Remote-plasma electron-induced mask repair
US-2026050208-A1 · Feb 19, 2026 · US
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Edinger Klaus patents
Edinger Klaus is listed as an inventor on 22 patents in our database. Major assignees and classification codes are summarized below.
| Metric | Value |
|---|---|
| Inventor | Edinger Klaus |
| Total patents | 22 |
| First publication | Nov 24, 2016 |
| Latest publication | Feb 19, 2026 |
Notable patents
Publications ranked by popularity score, then publication date.
Apparatus and method for removing a single particulate from a substrate
US-12517442-B2 · Jan 6, 2026 · US
Method and apparatuses for disposing of excess material of a photolithographic mask
US-12292680-B2 · May 6, 2025 · US
Method and apparatuses for disposing of excess material of a photolithographic mask
US-12164226-B2 · Dec 10, 2024 · US
Apparatus and method for removing a single particulate from a substrate
US-2024295833-A1 · Sep 5, 2024 · US
Apparatus and method for removing a single particulate from a substrate
US-11886126-B2 · Jan 30, 2024 · US
Method and apparatuses for disposing of excess material of a photolithographic mask
US-11874598-B2 · Jan 16, 2024 · US
Device and method for analyzing a defect of a photolithographic mask or of a wafer
US-11733186-B2 · Aug 22, 2023 · US
Method and apparatuses for disposing of excess material of a photolithographic mask
US-2022317564-A1 · Oct 6, 2022 · US
Method and apparatuses for disposing of excess material of a photolithographic mask
US-2022317565-A1 · Oct 6, 2022 · US
Recent patents
Latest publications not already listed above.
Method and apparatuses for disposing of excess material of a photolithographic mask
US-2022299864-A1 · Sep 22, 2022 · US
Apparatus and method for removing a single particulate from a substrate
US-2022011682-A1 · Jan 13, 2022 · US
Device and method for analysing a defect of a photolithographic mask or of a wafer
US-2021247336-A1 · Aug 12, 2021 · US
Device and method for analysing a defect of a photolithographic mask or of a wafer
US-10983075-B2 · Apr 20, 2021 · US
Method and apparatuses for disposing of excess material of a photolithographic mask
US-2020103751-A1 · Apr 2, 2020 · US
Scanning probe microscope and method for examining a surface with a high aspect ratio
US-10119990-B2 · Nov 6, 2018 · US
Method and apparatus for analyzing and for removing a defect of an EUV photomask
US-10060947-B2 · Aug 28, 2018 · US
Method and apparatus for analyzing and for removing a defect of an euv photomask
US-2018106831-A1 · Apr 19, 2018 · US
Apparatus and method for examining a surface of a mask
US-9910065-B2 · Mar 6, 2018 · US
Device and method for analysing a defect of a photolithographic mask or of a wafer
US-2017292923-A1 · Oct 12, 2017 · US
Scanning probe microscope and method for examining a surface with a high aspect ratio
US-2017102407-A1 · Apr 13, 2017 · US
Apparatus and method for examining a surface of a mask
US-2016341763-A1 · Nov 24, 2016 · US
Major assignees
Companies most often associated with this inventor's publications.
| Assignee | Patents |
|---|---|
| Zeiss Carl Smt Gmbh | 22 |
Top CPC classifications
Most common classification codes across this inventor's patents.
| CPC | Patents |
|---|---|
| G03F1/84 | 12 |
| G03F1/72 | 11 |
| G03F1/82 | 11 |
| G03F7/70925 | 11 |
| B08B7/026 | 7 |