Vacuum pump with abatement function

Patent metadata

Field	Value
Publication number	US-10641256-B2
Application number	US-201514656652-A
Country	US
Kind code	B2
Filing date	Mar 12, 2015
Priority date	Mar 17, 2014
Publication date	May 5, 2020
Grant date	May 5, 2020

Abstract

A vacuum pump with abatement function which can prevent contamination of a process chamber without allowing products generated by exhaust gas treatment to flow back to the process chamber, and can reduce the amount of gas to be treated without allowing a purge gas and a diluent gas to be contained in an exhaust gas, and thus can achieve energy saving by reducing the amount of energy required for the exhaust gas treatment in an abatement part is disclosed. The vacuum pump with abatement function includes a vacuum pump to which at least one abatement part for treating an exhaust gas is attached. The vacuum pump comprises a dry vacuum pump having a main pump capable of evacuating gas from an atmospheric pressure and a booster pump for increasing an evacuation speed of the main pump, and the at least one abatement part for treating the exhaust gas is connected between the main pump and the booster pump.

First claim

What is claimed is:

1. A vacuum pump with abatement function comprising:
a dry vacuum pump having a main pump comprising an outlet port and being capable of evacuating an exhaust gas to an atmospheric pressure and a booster pump comprising an inlet port and being capable of increasing an evacuation speed of the main pump, wherein the main pump comprises a multistage roots-type dry pump and the booster pump comprises a singlestage or multistage roots-type dry pump; and
at least one abatement part being capable of treating the exhaust gas, the at least one abatement part being positioned between the main pump and the booster pump, wherein a flow path is formed between the inlet port and the outlet port, and wherein the main pump, the abatement part and the booster pump are integrated by allowing a first boundary part between the main pump and the abatement part to be constructed of a first single common wall and allowing a second boundary part between the booster pump and the abatement part to be constructed of a second single common wall, whereby heat conductivity is ensured between the main pump and the abatement part through the first single common wall or between the booster pump and the abatement part through the second single common wall;
wherein the abatement part between the main pump and the booster pump produces heat by input energy for treating the exhaust gas and the heat produced in the abatement part heats the booster pump by said heat conductivity, and compression heat generated in the main pump is transferred to the booster pump through the abatement part by said heat conductivity to heat the booster pump.

2. The vacuum pump with abatement function according to claim 1 , wherein the at least one abatement part comprises a plasma-type abatement part, a dry-type abatement part, a catalytic-type abatement part, or a heater-type abatement part.

3. The vacuum pump with abatement function according to claim 1 , wherein the vacuum pump with abatement function comprises a single main pump or a plurality of main pumps connected in parallel.

4. The vacuum pump with abatement function according to claim 1 , wherein the vacuum pump with abatement function comprises a single booster pump or a plurality of booster pumps connected in series and/or in parallel.

5. The vacuum pump with abatement function according to claim 1 , wherein the vacuum pump with abatement function comprises an enclosure configured to house the at least one abatement part, and an exhaust part configured to connect the enclosure to an exhaust duct.

6. The vacuum pump with abatement function according to claim 1 , further comprising a controller attached to the dry vacuum pump and configured to collectively control the dry vacuum pump and the at least one abatement part;
wherein the controller attached to the dry vacuum pump monitors an output power of an inverter used for driving the booster pump and changes an operational state of the at least one abatement part based on a value of the output power of the inverter.

7. The vacuum pump with abatement function according to claim 1 , wherein the at least one abatement part connected between the main pump and the booster pump comprises a plurality of abatement parts which are arranged in series and/or in parallel.

8. The vacuum pump with abatement function according to claim 7 , wherein the plurality of the abatement parts are arranged in parallel to have back-up function of one or more abatement parts in the plurality.

9. The vacuum pump with abatement function according to claim 7 , wherein the plurality of abatement parts comprise abatement parts having different treatment types of exhaust gas and/or different treatment amounts of exhaust gas and/or different treatment performances of exhaust gas.

Assignees

• Ebara Corp

Inventors

• Furuta Hiroki
• Iwasaki Koichi
• Ishikawa Keiichi
• Komai Tetsuo
• Sekiguchi Shinichi

Classifications

• B01D53/86

  Catalytic processes · CPC title

• B01D2257/2066

  Fluorine · CPC title

• B01D53/8659

  Removing halogens or halogen compounds · CPC title

• B01D2257/2045

  Hydrochloric acid · CPC title

• B01D2258/0216

  from CVD treatment or semi-conductor manufacturing · CPC title