Low temperature poly-silicon (LTPS) thin film transistor based liquid crystal display

Patent metadata

Field	Value
Publication number	US-9704884-B2
Application number	US-201514436063-A
Country	US
Kind code	B2
Filing date	Jan 21, 2015
Priority date	Dec 31, 2014
Publication date	Jul 11, 2017
Grant date	Jul 11, 2017

Abstract

An array substrate comprises a substrate, a common electrode formed on the substrate, a light shielding layer disposed on the common electrode, an insulating layer disposed on the light shielding layer and the common electrode, a poly-silicon layer, a gate insulating layer, a gate connected with the common electrode by a hole, a medium layer and a source drain. A method for manufacturing the array substrate comprises forming a transparent conductive layer and a first metallic layer on the substrate, forming patterned common electrode and light shielding layer by multiple steps of etching so that a process of photomask can be saved, and forming holes connecting with the common electrode and the gate by a photomask etching process, then manufacturing a medium layer and a source drain. The method adopts seven processes of photomask so that the process is simplified, and the cost is lowered.

First claim

What is claimed is:

1. A method for manufacturing an array substrate, the method comprising:
providing a substrate, and forming a transparent conductive layer and a first metallic layer on the substrate in sequence;
forming a photoresist layer on the first metallic layer, patterning the photoresist layer by a photomask, so that the patterned photoresist layer comprising two first sections and one second section, wherein a thickness of the two first sections is greater than a thickness of the second section;
patterning the transparent conductive layer and the first metallic layer by two etching processes for forming a common electrode and a light shielding layer, wherein the light shielding layer comprises a first light shielding section, a second light shielding section and an edge section, the first light shielding section, the second light shielding section and the edge section are disposed apart by an interval in a same layer, an orthographic projection of the edge section is at the common electrode, an orthographic projection of the second section is at the edge section, and orthographic projections of the two first sections are at the first light shielding section and the second light shielding section;
removing the patterned photoresist layer and the edge section on the common electrode by two etching processes;
forming an insulating layer on the light shielding layer and the common electrode;
forming a poly-silicon layer by patterning on the insulating layer, wherein the poly-silicon layer comprises a first poly-silicon section and a second poly-silicon section, an orthographic projection of the first poly-silicon section is at the first light shielding section, and an orthographic projection of the second poly-silicon layer is at the second light shielding layer;
forming a gate insulating layer on the poly-silicon layer and the insulating layer, forming a hole on the gate insulating layer by a photomask and an etching process and defining a first doping section, wherein the hole passes through the gate insulating layer and the insulating layer and the hole exposes the common electrode, and the first doping section is disposed at two lateral sides of the first poly-silicon section;
injecting a first type ion to the first doping section; and
forming a second metallic layer at the gate insulating layer, patterning the second metallic layer for forming a gate, and the gate connecting with the common electrode through the hole.

2. The method for manufacturing an array substrate according to claim 1 , wherein the method for manufacturing an array substrate further comprises: defining a second doping section and injecting a second ion to the second doping section, wherein the second doping section is disposed at two lateral sides of the second poly-silicon section;
forming a medium layer on the gate and the gate insulating layer, and forming a source drain layer on the medium layer;
patterning the source drain layer by a photomask etching process for forming a source drain corresponding to the first poly-silicon section and the source drain corresponding to the second poly-silicon section, wherein the source drain connects with the first doping section and the second doping section by the hole, respectively; and
forming a patterned pixel layer on the source drain and the medium layer.

3. The method for manufacturing an array substrate according to claim 2 , wherein patterning the transparent conductive layer and the first metallic layer by two etching processes for forming the common electrode and the light shielding layer comprises: etching the first metallic layer exposed between the two first sections and between one first section of the two first sections and the second section for forming the first light shielding section, the second light shielding section and the edge section of the light shielding layer; and
wet etching the transparent conductive layer exposing from the light shielding layer for forming the common electrode.

4. The method for manufacturing an array substrate according to claim 3 , wherein removing the light shielding layer and the edge section on the common electrode by an etching process comprises: after removing the second section and part of the first section by dry etching, removing rest part of the first section and the edge section at the common electrode by a dry etching process.

5. The method for manufacturing an array substrate according to claim 2 , wherein forming the hole on the gate insulating layer by a photomask and an etching process and defining a first doping section comprises:
forming the patterned photoresist layer on the gate insulating layer by a semipermeable membrane photomask for forming an electrode hole and two implanting holes;
dry etching the gate insulating layer and the insulating layer corresponding to the electrode hole for forming the hole; and
removing part of the photoresist layer and penetrating the two implanting holes by etching for forming the two implanting holes connecting with the gate insulating layer, and positions of the two implanting holes corresponding to the first doping section.

6. The method for manufacturing an array substrate according to claim 5 , wherein the first type ion is a P type ion, the second type ion is a N type ion, alternatively, the second type ion is a P type ion, and the first type ion is a N type ion.

Assignees

• Shenzhen China Star Optoelectrics Tech Co Ltd
• Shenzhen China Star Optoelect

Inventors

• Dai Tianming

Classifications

• H10P76/204

  of organic photoresist masks · CPC title

• H10P50/283

  by chemical means · CPC title

• H10P50/264

  by chemical means · CPC title

• H10P14/3456

  Polycrystalline · CPC title

• H10P14/3411

  Silicon, silicon germanium or germanium · CPC title