Formation of SiN thin films
US-11784043-B2 · Oct 10, 2023 · US
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Chen Shang patents
Chen Shang is listed as an inventor on 34 patents in our database. Major assignees and classification codes are summarized below.
| Metric | Value |
|---|---|
| Inventor | Chen Shang |
| Total patents | 34 |
| First publication | Mar 17, 2016 |
| Latest publication | Oct 10, 2023 |
Notable patents
Publications ranked by popularity score, then publication date.
Si precursors for deposition of SiN at low temperatures
US-11587783-B2 · Feb 21, 2023 · US
Deposition of SiN
US-11367613-B2 · Jun 21, 2022 · US
FORMATION OF SiN THIN FILMS
US-2022044923-A1 · Feb 10, 2022 · US
Formation of SiN thin films
US-11133181-B2 · Sep 28, 2021 · US
Si precursors for deposition of SiN at low temperatures
US-11069522-B2 · Jul 20, 2021 · US
Si PRECURSORS FOR DEPOSITION OF SiN AT LOW TEMPERATURES
US-2021082684-A1 · Mar 18, 2021 · US
Deposition of SiN
US-2020365392-A1 · Nov 19, 2020 · US
Reaction chamber passivation and selective deposition of metallic films
US-10793946-B1 · Oct 6, 2020 · US
Reaction chamber passivation and selective deposition of metallic films
US-2020291511-A1 · Sep 17, 2020 · US
Recent patents
Latest publications not already listed above.
Deposition of SiN
US-10741386-B2 · Aug 11, 2020 · US
FORMATION OF SiN THIN FILMS
US-2019378711-A1 · Dec 12, 2019 · US
Si PRECURSORS FOR DEPOSITION OF SiN AT LOW TEMPERATURES
US-2019371594-A1 · Dec 5, 2019 · US
Reaction chamber passivation and selective deposition of metallic films
US-10480064-B2 · Nov 19, 2019 · US
Deposition of SiN
US-2019295838-A1 · Sep 26, 2019 · US
Formation of SiN thin films
US-10410857-B2 · Sep 10, 2019 · US
Si precursors for deposition of SiN at low temperatures
US-10395917-B2 · Aug 27, 2019 · US
Deposition of SiN
US-10262854-B2 · Apr 16, 2019 · US
Reaction chamber passivation and selective deposition of metallic films
US-2019055643-A1 · Feb 21, 2019 · US
Si PRECURSORS FOR DEPOSITION OF SiN AT LOW TEMPERATURES
US-2018366314-A1 · Dec 20, 2018 · US
Reaction chamber passivation and selective deposition of metallic films
US-10041166-B2 · Aug 7, 2018 · US
Selective deposition of metallic films
US-10014212-B2 · Jul 3, 2018 · US
Processes for preventing oxidation of metal thin films
US-9947582-B1 · Apr 17, 2018 · US
Reaction chamber passivation and selective deposition of metallic films
US-2018080121-A1 · Mar 22, 2018 · US
Deposition of SiN
US-2018068844-A1 · Mar 8, 2018 · US
Si precursors for deposition of SiN at low temperatures
US-9905416-B2 · Feb 27, 2018 · US
Deposition of SiN
US-2017372886-A1 · Dec 28, 2017 · US
Selective deposition of metallic films
US-2017358482-A1 · Dec 14, 2017 · US
Selective deposition of metallic films
US-9805974-B1 · Oct 31, 2017 · US
Reaction chamber passivation and selective deposition of metallic films
US-9803277-B1 · Oct 31, 2017 · US
Major assignees
Companies most often associated with this inventor's publications.
| Assignee | Patents |
|---|---|
| Asm Ip Holding Bv | 34 |
Top CPC classifications
Most common classification codes across this inventor's patents.
| CPC | Patents |
|---|---|
| H10P14/6336 | 30 |
| H10P14/6339 | 30 |
| H10P14/69433 | 23 |
| H01L21/02274 | 23 |
| H01L21/0217 | 23 |