Optical arrangement of a microlithographic projection exposure apparatus

Patent metadata

Field	Value
Publication number	US-2017192360-A1
Application number	US-201715461853-A
Country	US
Kind code	A1
Filing date	Mar 17, 2017
Priority date	Sep 22, 2014
Publication date	Jul 6, 2017
Grant date	—

Abstract

An optical arrangement of a microlithographic projection exposure apparatus includes a mirror element having a mirror substrate, and a reflection region formed on a surface of the mirror substrate. The arrangement also includes at least one actuator configured to move the mirror element in at least one degree of freedom, and a mounting element, which acts on the mirror substrate. The mounting element alone holds the mirror element at least approximately in an equilibrium position, such that the at least one actuator is at least approximately free of forces in the equilibrium position.

First claim

What is claimed is:

1 . An optical arrangement, comprising:
a mirror element comprising a mirror substrate and a reflection region supported by the mirror substrate; an actuator configured to move the mirror element in at least one degree of freedom; and a mounting element configured to act on the mirror substrate, wherein:
the mounting element alone holds the mirror element at least approximately in an equilibrium position so that the actuator is at least approximately free of forces in the equilibrium position;
an effective line of a weight force in a center of gravity of the mirror element does not intersect the reflection region;
the mirror substrate is at least substantially shaped as a plate; an
a distance between the effective line of the weight force and the reflection region is greater than a minimum thickness of the mirror substrate.

2 . The optical arrangement of claim 1 , wherein the mirror substrate bears a reflective material in the reflection region.

3 . The optical arrangement of claim 2 , wherein the mounting element is configured to exert a mounting force on the mirror element, and an effective line of the mounting force coincides with the effective line of the weight force.

4 . The optical arrangement of claim 3 , wherein:
the mounting element is configured to exert a mounting force on the mirror element; and an effective line of the mounting force runs within the substrate at a distance from the effective line of the weight force which is less than 0.1 times a maximum longitudinal extent of the mirror element in all normal planes with respect to the effective line of the weight force.

5 . The optical arrangement of claim 4 , wherein the arrangement comprises a plurality of actuators.

6 . The optical arrangement of claim 5 , wherein each of the plurality of actuators is configured to move the mirror element in at least one degree of freedom.

7 . The optical arrangement of claim 1 , wherein the mounting element is configured to exert a mounting force on the mirror element, and an effective line of the mounting force coincides with the effective line of the weight force.

8 . The optical arrangement of claim 7 , wherein:
the mounting element is configured to exert a mounting force on the mirror element; and an effective line of the mounting force runs within the substrate at a distance from the effective line of the weight force which is less than 0.1 times a maximum longitudinal extent of the mirror element in all normal planes with respect to the effective line of the weight force.

9 . The optical arrangement of claim 8 , wherein the arrangement comprises a plurality of actuators.

10 . The optical arrangement of claim 9 , wherein each of the plurality of actuators is configured to move the mirror element in at least one degree of freedom.

11 . The optical arrangement of claim 1 , wherein:
the mounting element is configured to exert a mounting force on the mirror element; and an effective line of the mounting force runs within the substrate at a distance from the effective line of the weight force which is less than 0.1 times a maximum longitudinal extent of the mirror element in all normal planes with respect to the effective line of the weight force.

12 . The optical arrangement of claim 11 , wherein the arrangement comprises a plurality of actuators.

13 . The optical arrangement of claim 12 , wherein each of the plurality of actuators is configured to move the mirror element in at least one degree of freedom.

14 . The optical arrangement of claim 1 , wherein the arrangement comprises a plurality of actuators.

15 . The optical arrangement of claim 14 , wherein each of the plurality of actuators is configured to move the mirror element in at least one degree of freedom.

16 . A lens having an object plane and an image plane, the lens comprising:
an optical arrangement according to claim 1 , wherein the lens is configured to image an object in the object plane into the image plane.

17 . An illumination system, comprising:
an optical arrangement according to claim 1 , wherein the illumination is configured to illuminate an illumination plane.

18 . An apparatus, comprising:
an illumination system; and a lens having an object plane an image plane, wherein:
the lens is configured to image an object in the object plane into the image plane; and
at least one member selected from the group consisting of the illumination system and the lens comprises an optical arrangement according to claim 1 .

19 . A method of using a projection exposure apparatus comprising an illumination system and a lens, the method comprising:
using the illumination system to illuminate an object in an object plane of the lens; and using the lens image an illuminated portion of the object into an image plane of the lens, wherein at least one member selected from the group consisting of the illumination system and the lens comprises an optical arrangement according to claim 1 .

20 . An optical arrangement, comprising:
a mirror element comprising a mirror substrate and a reflection region supported by the mirror substrate; an actuator configured to move the mirror element in at least one degree of freedom; and a mounting element configured to act on the mirror substrate, wherein:
the mounting element alone holds the mirror in a position so that the actuator is at least approximately free of forces;
an effective line of a weight force in a center of gravity of the mirror element does not intersect the reflection region;
the mirror substrate is at least substantially shaped as a plate; an
the effective line of the weight force is a distance from the reflection region that is greater than a minimum thickness of the mirror substrate.

Assignees

• Zeiss Carl Smt Gmbh

Inventors

• Prochnau Jens
• Schaffer Dirk

Classifications

• G03F7/70258 Primary

  Projection system adjustments, e.g. adjustments during exposure or alignment during assembly of projection system · CPC title

• G03F7/70141 Primary

  Illumination system adjustment, e.g. adjustments during exposure or alignment during assembly of illumination system · CPC title

• G03F7/7015

  Details of optical elements · CPC title

• G03F7/70225

  Optical aspects of catadioptric systems, i.e. comprising reflective and refractive elements · CPC title

• G03F7/70825

  Mounting of individual elements, e.g. mounts, holders or supports (workpiece or mask holders G03F7/707) · CPC title