Moveably mounted component of projection exposure system, as well as device and method for movement limitation for same

Patent metadata

Field	Value
Publication number	US-10095126-B2
Application number	US-201715659205-A
Country	US
Kind code	B2
Filing date	Jul 25, 2017
Priority date	Jan 26, 2015
Publication date	Oct 9, 2018
Grant date	Oct 9, 2018

Abstract

The present application discloses a component having a movably mounted component element of a projection exposure apparatus and in particular a movement limiting apparatus, and a method for limiting the movement of movable component elements of a component of a projection exposure apparatus.

First claim

What is claimed is:

1. A method of limiting movement of a movably mounted component element of a component of a microlithographic projection exposure apparatus, the component comprising the movably mounted component element and a bearing element supporting the movably mounted component element and defining a position of the movably mounted component element within a permissible range of movement, the method comprising:
providing a movement limiting apparatus which limits for changes in a position of the movably mounted component element outside a permissible range of movement, the movement limiting apparatus comprising a field generating device comprising first and second members, the first member being arranged on the movably mounted component element, the second member arranged on a supporting structure with respect to which the movement of the movably mounted component element is intended to be limited, the first and the second members are at a distance from each other and a magnetic and/or electric field is generated by each of the first and the second members so that a force field is formed between the first and the second components;
setting the force field so that, when the position of the movably mounted component changes beyond the permissible range of movement as a result of undesired external forces, the change in position is counteracted by the force acting between the first and second members,
wherein:
the movement limiting apparatus has a first operation state and a second operation state;
in the first operation state of the movement limiting apparatus: a) the projection exposure apparatus is operated to image structures of a reticle; and b) the movably mounted component element is movable in the permissible range of movement; and
in the second operation state of the movement limiting apparatus: a) the projection exposure apparatus is not operated to image structures of a reticle; and b) the movement limiting apparatus is used to lock the movably mounted component element.

2. The method of claim 1 , wherein normal operation of the movement limiting device occurs when the distance between the first and second member is greater than or equal to a target distance which is accordingly within the permissible range of movement.

3. The method of claim 1 , wherein normal operation of the movement limiting device occurs when acceleration of the movably mounted component element is beneath a threshold value.

4. The method of claim 1 , wherein normal operation of the movement limiting device occurs when an external force action is beneath a limit.

5. The method of claim 1 , wherein:
the force acting between the first and second members is less than or equal to a limit value in normal operation; and
the limit value is less than a bearing force of the bearing element for the movably mounted component element.

6. The method of claim 1 , wherein:
the force acting between the first and second components is less than or equal to a limit value in normal operation; and
in the first operation state of the movement limiting apparatus, the force field is changed due to the action of external forces.

7. The method of claim 1 , wherein, in the second operation state of the movement limiting apparatus, a field-generating member that generates a field is switched into a latching state, and the field is a magnetic field and/or an electric field.

8. The method of claim 7 , wherein at least one of the following holds:
the field-generating member is mechanically adjusted;
the field is switched off; and
in each case, at least one force field that attracts the first and second members to each other and a repulsive force field are superposed.

9. A component of a microlithographic projection exposure apparatus, comprising:
a movably mounted component element;
a bearing element supporting the component element and defining a position of the component element within a permissible range of movement; and
a movement limiting apparatus configured to limit possibilities for changes in position of the component element outside a permissible range of movement,
wherein:
the movement limiting apparatus comprises a field generating device comprising first and second members;
the first member is arranged on the movably mounted component element;
the second member is arranged on a supporting structure with respect to which the movement of the movably mounted component element;
the first and second members are a distance from each other; and
the first and second members are configured so that a magnetic and/or electric field is generatable by each of the first and second members so that a force field is present between the first and second members so that the force field counteracts the change in position of the movably mounted component element at least outside the permissible range of movement;
the force field is set so that the force exerted on the movably mounted component element by the movement limiting apparatus is less than or equal to a limit value in normal operation;
the limit value is less than a bearing force of the bearing element for the movably component element;
the force field is switchable between first and second operating state;
in the first operating state, the movably mounted component element is movably in the permissible movement range; and
in the second operating state, the movably mounted component element has restricted movement.

10. The component of claim 9 , wherein the component is configured so that the limit value is kept within by superimposition of magnetic and/or electric fields.

11. The component of claim 9 , wherein the movement limiting apparatus comprises several members configured to limit the movement of the movably mounted component element in several degrees of freedom of movement.

12. The component of claim 11 , wherein the several members comprise an element selected from the group consisting of permanent magnets, electromagnets and electrodes.

13. The component of claim 11 , wherein at least one of the several members comprises an elastic element and/or a damping element.

14. The component of claim 9 , wherein the movement limiting apparatus comprises several pairs of members configured to limit the movement of the movably mounted component element in several degrees of freedom of movement.

15. The component of claim 9 , comprising a field-generating member configured to generate at least one field selected from the group consisting of a magnetic field and an electric field, wherein the field-generating member is mechanically adjustable, and/or the member is adjustable with regard to the field.

16. The component of claim 9 , wherein the first and second members comprise a pair of interacting members selected from the group of pairings consisting of: a) two permanent magnets; b) a permanent magnet and an electro-magnet; c) two electromagnets; and d) two electrodes.

17. An apparatus, comprising:
a component according to claim 9 ,
wherein the apparatus is a microlithographic projection exposure apparatus.

18. A component, comprising:
a movably mounted component element;
a bearing element supporting the movably mounted component element and defining a position of the movably mounted component element within a permissible range of movement; and
a movement limiting apparatus configured to limit possibilities for changes in the position of the movably mounted component element outside a permissible range of movement,
wherein:
the movement limiting apparatus comprises a magnetic field generating device compris

Assignees

• Zeiss Carl Smt Gmbh

Inventors

• Prochnau Jens
• Nefzi Marwene
• Schaffer Dirk

Classifications

• G03F7/70825 Primary

  Mounting of individual elements, e.g. mounts, holders or supports (workpiece or mask holders G03F7/707) · CPC title

• G03F7/70975

  Assembly, maintenance, transport or storage of apparatus · CPC title

• G03F7/709

  Vibration, e.g. vibration detection, compensation, suppression or isolation · CPC title

• F16F15/03

  using {magnetic or} electromagnetic means (F16F9/53, {F16F15/005} take precedence) · CPC title

• G02B7/1828

  using magnetic means · CPC title