Mask blank substrate, mask blank, and methods for manufacturing them, method for manufacturing transfer mask, and method for manufacturing semiconductor device
US-2017363952-A1 · Dec 21, 2017 · US
Containers specially adapted for masks, mask blanks or pellicles; Preparation thereof
Containers specially adapted for masks, mask blanks or pellicles; Preparation thereof · Cooperative Patent Classification (CPC)
Computing, optics, measurement, and control technologies.
Related technology areas
Mapped technology topics for this CPC code.
| Metric | Value |
|---|---|
| CPC code | G03F1/66 |
| Official title | Containers specially adapted for masks, mask blanks or pellicles; Preparation thereof |
| Display label | Containers specially adapted for masks, mask blanks or pellicles; Preparation thereof |
| Total patents | 582 |
Filing trend
Year-over-year patent counts classified under this CPC code.
Filing activity over the last five years is declining.
| Year | Patents |
|---|---|
| 2015 | 10 |
| 2016 | 23 |
| 2017 | 42 |
| 2018 | 47 |
| 2019 | 54 |
| 2020 | 66 |
| 2021 | 78 |
| 2022 | 72 |
| 2023 | 58 |
| 2024 | 65 |
| 2025 | 59 |
| 2026 | 8 |
Representative patents
Representative publications under this CPC code from precomputed stats, or recent filings when stats are unavailable.
Support frame for pellicles
US-9841670-B2 · Dec 12, 2017 · US
Storage container
US-9841671-B2 · Dec 12, 2017 · US
Pellicle Assembly and Method for Advanced Lithography
US-2017351170-A1 · Dec 7, 2017 · US
Extreme ultraviolet (EUV) pod having marks
US-9817306-B2 · Nov 14, 2017 · US
Reticle rack system
US-9786536-B2 · Oct 10, 2017 · US
Pellicle film, pellicle frame, pellicle, and method for producing same
US-2017285461-A1 · Oct 5, 2017 · US
Multi charged particle beam blanking apparatus, multi charged particle beam blanking method, and multi charged particle beam writing apparatus
US-2017271118-A1 · Sep 21, 2017 · US
Conductive composition, antistatic film, laminate and production therefor, and production method for photomask
US-2017261854-A1 · Sep 14, 2017 · US
Pellicle assembly and method for advanced lithography
US-9759997-B2 · Sep 12, 2017 · US
Mask blank and transfer mask
US-9746764-B2 · Aug 29, 2017 · US
Reticle pod
US-9745119-B2 · Aug 29, 2017 · US
Chemically amplified negative resist composition using novel onium salt and resist pattern forming process
US-9740098-B2 · Aug 22, 2017 · US
Support frame for pellicles
US-2017212418-A1 · Jul 27, 2017 · US
Mask protection device, exposure apparatus, and method for manufacturing device
US-9715175-B2 · Jul 25, 2017 · US
Pellicle
US-2017199452-A1 · Jul 13, 2017 · US
Pellicle frame, pellicle and method of manufacturing the same, original plate for exposure and method of manufacturing the same, exposure device, and method of manufacturing semiconductor device
US-2017192349-A1 · Jul 6, 2017 · US
Pellicle for euv exposure
US-2017184955-A1 · Jun 29, 2017 · US
Pellicle, pellicle production method and exposure method using pellicle
US-2017184957-A1 · Jun 29, 2017 · US
Reticle Rack System
US-2017158429-A1 · Jun 8, 2017 · US
Frequently asked questions
Answers are generated from the same data shown on this page.
- What is CPC G03F1/66?
- CPC G03F1/66 is the Cooperative Patent Classification code for “Containers specially adapted for masks, mask blanks or pellicles; Preparation thereof.”
- How many patents are filed under CPC G03F1/66 (Containers specially adapted for masks, mask blanks or pellicles; Preparation thereof)?
- Our database includes 582 publications tagged with this CPC code.
- Is patent activity under CPC G03F1/66 growing?
- Publication counts under this code: 65 in 2024 vs 59 in 2025 (latest complete years).