Optical system and lithography apparatus
US-12393119-B2 · Aug 19, 2025 · US
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Schaffer Dirk patents
Schaffer Dirk is listed as an inventor on 24 patents in our database. Major assignees and classification codes are summarized below.
| Metric | Value |
|---|---|
| Inventor | Schaffer Dirk |
| Total patents | 24 |
| First publication | Jan 6, 2015 |
| Latest publication | Aug 19, 2025 |
Notable patents
Publications ranked by popularity score, then publication date.
Optical system and lithography apparatus
US-2023221646-A1 · Jul 13, 2023 · US
Optical element for the beam guidance of imaging light in projection lithography
US-11029606-B2 · Jun 8, 2021 · US
Optical element for the beam guidance of imaging light in projection lithography
US-2020150544-A1 · May 14, 2020 · US
Mounting arrangement for an optical imaging arrangement
US-10520838-B2 · Dec 31, 2019 · US
Mounting arrangement for an optical imaging arrangement
US-2019086823-A1 · Mar 21, 2019 · US
Optical element module with minimized parasitic loads
US-10215948-B2 · Feb 26, 2019 · US
Optical element unit for exposure processes
US-10203607-B2 · Feb 12, 2019 · US
Moveably mounted component of projection exposure system, as well as device and method for movement limitation for same
US-10095126-B2 · Oct 9, 2018 · US
Optical arrangement of a microlithographic projection exposure apparatus
US-10007186-B2 · Jun 26, 2018 · US
Recent patents
Latest publications not already listed above.
Mirror module, in particular for a microlithographic projection exposure appararatus
US-9996015-B2 · Jun 12, 2018 · US
Mirror arrangement for a lithography apparatus and method for producing the same
US-9869937-B2 · Jan 16, 2018 · US
Moveably mounted component of projection exposure system, as well as device and method for movement limitation for same
US-2017357164-A1 · Dec 14, 2017 · US
Optical arrangement of a microlithographic projection exposure apparatus
US-2017192360-A1 · Jul 6, 2017 · US
Mirror module, in particular for a microlithographic projection exposure appararatus
US-2017153552-A1 · Jun 1, 2017 · US
Lithography apparatus and method for producing a mirror arrangement
US-9459538-B2 · Oct 4, 2016 · US
Optical Element Unit And Method Of Supporting An Optical Element
US-2016109679-A1 · Apr 21, 2016 · US
Optical arrangement in a microlithographic projection exposure apparatus
US-9250417-B2 · Feb 2, 2016 · US
Optical element unit and method of supporting an optical element
US-9134501-B2 · Sep 15, 2015 · US
Optical element unit for exposure processes
US-2015168846-A1 · Jun 18, 2015 · US
Mirror arrangement for a lithography apparatus and method for producing the same
US-2015168844-A1 · Jun 18, 2015 · US
Optical element unit for exposure processes having sealing element
US-9046795-B2 · Jun 2, 2015 · US
Lithography apparatus and method for producing a mirror arrangement
US-2015055112-A1 · Feb 26, 2015 · US
Method for bonding bodies and composite body
US-8927090-B2 · Jan 6, 2015 · US
Major assignees
Companies most often associated with this inventor's publications.
| Assignee | Patents |
|---|---|
| Zeiss Carl Smt Gmbh | 24 |
| Schaffer Dirk | 4 |
| Kugler Jens | 2 |
| Hembacher Stefan | 1 |
| Heintel Willi | 1 |
Top CPC classifications
Most common classification codes across this inventor's patents.
| CPC | Patents |
|---|---|
| G03F7/70825 | 18 |
| G02B7/182 | 9 |
| G03F7/70258 | 8 |
| G03F7/7015 | 7 |
| G03F7/20 | 6 |