State Transition Temperature of Resist Structures
US-2024125721-A1 · Apr 18, 2024 · US
Organic absorbers, e.g. of photo-resists
Organic absorbers, e.g. of photo-resists · Cooperative Patent Classification (CPC)
Computing, optics, measurement, and control technologies.
Related technology areas
Mapped technology topics for this CPC code.
| Metric | Value |
|---|---|
| CPC code | G03F1/56 |
| Official title | Organic absorbers, e.g. of photo-resists |
| Display label | Organic absorbers, e.g. of photo-resists |
| Total patents | 199 |
Filing trend
Year-over-year patent counts classified under this CPC code.
Filing activity over the last five years is growing.
| Year | Patents |
|---|---|
| 2015 | 13 |
| 2016 | 7 |
| 2017 | 12 |
| 2018 | 10 |
| 2019 | 10 |
| 2020 | 14 |
| 2021 | 17 |
| 2022 | 12 |
| 2023 | 35 |
| 2024 | 31 |
| 2025 | 31 |
| 2026 | 7 |
Representative patents
Representative publications under this CPC code from precomputed stats, or recent filings when stats are unavailable.
Method of forming patterns, integrated circuit device, and method of manufacturing the integrated circuit device
US-2020411318-A1 · Dec 31, 2020 · US
Lithography techniques for reducing resist swelling
US-10866517-B2 · Dec 15, 2020 · US
Composition for forming silicon-containing resist underlayer film and patterning process
US-2020341377-A1 · Oct 29, 2020 · US
Method for designing photomask and semiconductor photolithography process
US-2020241431-A1 · Jul 30, 2020 · US
Lithography Techniques for Reducing Resist Swelling
US-2020142316-A1 · May 7, 2020 · US
Resist underlayer composition, and method of forming patterns using the composition
US-2020081346-A1 · Mar 12, 2020 · US
Chemically amplified positive-type photosensitive resin composition, photosensitive dry film, method of manufacturing photosensitive dry film, method of manufacturing patterned resist film, method of manufacturing substrate with template, method of manufacturing plated article, and nitrogen-containing aromatic heterocyclic compound
US-2020004150-A1 · Jan 2, 2020 · US
Lithography techniques for reducing resist swelling
US-10520822-B2 · Dec 31, 2019 · US
Organometallic solution based high resolution patterning compositions
US-2019369489-A1 · Dec 5, 2019 · US
Patterning process
US-2019354016-A1 · Nov 21, 2019 · US
Template and template manufacturing method
US-10459335-B2 · Oct 29, 2019 · US
Organometallic solution based high resolution patterning compositions
US-10416554-B2 · Sep 17, 2019 · US
Monomer, organic layer composition, organic layer, and method of forming patterns
US-10364221-B2 · Jul 30, 2019 · US
Manufacturing method of semiconductor device
US-2019115359-A1 · Apr 18, 2019 · US
Method for processing a carrier, a carrier, an electronic device and a lithographic mask
US-10241391-B2 · Mar 26, 2019 · US
Pellicle composition for photomask, pellicle for photomask formed from the pellicle composition, method of forming the pellicle, reticle including the pellicle, and exposure apparatus for lithography including the reticle
US-2019033704-A1 · Jan 31, 2019 · US
Lithography Techniques for Reducing Resist Swelling
US-2019004430-A1 · Jan 3, 2019 · US
Chemical amplification resist composition, resist film using the same, resist-coated mask blank, method of forming photomask and pattern, and method of manufacturing electronic device and electronic device
US-10139727-B2 · Nov 27, 2018 · US
Film mask, method for manufacturing same, and method for forming pattern using film mask
US-2018329286-A1 · Nov 15, 2018 · US
Frequently asked questions
Answers are generated from the same data shown on this page.
- What is CPC G03F1/56?
- CPC G03F1/56 is the Cooperative Patent Classification code for “Organic absorbers, e.g. of photo-resists.”
- How many patents are filed under CPC G03F1/56 (Organic absorbers, e.g. of photo-resists)?
- Our database includes 199 publications tagged with this CPC code.
- Is patent activity under CPC G03F1/56 growing?
- Publication counts under this code: 31 in 2024 vs 31 in 2025 (latest complete years).