of the product disposed along the surface of the wall at a second time; and determine a process rate associated with the first process operation using the first value and the second value, wherein the first update is determined further using the process rate. 14 . The system of claim 11 , wherein the first value indicates a thickness of the product disposed along the surface of the wall. 15 . The system of claim 11 , wherein the processing device is further to: receive second sensor data indicating a second state of a second wall corresponding to a second processing chamber, wherein the second sensor data comprises second optical spectral data; and determine a second value based on the second sensor data, wherein the second value corresponds to a second amount of the product disposed along a second surface of the second wall, wherein the first update is determined further using the second value. 16 . A non-transitory machine-readable storage medium storing instructions which, when executed, cause a processing device to: receive first sensor data indicating a state of a wall corresponding to a first processing chamber, the first sensor data comprising optical spectral data associated at least with light reflected off of a surface of a product disposed along a surface of the wall, a distal surface of a window in the wall, and a film on the distal surface of the window; determine a first value based on the first sensor data, the first value corresponding to a first amount of the product disposed along the surface of the wall at a first time; determine a first update to a first process operation associated with the first processing chamber based on the first value; and perform one or more of (i) prepare a notification indicating the first update for presentation on a graphical user interface (GUI) or (ii) cause performance o

Assignees

Inventors

Classifications

  • Software, data control or modelling · CPC title

  • Etching · CPC title

  • Spectral analysis · CPC title

  • for cleaning followed by drying, rinsing, stripping, blasting or the like · CPC title

  • surrounding a central transfer chamber · CPC title

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Frequently asked questions

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What does patent US12469686B2 cover?
A method includes receiving, by a processing device, first sensor data indicating a state of a wall corresponding to a first processing chamber. The first sensor data includes optical spectral data. The method further includes determining, by the processing device, a first value based on the first sensor data. The first value corresponds to a first amount of a product disposed along a surface o…
Who is the assignee on this patent?
Applied Materials Inc
What technology area does this patent fall under?
Primary CPC classification H01J37/32926. Mapped technology areas include Electricity.
When was this patent published?
Publication date Tue Nov 11 2025 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 12 related publications on this page (citations in our corpus or others sharing the same primary CPC).