Process for realizing a system for recovering heat, in particular based on the seebeck's effect, and corresponding system
US-2020161528-A1 · May 21, 2020 · US
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Cross-Sectional Technologies
Cross-Sectional Technologies · Cooperative Patent Classification (CPC)
General tagging of emerging or interdisciplinary technologies.
Related technology areas
Mapped technology topics for this CPC code.
| Metric | Value |
|---|---|
| CPC code | Y02P70/605 |
| Official title | — |
| Display label | Cross-Sectional Technologies (mapped technology topic) |
| Total patents | 17 |
Filing trend
Year-over-year patent counts classified under this CPC code.
Filing activity appears to be declining based on the most recent years.
| Year | Patents |
|---|---|
| 2017 | 2 |
| 2018 | 4 |
| 2019 | 6 |
| 2020 | 5 |
Representative patents
Representative publications under this CPC code from precomputed stats, or recent filings when stats are unavailable.
Method for operation instability detection in a surface wave plasma source
US-10651017-B2 · May 12, 2020 · US
Vacuum pump with abatement function
US-10641256-B2 · May 5, 2020 · US
Vacuum pump with abatement function
US-10641272-B2 · May 5, 2020 · US
Abatement and strip process chamber in a dual loadlock configuration
US-2020027742-A1 · Jan 23, 2020 · US
Process for realizing a system for recovering heat, in particular based on the seebeck's effect, and corresponding system
US-10510941-B2 · Dec 17, 2019 · US
Abatement and strip process chamber in a dual loadlock configuration
US-10453694-B2 · Oct 22, 2019 · US
Device and method for exhaust gas treatment on CVD reactor
US-10329668-B2 · Jun 25, 2019 · US
Method for preparing recycled abrasive slurry
US-10266725-B2 · Apr 23, 2019 · US
Chamber Cleaning and Semiconductor Etching Gases
US-2019027375-A1 · Jan 24, 2019 · US
Method for preventing explosion of exhaust gas in decompression processing apparatus
US-10168049-B2 · Jan 1, 2019 · US
Chamber Cleaning and Semiconductor Etching Gases
US-2018366339-A1 · Dec 20, 2018 · US
Chamber cleaning and semiconductor etching gases
US-10109496-B2 · Oct 23, 2018 · US
Trap mechanism, exhaust system, and film formation device
US-10036090-B2 · Jul 31, 2018 · US
Trap assembly in film forming apparatus
US-9896761-B2 · Feb 20, 2018 · US
Substrate processing apparatus and substrate detaching method
US-9831112-B2 · Nov 28, 2017 · US
Exhaust system
US-9702285-B2 · Jul 11, 2017 · US