Cleaning formulation for removing residues on surfaces

Patent metadata

Field	Value
Publication number	US-9562211-B2
Application number	US-201414558767-A
Country	US
Kind code	B2
Filing date	Dec 3, 2014
Priority date	Dec 6, 2013
Publication date	Feb 7, 2017
Grant date	Feb 7, 2017

Abstract

This disclosure relates to a cleaning composition that contains 1) at least one redox agent; 2) at least one first chelating agent, the first chelating agent being a polyaminopolycarboxylic acid; 3) at least one second chelating agent different from the first chelating agent, the second chelating agent containing at least two nitrogen-containing groups; 4) at least one metal corrosion inhibitor, the metal corrosion inhibitor being a substituted or unsubstituted benzotriazole; 5) at least one organic solvent selected from the group consisting of water soluble alcohols, water soluble ketones, water soluble esters, and water soluble ethers; 6) water; and 7) optionally, at least one pH adjusting agent, the pH adjusting agent being a base free of a metal ion. This disclosure also relates to a method of using the above composition for cleaning a semiconductor substrate.

First claim

What is claimed is:

1. A cleaning composition, comprising:
1) at least one redox agent;
2) at least one first chelating agent, the first chelating agent being a polyaminopolycarboxylic acid;
3) at least one second chelating agent different from the first chelating agent, the second chelating agent comprising at least two nitrogen-containing groups;
4) at least one metal corrosion inhibitor, the metal corrosion inhibitor being a substituted or unsubstituted benzotriazole;
5) at least one organic solvent selected from the group consisting of water soluble alcohols, water soluble ketones, water soluble esters, and water soluble ethers;
6) water; and
7) optionally, at least one pH adjusting agent, the pH adjusting agent being a base free of a metal ion;
wherein the composition is free of a metal halide of the formula W z MX y in which W is selected from H, an alkali or alkaline earth metal, and a metal-ion-free hydroxide base moiety; M is a metal selected from the group consisting of Si, Ge, Sn, Pt, P, B, Au, Ir, Os, Cr, Ti, Zr, Rh, Ru and Sb; y is from 4 to 6; and z is 1, 2, or 3.

2. The composition of claim 1 , wherein the pH of the composition is between 6 and about 11.

3. The composition of claim 1 , wherein the redox agent is hydroxylamine.

4. The composition of claim 1 , wherein the composition comprises from about 0.5% to about 20% by weight of the redox agent.

5. The composition of claim 1 , wherein the polyaminopolycarboxylic acid is selected from the group consisting of mono- or polyalkylene polyamine polycarboxylic acids, polyaminoalkane polycarboxylic acids, polyaminoalkanol polycarboxylic acids, and hydroxyalkylether polyamine polycarboxylic acids.

6. The composition of claim 1 , wherein the polyaminopolycarboxylic acid is selected from the group consisting of butylenediaminetetraacetic acid, diethylenetriaminepentaacetic acid, ethylenediaminetetrapropionic acid, triethylenetetraminehexaacetic acid, 1,3-diamino-2-hydroxypropane-N,N,N′,N′-tetraacetic acid, propylenediaminetetraacetic acid, ethylenediaminetetraacetic acid, trans-1,2-diaminocyclohexane tetraacetic acid, ethylendiamine diacetic acid, ethylendiamine dipropionic acid, 1,6-hexamethylene-diamine-N,N,N′,N′-tetraacetic acid, N,N-bis(2-hydroxybenzyl)ethylenediamine-N,N-diacetic acid, diaminopropane tetraacetic acid, iminodiacetic acid; 1,4,7,10-tetraazacyclododecane-tetraacetic acid, diaminopropanol tetraacetic acid, and (hydroxyethyl)ethylenediaminetriacetic acid.

7. The composition of claim 1 , wherein the composition comprises from about 0.01% to about 1% by weight of the polyaminopolycarboxylic acid.

8. The composition of claim 1 , wherein the second chelating agent is a monocarboxylic acid containing a primary or secondary amino group and at least one additional basic group containing nitrogen.

9. The composition of claim 8 , wherein the monocarboxylic acid is a compound of Structure (I):
(R 3 NH)C(R 1 )(R 2 )CO 2 H  (I),

wherein
each of R 1 and R 2 , independently, is a hydrogen atom, C 1 -C 4 alkyl, or a group having at least one nitrogen-containing basic group; and
R 3 is a hydrogen atom, C 1 -C 10 alkyl, or a group having at least one nitrogen-containing basic group;
wherein at least one of R 1 , R 2 , and R 3 is a group having at least one nitrogen-containing basic group.

