Patterning using multi-mask exposure

Patterning using multi-mask exposure · Cooperative Patent Classification (CPC)

Computing, optics, measurement, and control technologies.

Related technology areas

Mapped technology topics for this CPC code.

CPC classification statistics
MetricValue
CPC codeG02F1/13625
Official title{Patterning using multi-mask exposure}
Display labelPatterning using multi-mask exposure
Total patents153

Filing trend

Year-over-year patent counts classified under this CPC code.

Filing activity over the last five years is rapidly declining.

Patents filed per year
YearPatents
201514
201620
201727
201820
201930
202015
202113
20225
20231
20246
20252

Representative patents

Representative publications under this CPC code from precomputed stats, or recent filings when stats are unavailable.

Frequently asked questions

Answers are generated from the same data shown on this page.

What is CPC G02F1/13625?
CPC G02F1/13625 is the Cooperative Patent Classification code for “Patterning using multi-mask exposure.”
How many patents are filed under CPC G02F1/13625 (Patterning using multi-mask exposure)?
Our database includes 153 publications tagged with this CPC code.
Is patent activity under CPC G02F1/13625 growing?
Publication counts under this code: 6 in 2024 vs 2 in 2025 (latest complete years).