Method and apparatus for measuring gas flow

Patent metadata

Field	Value
Publication number	US-2021263540-A1
Application number	US-202117176288-A
Country	US
Kind code	A1
Filing date	Feb 16, 2021
Priority date	Feb 21, 2020
Publication date	Aug 26, 2021
Grant date	—

Abstract

A gas flow measuring method is provided. A first pressure of a gas in a first and a second flow path is measured. A gas is supplied to the first and the second flow paths by repeating gas supply and stop of the gas supply, and a gas supply time is measured. A second pressure and a temperature of the gas in the first and the second flow path is measured, a third pressure of the gas in the second flow path is measured after the gas is exhausted from the second flow path, and a fourth pressure of the gas in the first and the second flow path is measured. The gas flow supplied to the first and the second flow path is calculated based on the first to fourth pressures and the temperature, and corrected based on a theoretical gas supply time and a calculated average time.

First claim

1 . A gas flow measuring method comprising:
measuring a first pressure of a gas filled in a first flow path connected to a flow controller and a second flow path connected to the first flow path; supplying, after the first pressure is measured, a gas to the first flow path and the second flow path by repeating multiple times (i) gas supply to the first flow path through the flow controller, and (ii) stop of the gas supply to the first path through the flow controller, after a predetermined time from a start of the gas supply to the first flow path through the flow controller; measuring a gas supply time from a signal for starting the gas supply to the first flow path to a signal for stopping the gas supply to the first flow path, the signals being outputted from a controller to the flow controller when the gas is supplied to the first flow path and the second flow path; measuring a second pressure and a temperature of the gas filled in the first flow path and the second flow path after the gas is supplied to the first flow path and the second flow path; measuring a third pressure of the gas filled in the second flow path after the gas is exhausted from the second flow path in a state where the first flow path and the second flow path are not connected to each other; measuring, after the third pressure is measured, a fourth pressure of the gas filled in the first flow path and the second flow path in a state where the first flow path and the second flow path are connected to each other; calculating a gas flow of the gas supplied to the first flow path and the second flow path through the flow controller based on the first pressure, the second pressure, the third pressure, the fourth pressure, and the temperature; calculating an average time of the gas supply time measured by repeating the gas supply and the stop of the gas supply multiple times; and correcting the calculated gas flow based on a theoretical gas supply time in the controller and the calculated average time.

2 . The gas flow measuring method of claim 1 , wherein said correcting comprises correcting the calculated gas flow such that an area of a gas pulse for the measured gas supply time becomes equal to an area of a gas pulse for the theoretical gas supply time.

3 . The gas flow measuring method of claim 1 , wherein the gas supply time is measured by a measuring unit connected right before the flow controller in a communication path that connects the controller and the flow controller.

4 . The gas flow measuring method of claim 2 , wherein the gas supply time is measured by a measuring unit connected right before the flow controller in a communication path that connects the controller and the flow controller.

5 . The gas flow measuring method of claim 1 , further comprising:
vacuumizing, before the first pressure is measured, the first flow path and the second flow path by exhausting the gas from a processing space when the processing space is connected to the first flow path, the processing space being used for processing a substrate therein using the gas supplied through the flow controller, wherein the first pressure, the second pressure, the third pressure, and the fourth pressure are measured when the processing space is not connected to the first flow path.

6 . The gas flow measuring method of claim 2 , further comprising:
vacuumizing, before the first pressure is measured, the first flow path and the second flow path by exhausting the gas from a processing space when the processing space is connected to the first flow path, the processing space being used for processing a substrate therein using the gas supplied through the flow controller, wherein the first pressure, the second pressure, the third pressure, and the fourth pressure are measured when the processing space is not connected to the first flow path.

7 . The gas flow measuring method of claim 3 , further comprising:
vacuumizing, before the first pressure is measured, the first flow path and the second flow path by exhausting the gas from a processing space when the processing space is connected to the first flow path, the processing space being used for processing a substrate therein using the gas supplied through the flow controller, wherein the first pressure, the second pressure, the third pressure, and the fourth pressure are measured when the processing space is not connected to the first flow path.

8 . The gas flow measuring method of claim 4 , further comprising:
vacuumizing, before the first pressure is measured, the first flow path and the second flow path by exhausting the gas from a processing space when the processing space is connected to the first flow path, the processing space being used for processing a substrate therein using the gas supplied through the flow controller, wherein the first pressure, the second pressure, the third pressure, and the fourth pressure are measured when the processing space is not connected to the first flow path.

9 . A gas flow measuring apparatus for measuring a gas flow, comprising:
a first flow path connected to a flow controller; a second flow path connected to the first flow path; a valve disposed between the first flow path and the second flow path; a pressure sensor configured to measure a pressure of a gas filled in the second flow path; a temperature sensor configured to measure a temperature of the gas; and a controller, wherein the controller is configured to control the gas flow measuring apparatus to perform processes including: measuring a first pressure of a gas filled in a first flow path connected to a flow controller and a second flow path connected to the first flow path; supplying, after the first pressure is measured, a gas to the first flow path and the second flow path by repeating multiple times (i) gas supply to the first flow path through the flow controller, and (ii) stop of the gas supply to the first path through the flow controller, after a predetermined time from a start of the gas supply to the first flow path through the flow controller; measuring a gas supply time from a signal for starting the gas supply to the first flow path to a signal for stopping the gas supply to the first flow path, the signals being outputted from a controller to the flow controller when the gas is supplied to the first flow path and the second flow path; measuring a second pressure and a temperature of the gas filled in the first flow path and the second flow path after the gas is supplied to the first flow path and the second flow path using the pressure sensor and the temperature sensor; measuring a third pressure and a temperature of the gas filled in the second flow path using the pressure sensor after the gas is exhausted from the second flow path in a state the valve is closed and the first flow path and the second flow path are not connected to each other; measuring, after the third pressure is measured, a fourth pressure of the gas filled in the first flow path and the second flow path using the pressure sensor in a state where the valve is opened and the first flow path and the second flow path are connected to each other; calculating a gas flow of the gas supplied to the first flow path and the second flow path through the flow controller based on the first pressure, the second pressure, the third pressure, the fourth pressure, and the temperature; calculating an average time of the gas supply time measured by repeating the gas supply and the stop of the gas supply multiple times; and correcting the calculated gas flow based on a theoretical gas supply time in the controller and the calculated average time.

Assignees

• Tokyo Electron Ltd

Inventors

• Matsuda risako
• Hayasaka Shinichiro
• Oie Manabu
• Shouji Keita

Classifications

• G01F15/02

  Compensating or correcting for variations in pressure, density or temperature · CPC title

• G01F15/005

  Valves (valves in general F16K) · CPC title

• G01F7/005

  by measuring pressure or differential pressure, created by the use of flow constriction · CPC title

• G01F1/86 Primary

  Indirect mass flowmeters, e.g. measuring volume flow and density, temperature or pressure · CPC title

• G01F1/50

  Correcting or compensating means · CPC title