Selective cobalt deposition on copper surfaces
US-2017321320-A1 · Nov 9, 2017 · US
from metal carbonyl compounds
from metal carbonyl compounds · Cooperative Patent Classification (CPC)
Chemical and metallurgical processes, compounds, and materials.
Related technology areas
Mapped technology topics for this CPC code.
| Metric | Value |
|---|---|
| CPC code | C23C16/16 |
| Official title | from metal carbonyl compounds |
| Display label | from metal carbonyl compounds |
| Total patents | 270 |
Filing trend
Year-over-year patent counts classified under this CPC code.
Filing activity over the last five years is growing.
| Year | Patents |
|---|---|
| 2015 | 25 |
| 2016 | 25 |
| 2017 | 16 |
| 2018 | 27 |
| 2019 | 22 |
| 2020 | 27 |
| 2021 | 22 |
| 2022 | 21 |
| 2023 | 30 |
| 2024 | 25 |
| 2025 | 27 |
| 2026 | 3 |
Representative patents
Representative publications under this CPC code from precomputed stats, or recent filings when stats are unavailable.
Method for purifying dodecacarbonyl triruthenium
US-9783429-B2 · Oct 10, 2017 · US
Ruthenium film forming method, film forming apparatus, and semiconductor device manufacturing method
US-9779950-B2 · Oct 3, 2017 · US
Method and device for permanently repairing defects of absent material of a photolithographic mask
US-2017248842-A1 · Aug 31, 2017 · US
Ruthenium metal deposition method for electrical connections
US-2017241014-A1 · Aug 24, 2017 · US
Tantalum compound and methods of forming thin film and fabricating integrated circuit device by using the same
US-2017178961-A1 · Jun 22, 2017 · US
Fluorine free tungsten ALD/CVD process
US-9637395-B2 · May 2, 2017 · US
Method for purifying dodecacarbonyl triruthenium
US-2017107118-A1 · Apr 20, 2017 · US
Chemical deposition raw material formed of ruthenium complex and method for producing the same, and chemical deposition method
US-9556212-B2 · Jan 31, 2017 · US
Film forming method, film forming apparatus and recording medium
US-9540733-B2 · Jan 10, 2017 · US
Cobalt precursors
US-2016369402-A1 · Dec 22, 2016 · US
Ruthenium metal feature fill for interconnects
US-2016358815-A1 · Dec 8, 2016 · US
Metal Nanodot Formation Method, Metal Nanodot Formation Apparatus and Semiconductor Device Manufacturing Method
US-2016343817-A1 · Nov 24, 2016 · US
Device for producing and method for producing dodecacarbonyl triruthenium
US-9499411-B2 · Nov 22, 2016 · US
Method for forming cobalt containing films
US-9487860-B2 · Nov 8, 2016 · US
Vessel and method for delivery of precursor materials
US-2016305019-A1 · Oct 20, 2016 · US
Process of filling the high aspect ratio trenches by co-flowing ligands during thermal cvd
US-2016293483-A1 · Oct 6, 2016 · US
Ultrathin multilayer metal alloy liner for nano cu interconnects
US-2016276216-A1 · Sep 22, 2016 · US
Ruthenium compound, material for thin film formation, and process for thin film formation
US-2016272664-A1 · Sep 22, 2016 · US
Ultrathin multilayer metal alloy liner for nano cu interconnects
US-2016276280-A1 · Sep 22, 2016 · US
Frequently asked questions
Answers are generated from the same data shown on this page.
- What is CPC C23C16/16?
- CPC C23C16/16 is the Cooperative Patent Classification code for “from metal carbonyl compounds.”
- How many patents are filed under CPC C23C16/16 (from metal carbonyl compounds)?
- Our database includes 270 publications tagged with this CPC code.
- Is patent activity under CPC C23C16/16 growing?
- Publication counts under this code: 25 in 2024 vs 27 in 2025 (latest complete years).