10. The composition of claim 9 , wherein R 1 is a group having at least one nitrogen-containing basic group, in which the group having at least one nitrogen-containing basic group is C 1 -C 10 alkyl substituted by amino, guanidinyl, or imidazolyl and optionally further substituted by OH.

11. The composition of claim 10 , wherein R 2 is H or C 1 -C 10 alkyl and R 3 is H, C 1 -C 10 alkyl, or a group having at least one nitrogen-containing basic group, in which the group having at least one nitrogen-containing basic group is C 1 -C 10 alkyl optionally substituted by amino, guanidinyl, or imidazolyl and optionally further substituted by OH.

12. The composition of claim 9 , wherein R 3 is a group having at least one nitrogen-containing basic group, in which the group having at least one nitrogen-containing basic group is C 1 -C 10 alkyl substituted by amino, guanidinyl, or imidazolyl and optionally further substituted by OH.

13. The composition of claim 12 , wherein each of R 1 and R 2 , independently, is H or C 1 -C 4 alkyl.

14. The composition of claim 8 , wherein the monocarboxylic acid is selected from the group consisting of lysine, 2,3-diaminobutyric acid, 2,4-diaminobutyric acid, ornithine, 2,3-diaminopropionic acid, 2,6-diaminoheptanoic acid, 4-methyl lysine, 3-methyl lysine, 5-hydroxylysine, 3-methyl-L-arginine, arginine, homoarginine, N 5 -monomethyl-L-arginine, N 5 -[imino(methylamino)methyl]-D-ornithine, canavanine, histidine, N-(2-aminoethyl)glycine, N-(2-aminopropyl)glycine, N 2 -methyllysine, N 2 -methyl-L-arginine, N 2 -(2-aminoethyl)-D-arginine, N 2 -(2-aminoethyl)-L-arginine, 2-methyllysine, 2-methyl-L-arginine, 3,4-diaminobutyric acid, and 3-amino-5-[(aminoiminomethyl)methylamino] pentanoic acid.

15. The composition of claim 1 , wherein the second chelating agent is a compound of Structure (II):

in which
R 10 , R 11 , R 12 , and R 13 are independently selected from the group consisting of hydrogen substituted or unsubstituted aryl, substituted or unsubstituted C 3 -C 10 cyclic alkyl, and substituted or unsubstituted C 1 -C 10 linear or branched alkyl; and
R 14 is hydrogen or a single bond that together with R 13 forms an imidazole ring;
provided that at least one of R 10 , R 11 , R 12 and R 13 is an aryl group or contains an aryl substituent and that at least two of R 10 , R 11 , R 12 and R 13 are hydrogen.

16. The composition of claim 1 , wherein the second chelating agent is a compound of Structure (III):

in which
R 20 , R 21 , R 22 and R 23 are independently selected from the group consisting of hydrogen, substituted or unsubstituted aryl, substituted or unsubstituted C 3 -C 10 cyclic alkyl, and substituted or unsubstituted C 1 -C 10 linear or branched alkyl;
each R 24 is independently selected from the group consisting of hydrogen, substituted or unsubstituted aryl, substituted or unsubstituted phenylethyl, or substituted or unsubstituted benzyl alkyl; and
m is an integer from 1 to 10;
provided that at least one of R 20 , R 21 , R 22 , R 23 and R 24 is an aryl group or contains an aryl substituent and that at least two of R 20 , R 21 , R 22 , and R 23 are hydrogen.

17. The composition of claim 1 , where the second chelating agent is chlorhexidine, an alkylenediamine, diethylenetriamine, triethylenetetramines, or a polyethyleneimine.

18. A cleaning composition, comprising:
1) at least one redox agent;
2) at least one first chelating agent, the first chelating agent being a polyaminopolycarboxylic acid;
3) at least one second chelating agent different from the first chelating agent, the second chelating agent comprising at least two nitrogen-containing groups;
4) at least one metal corrosion inhibitor, the metal corrosion inhibitor being a substituted or unsubstituted benzotriazole;
5) at least one organic solvent selected from the group consisting of water soluble alcohols, water soluble ketones, water soluble esters, and water soluble ethers;
6) water; and
7) optionally, at least one pH adjusting agent, the

Assignees

• Fujifilm Electronic Mat Usa Inc

Inventors

• Takahashi Tomonori
• Du Bing
• Wojtczak William A
• Dory Thomas
• Kneer Emil A

Classifications

• H10P76/204

  of organic photoresist masks · CPC title

• H10P70/273

  the processing being a delineation of conductive layers, e.g. by RIE · CPC title

• H10P70/234

  the processing being the formation of vias or contact holes · CPC title

• H10P70/27

  during, before or after processing of conductive materials, e.g. polysilicon or amorphous silicon layers · CPC title

• H10P50/287

  by chemical means · CPC title