Mirror arrangement for a lithography apparatus and method for producing the same

Patent metadata

Field	Value
Publication number	US-9869937-B2
Application number	US-201514590328-A
Country	US
Kind code	B2
Filing date	Jan 6, 2015
Priority date	Aug 2, 2012
Publication date	Jan 16, 2018
Grant date	Jan 16, 2018

Abstract

A method for producing a mirror arrangement for a lithography apparatus is proposed, which comprises the following steps: producing a mirror body having a cavity delimited by a front wall, a rear wall and a side wall of the mirror body, the side wall being arranged between the front wall and the rear wall, wherein at least one supporting element is provided in the cavity between the front wall and the rear wall; and after producing the mirror body, at least partly removing the supporting element.

First claim

The invention claimed is:

1. An arrangement, comprising:
a mirror body having a single cavity delimited by a front wall, a rear wall and a side wall between the front and rear walls,
wherein:
the side wall does not have a hole;
the mirror body comprises a glass ceramic; and
a ratio of a maximum lateral extent of the cavity to a maximum lateral extent of the mirror body is at least 0.75:1.

2. The arrangement of claim 1 , wherein the ratio of the maximum lateral extent of the cavity to the maximum lateral extent of the mirror body is at least 0.85:1.

3. The arrangement of claim 1 , wherein a ratio of a maximum height of the cavity to a maximum height of the mirror body is not more than 0.5:1.

4. The arrangement of claim 1 , wherein a ratio of a maximum height of the cavity to a maximum height of the mirror body is not more than 1:5.

5. The arrangement of claim 1 , wherein the glass ceramic has a temperature dependent coefficient of thermal expansion which is equal to zero at a zero crossing temperature.

6. The arrangement of claim 1 , further comprising bearing elements configured to link the mirror body to a structural element of an EUV lithography apparatus, wherein the bearing elements are supported by an outer side of the rear wall of the mirror body.

7. The arrangement of claim 1 , further comprising a supporting element in the cavity between the front and rear walls.

8. The arrangement of claim 1 , further comprising a supporting element in the cavity between the front and rear walls, wherein the supporting element has a shape selected from the group consisting of a column, a truncated pyramid, and a truncated cone.

9. The arrangement of claim 1 , further comprising a supporting element in the cavity between the front and rear walls, wherein the supporting element, the front wall and the side wall comprise a same material.

10. An apparatus, comprising:
the arrangement of claim 1 ,
wherein the apparatus is an EUV lithography apparatus.

11. The apparatus of claim 10 , wherein the apparatus comprises an illumination device and an exposure element.

12. The arrangement of claim 1 , wherein the glass ceramic comprises titanium doped quartz glass.

13. The arrangement of claim 1 , wherein the glass ceramic comprises cordierite.

14. The arrangement of claim 13 , wherein the cordierite comprises at least one additive.

15. The arrangement of claim 1 , wherein the glass ceramic comprises a titania-silicate glass.

16. The arrangement of claim 1 , wherein the glass ceramic comprises a lithium-aluminosilicate glass.

17. The arrangement of claim 1 , wherein the sidewall is devoid of openings.

18. The arrangement of claim 1 , wherein the sidewall is completely solid.

19. The arrangement of claim 1 , wherein the cavity is devoid of solid material.

20. The arrangement of claim 1 , wherein the sidewalls contact an outer atmosphere of the arrangement.

21. An arrangement, comprising:
a mirror body having a single cavity delimited by a front wall, a rear wall and a side wall between the front and rear walls,
wherein:
the sidewall does not have a hole; and
a ratio of a maximum lateral extent of the cavity to a maximum lateral extent of the mirror body is at least 0.75:1.

22. The arrangement of claim 21 , wherein the ratio of the maximum lateral extent of the cavity to the maximum lateral extent of the mirror body is at least 0.85:1.

23. The arrangement of claim 21 , wherein a ratio of a maximum height of the cavity to a maximum height of the mirror body is not more than 0.5:1.

24. The arrangement of claim 21 , wherein a ratio of a maximum height of the cavity to a maximum height of the mirror body is not more than 1:5.

25. The arrangement of claim 21 , further comprising bearing elements configured to link the mirror body to a structural element of an EUV lithography apparatus, wherein the bearing elements are supported by an outer side of the rear wall of the mirror body.

26. The arrangement of claim 21 , further comprising a supporting element in the cavity between the front and rear walls.

27. The arrangement of claim 21 , further comprising a supporting element in the cavity between the front and rear walls, wherein the supporting element has a shape selected from the group consisting of a column, a truncated pyramid, and a truncated cone.

28. The arrangement of claim 21 , further comprising a supporting element in the cavity between the front and rear walls, wherein the supporting element, the front wall and the side wall comprise a same material.

29. The arrangement of claim 21 , wherein the sidewall is completely solid.

30. The arrangement of claim 21 , wherein the cavity is devoid of solid material.

31. The arrangement of claim 21 , wherein the sidewalls contact an outer atmosphere of the arrangement.

32. An apparatus, comprising:
the arrangement of claim 21 ,
wherein the apparatus is an EUV lithography apparatus.

33. The apparatus of claim 32 , wherein the apparatus comprises an illumination device and an exposure element.

Assignees

• Zeiss Carl Smt Gmbh

Inventors

• Schaffer Dirk

Classifications

• Y10T29/49815

  Disassembling · CPC title

• G02B7/1822

  comprising means for aligning the optical axis (G02B7/1821 takes precedence) · CPC title

• G02B7/181

  with means for compensating for changes in temperature or for controlling the temperature; thermal stabilisation · CPC title

• G02B5/0891

  Ultraviolet [UV] mirrors (apparatus for microlithography exposure G03F7/70; X-ray multilayer structures G21K1/06) · CPC title

• B29D11/00596 Primary

  Mirrors · CPC title