Method and apparatus for measuring gas flow
US-11899476-B2 · Feb 13, 2024 · US
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Matsuda risako patents
Matsuda risako is listed as an inventor on 16 patents in our database. Major assignees and classification codes are summarized below.
| Metric | Value |
|---|---|
| Inventor | Matsuda risako |
| Total patents | 16 |
| First publication | Oct 31, 2019 |
| Latest publication | Feb 13, 2024 |
Notable patents
Publications ranked by popularity score, then publication date.
Substrate processing method and substrate processing system
US-11742228-B2 · Aug 29, 2023 · US
Gas inspection method, substrate processing method, and substrate processing system
US-11644121-B2 · May 9, 2023 · US
Method for calibrating plurality of chamber pressure sensors and substrate processing system
US-11585717-B2 · Feb 21, 2023 · US
Substrate processing system and method of processing substrate
US-2023034399-A1 · Feb 2, 2023 · US
Method of calibrating multiple chamber pressure sensors
US-11555755-B2 · Jan 17, 2023 · US
Flow rate measurement apparatus and method for more accurately measuring gas flow to a substrate processing system
US-11326914-B2 · May 10, 2022 · US
Method for cleaning gas supply line and processing system
US-11292035-B2 · Apr 5, 2022 · US
Method of calibrating multiple chamber pressure sensors
US-2021302257-A1 · Sep 30, 2021 · US
Gas inspection method, substrate processing method, and substrate processing system
US-2021301942-A1 · Sep 30, 2021 · US
Recent patents
Latest publications not already listed above.
Substrate processing method and substrate processing system
US-2021287922-A1 · Sep 16, 2021 · US
Method and apparatus for measuring gas flow
US-2021263540-A1 · Aug 26, 2021 · US
Substrate processing method, gas flow evaluation substrate and substrate processing apparatus
US-2021257197-A1 · Aug 19, 2021 · US
Method for calibrating plurality of chamber pressure sensors and substrate processing system
US-2020292403-A1 · Sep 17, 2020 · US
Flow rate measurement method and flow rate measurement apparatus
US-2020278225-A1 · Sep 3, 2020 · US
Method for cleaning gas supply line and processing system
US-2019333742-A1 · Oct 31, 2019 · US
Major assignees
Companies most often associated with this inventor's publications.
| Assignee | Patents |
|---|---|
| Tokyo Electron Ltd | 16 |
Top CPC classifications
Most common classification codes across this inventor's patents.
| CPC | Patents |
|---|---|
| H10P72/0604 | 10 |
| H10P72/0402 | 9 |
| H01J37/32449 | 7 |
| H01L21/67253 | 6 |
| H10P72/0421 | 5 |