Motorcycle and/or replica thereof
US-D1105985-S · Dec 16, 2025 · US
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Hirose Jun patents
Hirose Jun is listed as an inventor on 60 patents in our database. Major assignees and classification codes are summarized below.
| Metric | Value |
|---|---|
| Inventor | Hirose Jun |
| Total patents | 60 |
| First publication | Jun 30, 2015 |
| Latest publication | Dec 16, 2025 |
Notable patents
Publications ranked by popularity score, then publication date.
Gas supply device and semiconductor manufacturing apparatus
US-12494383-B2 · Dec 9, 2025 · US
Substrate processing apparatus
US-12424423-B2 · Sep 23, 2025 · US
Plasma monitoring system, plasma monitoring method, and monitoring device
US-12424424-B2 · Sep 23, 2025 · US
Substrate processing apparatus, substrate processing system, and maintenance method
US-2025293010-A1 · Sep 18, 2025 · US
Plasma processing apparatus and mounting table thereof
US-2025233008-A1 · Jul 17, 2025 · US
Processing system and processing method
US-2025232967-A1 · Jul 17, 2025 · US
Substrate processing apparatus, substrate processing system, and maintenance method
US-12347660-B2 · Jul 1, 2025 · US
Plasma processing apparatus and mounting table thereof
US-12293937-B2 · May 6, 2025 · US
Alumina ceramic member, method for manufacturing alumina ceramic member, component for semiconductor manufacturing apparatus, and substrate processing apparatus
US-2024429031-A1 · Dec 26, 2024 · US
Recent patents
Latest publications not already listed above.
Plasma processing apparatus
US-2024371609-A1 · Nov 7, 2024 · US
Substrate processing apparatus, substrate processing system, and maintenance method
US-2024339306-A1 · Oct 10, 2024 · US
Plasma processing apparatus
US-12068139-B2 · Aug 20, 2024 · US
Gas supply device and semiconductor manufacturing apparatus
US-2024242976-A1 · Jul 18, 2024 · US
Processing system
US-12040202-B2 · Jul 16, 2024 · US
Substrate processing apparatus, substrate processing system, and maintenance method
US-12040166-B2 · Jul 16, 2024 · US
Plasma monitoring system, plasma monitoring method, and monitoring device
US-2024096608-A1 · Mar 21, 2024 · US
Particle monitoring system, particle monitoring method, and monitoring device
US-2024068921-A1 · Feb 29, 2024 · US
Dynamic state observation system
US-2023150393-A1 · May 18, 2023 · US
Assembly provided with coolant flow channel, method of controlling assembly provided with coolant flow channel, and substrate processing apparatus
US-11569073-B2 · Jan 31, 2023 · US
Plasma processing apparatus and mounting table thereof
US-2023020793-A1 · Jan 19, 2023 · US
Maintenance device
US-11532467-B2 · Dec 20, 2022 · US
Plasma processing apparatus and mounting table thereof
US-11501995-B2 · Nov 15, 2022 · US
Substrate support and plasma processing apparatus
US-11443925-B2 · Sep 13, 2022 · US
Vacuum processing apparatus and maintenance apparatus
US-2022216035-A1 · Jul 7, 2022 · US
Processing system and processing method
US-2022130651-A1 · Apr 28, 2022 · US
Substrate processing apparatus, substrate processing system, and maintenance method
US-2022122818-A1 · Apr 21, 2022 · US
Vacuum processing apparatus and maintenance apparatus
US-11309168-B2 · Apr 19, 2022 · US
Substrate processing apparatus
US-2021407768-A1 · Dec 30, 2021 · US
Processing system
US-2021343559-A1 · Nov 4, 2021 · US
Major assignees
Companies most often associated with this inventor's publications.
| Assignee | Patents |
|---|---|
| Tokyo Electron Ltd | 50 |
| Honda Motor Co Ltd | 7 |
| Fujikin Kk | 3 |
| Univ Kyoto | 2 |
| Astellas Pharma Inc | 2 |
Top CPC classifications
Most common classification codes across this inventor's patents.
| CPC | Patents |
|---|---|
| H10P72/0421 | 26 |
| H01J37/32642 | 25 |
| H01J37/32715 | 20 |
| H10P72/72 | 19 |
| H10P72/7612 | 18 |