Aqueous anionic functional silica slurry and amine carboxylic acid compositions for selective nitride removal in polishing and methods of using them
US-11186748-B2 · Nov 30, 2021 · US
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Penta Naresh Kumar patents
Penta Naresh Kumar is listed as an inventor on 22 patents in our database. Major assignees and classification codes are summarized below.
| Metric | Value |
|---|---|
| Inventor | Penta Naresh Kumar |
| Total patents | 22 |
| First publication | Apr 2, 2015 |
| Latest publication | Nov 30, 2021 |
Notable patents
Publications ranked by popularity score, then publication date.
Chemical mechanical polishing composition and method of polishing silicon nitride over silicon dioxide and simultaneously inhibiting damage to silicon dioxide
US-10954411-B2 · Mar 23, 2021 · US
Chemical mechanical polishing composition and method of polishing silicon nitride over silicon dioxide and simultaneously inhibiting damage to silicon dioxide
US-2020362198-A1 · Nov 19, 2020 · US
Aqueous compositions of low dishing silica particles for polysilicon polishing
US-10822524-B2 · Nov 3, 2020 · US
Chemical mechanical polishing compositions and methods having enhanced defect inhibition and selectively polishing silicon nitride over silicon dioxide in an acid environment
US-10787592-B1 · Sep 29, 2020 · US
Aqueous silica slurry and amine carboxylic acid compositions for use in shallow trench isolation and methods of using them
US-10711158-B2 · Jul 14, 2020 · US
Chemical mechanical polishing compositions and methods for suppressing the removal rate of amorphous silicon
US-10626298-B1 · Apr 21, 2020 · US
Chemical mechanical polishing composition and method of polishing silcon dioxide over silicon nitiride
US-2020102478-A1 · Apr 2, 2020 · US
Aqueous silica slurry and amine carboxylic acid compositions selective for nitride removal in polishing and methods of using them
US-10584265-B2 · Mar 10, 2020 · US
Aqueous low abrasive silica slurry and amine carboxylic acid compositions for use in shallow trench isolation and methods of making and using them
US-10508221-B2 · Dec 17, 2019 · US
Recent patents
Latest publications not already listed above.
Aqueous compositions of low dishing silica particles for polysilicon polishing
US-2019185714-A1 · Jun 20, 2019 · US
Aqueous silica slurry compositions for use in shallow trench isolation and methods of using them
US-10316218-B2 · Jun 11, 2019 · US
Aqueous silica slurry and amine carboxylic acid compositions selective for nitride removal in polishing and methods of using them
US-2019092972-A1 · Mar 28, 2019 · US
Aqueous low abrasive silica slurry and amine carboxylic acid compositions for use in shallow trench isolation and methods of making and using them
US-2019092970-A1 · Mar 28, 2019 · US
Aqueous anionic functional silica slurry and amine carboxylic acid compositions for selective nitride removal in polishing and methods of using them
US-2019092971-A1 · Mar 28, 2019 · US
Aqueous silica slurry and amine carboxylic acid compositions for use in shallow trench isolation and methods of using them
US-2019092973-A1 · Mar 28, 2019 · US
Aqueous silica slurry compositions for use in shallow trench isolation and methods of using them
US-10221336-B2 · Mar 5, 2019 · US
Aqueous silica slurry compositions for use in shallow trench isolation and methods of using them
US-2019062593-A1 · Feb 28, 2019 · US
Aqueous silica slurry compositions for use in shallow trench isolation and methods of using them
US-2018362805-A1 · Dec 20, 2018 · US
Low-abrasive CMP slurry compositions with tunable selectivity
US-10119048-B1 · Nov 6, 2018 · US
Chemical mechanical polishing composition for polishing silicon wafers and related methods
US-9150759-B2 · Oct 6, 2015 · US
Chemical mechanical polishing composition for polishing silicon wafers and related methods
US-2015093900-A1 · Apr 2, 2015 · US
Major assignees
Companies most often associated with this inventor's publications.
| Assignee | Patents |
|---|---|
| Rohm & Haas Elect Materials Cmp Holdings Inc | 20 |
| Rohm & Haas Elect Mat | 3 |
| Rohm And Haas Electronic Mat Cmp Holdings I | 2 |
| Nitta Haas Inc | 2 |
| Rohm And Hass Electronic Mat Cmp Holdings Inc | 1 |
Top CPC classifications
Most common classification codes across this inventor's patents.
| CPC | Patents |
|---|---|
| C09G1/02 | 22 |
| H10P95/062 | 17 |
| C09K3/1463 | 17 |
| H10P52/402 | 14 |
| C09K3/1409 | 13 |