Method of forming a patterned layer of material, apparatus for forming a patterned layer of material
US-2025369101-A1 · Dec 4, 2025 · US
using electron radiation
using electron radiation · Cooperative Patent Classification (CPC)
Chemical and metallurgical processes, compounds, and materials.
Related technology areas
Mapped technology topics for this CPC code.
| Metric | Value |
|---|---|
| CPC code | C23C16/487 |
| Official title | {using electron radiation} |
| Display label | using electron radiation |
| Total patents | 61 |
Filing trend
Year-over-year patent counts classified under this CPC code.
Filing activity over the last five years is rapidly growing.
| Year | Patents |
|---|---|
| 2015 | 6 |
| 2016 | 3 |
| 2017 | 10 |
| 2018 | 3 |
| 2019 | 4 |
| 2020 | 8 |
| 2021 | 4 |
| 2022 | 5 |
| 2023 | 4 |
| 2024 | 4 |
| 2025 | 9 |
| 2026 | 1 |
Representative patents
Representative publications under this CPC code from precomputed stats, or recent filings when stats are unavailable.
Methods of repairing extreme ultraviolet photomasks
US-2025362590-A1 · Nov 27, 2025 · US
Method and apparatus for forming a patterned layer of material
US-12399428-B2 · Aug 26, 2025 · US
Method and apparatus for forming a patterned layer of material
US-12325911-B2 · Jun 10, 2025 · US
Carbon containing precursors for beam-induced deposition
US-2025163571-A1 · May 22, 2025 · US
Methods of repairing extreme ultraviolet photomasks
US-2025130490-A1 · Apr 24, 2025 · US
Method of forming semiconductor device having carbon nanotube
US-2025098515-A1 · Mar 20, 2025 · US
Adjustable multiple filament ion beam deposition system
US-2025087441-A1 · Mar 13, 2025 · US
Method of forming semiconductor device having carbon nanotube
US-12193318-B2 · Jan 7, 2025 · US
Restoring method of consumed component
US-2024254620-A1 · Aug 1, 2024 · US
Electron-enhanced atomic layer deposition (ee-ald) methods and devices prepared by same
US-2024240317-A1 · Jul 18, 2024 · US
Method and apparatus for determining optical properties of deposition materials used for lithographic masks
US-2024219844-A1 · Jul 4, 2024 · US
Forming method of component and substrate processing system
US-11981993-B2 · May 14, 2024 · US
Graphene printing
US-11834739-B2 · Dec 5, 2023 · US
Thin film forming method
US-11823866-B2 · Nov 21, 2023 · US
Method and apparatus for forming a patterned layer of material
US-2023350301-A1 · Nov 2, 2023 · US
Thin film laminate, thin film device and multilayer substrate
US-11594668-B2 · Feb 28, 2023 · US
Method for preparing a sample for transmission electron microscopy
US-11437217-B2 · Sep 6, 2022 · US
Method and apparatus for forming a patterned layer of material
US-2022213593-A1 · Jul 7, 2022 · US
Nanofabrication using a new class of electron beam induced surface processing techniques
US-11377740-B2 · Jul 5, 2022 · US
Frequently asked questions
Answers are generated from the same data shown on this page.
- What is CPC C23C16/487?
- CPC C23C16/487 is the Cooperative Patent Classification code for “using electron radiation.”
- How many patents are filed under CPC C23C16/487 (using electron radiation)?
- Our database includes 61 publications tagged with this CPC code.
- Is patent activity under CPC C23C16/487 growing?
- Publication counts under this code: 4 in 2024 vs 9 in 2025 (latest complete years).