Pellicle frame, pellicle and method of manufacturing the same, original plate for exposure and method of manufacturing the same, exposure device, and method of manufacturing semiconductor device

Patent metadata

Field	Value
Publication number	US-2017192349-A1
Application number	US-201515304996-A
Country	US
Kind code	A1
Filing date	Apr 27, 2015
Priority date	May 2, 2014
Publication date	Jul 6, 2017
Grant date	—

Abstract

A pellicle frame containing a frame body, the frame body having a groove formed in one end surface of the frame body, the one end surface being an end surface in a thickness direction of the frame body that is located at a side configured to support a pellicle membrane, and a through-hole that penetrates through a portion between an outer circumferential surface of the frame body and a wall surface of the groove formed in the one end surface.

First claim

1 . A pellicle frame comprising a frame body, the frame body having
a groove formed in one end surface of the frame body, the one end surface being an end surface in a thickness direction of the frame body that is located at a side configured to support a pellicle membrane, and a through-hole that penetrates through a portion between an outer circumferential surface of the frame body and a wall surface of the groove formed in the one end surface.

2 . The pellicle frame according to claim 1 , wherein
the frame body further has a groove formed in the other end surface in the thickness direction of the frame body, and a through-hole that penetrates through a portion between the outer circumferential surface and a wall surface of the groove formed in the other end surface.

3 . The pellicle frame according to claim 1 , further comprising an adhesive layer that contacts the one end surface.

4 . A pellicle comprising:
a first pellicle frame that is the pellicle frame according to claim 1 ; and a pellicle membrane supported at a side of the frame body of the first pellicle frame at which the one end surface is located.

5 . The pellicle according to claim 4 , wherein the pellicle membrane comprises at least one inorganic material selected from the group consisting of crystalline silicon, diamond-like carbon, graphite, amorphous carbon, graphene, silicon carbides, silicon nitrides, and aluminum nitrides.

6 . The pellicle according to claim 4 , wherein the pellicle membrane has a thickness of from 10 nm to 200 nm.

7 . The pellicle according to claim 4 , further comprising a second pellicle frame that contacts the pellicle membrane, the second pellicle frame being provided between the first pellicle frame and the pellicle membrane.

8 . The pellicle according to claim 7 , wherein the pellicle comprises a composite member, the composite member including a crystalline silicon film as the pellicle membrane and a frame-shaped silicon substrate as the second pellicle frame.

9 . A method of manufacturing a pellicle, comprising:
an arrangement process of arranging the pellicle frame according to claim 1 and a pellicle membrane such that the one end surface of the frame body and the pellicle membrane face each other; and a fixing process of fixing the pellicle frame and the pellicle membrane by reducing pressure inside the groove formed in the one end surface through the through-hole that penetrates through the portion between the outer circumferential surface and the wall surface of the groove formed in the one end surface.

10 . The method of manufacturing a pellicle according to claim 9 , wherein in the fixing process, the reducing of the pressure is performed in a state in which the pellicle frame and the pellicle membrane are disposed in a pressurized atmosphere.

11 . An original plate for exposure, comprising:
the pellicle according to claim 4 ; and an original plate disposed on a first pellicle frame side of the pellicle.

12 . The original plate for exposure according to claim 11 , wherein the frame body of the first pellicle frame further has a groove formed in the other end surface of the frame body, the other end surface being in the thickness direction, and a through-hole that penetrates through a portion between the outer circumferential surface and a wall surface of the groove formed in the other end surface.

13 . A method of manufacturing an original plate for exposure, comprising:
an arrangement process of arranging the pellicle according to claim 4 and an original plate, wherein the frame body of the first pellicle frame further has a groove formed in the other end surface in the thickness direction of the frame body, and a through-hole that penetrates through a portion between the outer circumferential surface and a wall surface of the groove formed in the other end surface, and the arranging is performed such that the other end surface and the original plate face each other, and a fixing process of fixing the pellicle and the original plate by reducing pressure inside the groove formed in the other end surface through the through-hole that penetrates through the portion between the outer circumferential surface and the wall surface of the groove formed in the other end surface.

14 . The method of manufacturing an original plate for exposure according to claim 13 , wherein the reducing of pressure in the fixing process is performed in a state in which the pellicle and the original plate are disposed in a pressurized atmosphere.

15 . An exposure device comprising the original plate for exposure according to claim 11 .

16 . An exposure device comprising:
a light source configured to emit exposure light; the original plate for exposure according to claim 11 ; and an optical system configured to guide the exposure light emitted from the light source toward the original plate for exposure, wherein the original plate for exposure is disposed such that the exposure light emitted from the light source passes through the pellicle membrane to irradiate the original plate.

17 . The exposure device according to claim 16 , wherein the exposure light is EUV light.

18 . A method of manufacturing a semiconductor device, comprising:
a step of allowing exposure light emitted from a light source to pass through the pellicle membrane of the original plate for exposure according to claim 11 , irradiate the original plate and be reflected from the original plate; and a step of allowing the exposure light reflected from the original plate to pass through the pellicle membrane and irradiate a sensitive substrate, thereby exposing the sensitive substrate in a pattern.

19 . The method of manufacturing a semiconductor device according to claim 18 , wherein the exposure light is EUV light.

Assignees

• Mitsui Chemicals Inc

Inventors

• Kohmura Kazuo
• Ono Yosuke
• Taneichi Daiki
• Sato Yasuyuki
• Hirota Toshiaki

Classifications

• H10P72/1906

  specially adapted for containing masks, reticles or pellicles · CPC title

• G03F7/2004

  characterised by the use of a particular light source, e.g. fluorescent lamps or deep UV light · CPC title

• G03F1/22

  Masks or mask blanks for imaging by radiation of 100nm or shorter wavelength, e.g. X-ray masks, extreme ultraviolet [EUV] masks; Preparation thereof · CPC title

• G03F1/62 Primary

  Pellicles, e.g. pellicle assemblies, e.g. having membrane on support frame; Preparation thereof · CPC title

• G03F1/64 Primary

  characterised by the frames, e.g. structure or material, including bonding means therefor · CPC title