Moderately alkaline cleaning compositions for proteinaceous and fatty soil removal at low temperatures
US-9803160-B2 · Oct 31, 2017 · US
Heterocyclic compounds
Heterocyclic compounds · Cooperative Patent Classification (CPC)
Chemical and metallurgical processes, compounds, and materials.
Related technology areas
Mapped technology topics for this CPC code.
| Metric | Value |
|---|---|
| CPC code | C11D7/3281 |
| Official title | {Heterocyclic compounds} |
| Display label | Heterocyclic compounds |
| Total patents | 305 |
Filing trend
Year-over-year patent counts classified under this CPC code.
Filing activity over the last five years is growing.
| Year | Patents |
|---|---|
| 2015 | 22 |
| 2016 | 29 |
| 2017 | 28 |
| 2018 | 19 |
| 2019 | 28 |
| 2020 | 26 |
| 2021 | 21 |
| 2022 | 32 |
| 2023 | 24 |
| 2024 | 31 |
| 2025 | 32 |
| 2026 | 13 |
Representative patents
Representative publications under this CPC code from precomputed stats, or recent filings when stats are unavailable.
Cleaning liquid and method for cleaning
US-2017253840-A1 · Sep 7, 2017 · US
Cleaning and disinfecting composition
US-2017216471-A1 · Aug 3, 2017 · US
Antioxidants for post-CMP cleaning formulations
US-RE46427-E · Jun 6, 2017 · US
Cleaning formulation for removing residues on surfaces
US-2017101608-A1 · Apr 13, 2017 · US
Cleaning Formulations
US-2017081622-A1 · Mar 23, 2017 · US
Resist removing liquid, resist removal method using same and method for producing photomask
US-9588428-B2 · Mar 7, 2017 · US
Cleaning formulation for removing residues on surfaces
US-9562211-B2 · Feb 7, 2017 · US
Detergent compositions containing pyridinol-N-oxide compositions
US-9550964-B2 · Jan 24, 2017 · US
Substrate processing method
US-2016375547-A1 · Dec 29, 2016 · US
Antioxidants for post-CMP cleaning formulations
US-9528078-B2 · Dec 27, 2016 · US
Environmentally friendly formulations for bi-component heterocyclic schiff base textile finishes
US-2016366888-A1 · Dec 22, 2016 · US
Microbicidal composition
US-2016324164-A1 · Nov 10, 2016 · US
Removal composition for selectively removing hard mask and methods thereof
US-2016312162-A1 · Oct 27, 2016 · US
Cleaning agent for semiconductor provided with metal wiring
US-9476019-B2 · Oct 25, 2016 · US
N-alkyl lactam ethers, and compositions and uses thereof
US-2016271254-A1 · Sep 22, 2016 · US
Cleaning agent for semiconductor substrates and method for processing semiconductor substrate surface
US-2016272924-A1 · Sep 22, 2016 · US
Semiconductor substrate treatment liquid, treatment method, and method for manufacturing semiconductor-substrate product using these
US-2016254139-A1 · Sep 1, 2016 · US
Removal Composition for Selectively Removing Hard Mask and Methods Thereof
US-2016254182-A1 · Sep 1, 2016 · US
Cleaner composition for process of manufacturing semiconductor and display
US-2016215241-A1 · Jul 28, 2016 · US
Frequently asked questions
Answers are generated from the same data shown on this page.
- What is CPC C11D7/3281?
- CPC C11D7/3281 is the Cooperative Patent Classification code for “Heterocyclic compounds.”
- How many patents are filed under CPC C11D7/3281 (Heterocyclic compounds)?
- Our database includes 305 publications tagged with this CPC code.
- Is patent activity under CPC C11D7/3281 growing?
- Publication counts under this code: 31 in 2024 vs 32 in 2025 (latest complete years).