Chemical mechanical polishing pad
US-10875144-B2 · Dec 29, 2020 · US
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Rohm And Haas Electronic Mat Cmp Holdings I patents
Rohm And Haas Electronic Mat Cmp Holdings I holds 4 patents in our database, with recent filings and technology areas summarized below.
| Metric | Value |
|---|---|
| Total patents | 4 |
| Recent patents | 0 |
| First publication | Sep 15, 2020 |
| Latest publication | Dec 29, 2020 |
Filing trend
Year-over-year patent counts for this assignee.
Not enough yearly data to assess filing trend yet.
| Year | Patents |
|---|---|
| 2020 | 4 |
| Year | Patents |
|---|---|
| 2020 | 4 |
Recent patents
Latest publications where this party is an assignee.
Aqueous compositions of low dishing silica particles for polysilicon polishing
US-10822524-B2 · Nov 3, 2020 · US
Chemical mechanical polishing compositions and methods having enhanced defect inhibition and selectively polishing silicon nitride over silicon dioxide in an acid environment
US-10787592-B1 · Sep 29, 2020 · US
Biased pulse CMP groove pattern
US-10777418-B2 · Sep 15, 2020 · US
Notable patents
Representative or frequently cited publications from precomputed assignee stats.
Chemical mechanical polishing pad
US-10875144-B2 · Dec 29, 2020 · US
Aqueous compositions of low dishing silica particles for polysilicon polishing
US-10822524-B2 · Nov 3, 2020 · US
Chemical mechanical polishing compositions and methods having enhanced defect inhibition and selectively polishing silicon nitride over silicon dioxide in an acid environment
US-10787592-B1 · Sep 29, 2020 · US
Biased pulse CMP groove pattern
US-10777418-B2 · Sep 15, 2020 · US
Technology areas
Mapped technology topics for this assignee.
| Technology | Patents |
|---|---|
| Chemistry & Metallurgy | 4 |
| Electricity | 4 |
| Operations & Transport | 3 |