Composition for surface treatment, method for producing the same, surface treatment method, and method for producing semiconductor substrate
US-12012575-B2 · Jun 18, 2024 · US
Organic compounds
Organic compounds · Cooperative Patent Classification (CPC)
Chemical and metallurgical processes, compounds, and materials.
Related technology areas
Mapped technology topics for this CPC code.
| Metric | Value |
|---|---|
| CPC code | C11D7/22 |
| Official title | Organic compounds |
| Display label | Organic compounds |
| Total patents | 69 |
Filing trend
Year-over-year patent counts classified under this CPC code.
Filing activity over the last five years is declining.
| Year | Patents |
|---|---|
| 2015 | 2 |
| 2016 | 5 |
| 2017 | 2 |
| 2018 | 8 |
| 2019 | 13 |
| 2020 | 7 |
| 2021 | 8 |
| 2022 | 5 |
| 2023 | 7 |
| 2024 | 5 |
| 2025 | 5 |
| 2026 | 2 |
Representative patents
Representative publications under this CPC code from precomputed stats, or recent filings when stats are unavailable.
Cleaning liquid composition
US-11905490-B2 · Feb 20, 2024 · US
Multiuse, enzymatic detergent and methods of stabilizing a use solution
US-11905497-B2 · Feb 20, 2024 · US
Bevel portion treatment agent composition and method of manufacturing wafer
US-11817310-B2 · Nov 14, 2023 · US
Treatment liquid and substrate treatment method
US-2023287304-A1 · Sep 14, 2023 · US
Cleaning solution
US-11685838-B2 · Jun 27, 2023 · US
Cleaning compositions and methods of use thereof
US-2023174905-A1 · Jun 8, 2023 · US
Chemical liquid and treatment method
US-2023112048-A1 · Apr 13, 2023 · US
Cleaning liquid and method for cleaning semiconductor substrate
US-2023088854-A1 · Mar 23, 2023 · US
Cleaning compositions and methods of use thereof
US-11603512-B2 · Mar 14, 2023 · US
Composition for surface treatment, method for producing the same, and surface treatment method using the same
US-11377627-B2 · Jul 5, 2022 · US
Composition comprising an ammonia-activated siloxane for avoiding pattern collapse when treating patterned materials with line-space dimensions of 50 nm or below
US-2022169956-A1 · Jun 2, 2022 · US
Composition for surface treatment
US-11326049-B2 · May 10, 2022 · US
Composition for surface treatment, method for producing the same, surface treatment method, and method for producing semiconductor substrate
US-2022089981-A1 · Mar 24, 2022 · US
Bevel portion treatment agent composition and method of manufacturing wafer
US-2022020582-A1 · Jan 20, 2022 · US
Cleaning compositions and methods of use thereof
US-2021292685-A1 · Sep 23, 2021 · US
Multiuse, enzymatic detergent and methods of stabilizing a use solution
US-2021292682-A1 · Sep 23, 2021 · US
Cleaning composition for semiconductor substrate
US-11053457-B2 · Jul 6, 2021 · US
Composition for surface treatment, method for producing the same, surface treatment method using composition for surface treatment, and method for producing semiconductor substrate
US-11028340-B2 · Jun 8, 2021 · US
Composition for surface treatment, method for producing the same, and surface treatment method using the same
US-2021130751-A1 · May 6, 2021 · US
Frequently asked questions
Answers are generated from the same data shown on this page.
- What is CPC C11D7/22?
- CPC C11D7/22 is the Cooperative Patent Classification code for “Organic compounds.”
- How many patents are filed under CPC C11D7/22 (Organic compounds)?
- Our database includes 69 publications tagged with this CPC code.
- Is patent activity under CPC C11D7/22 growing?
- Publication counts under this code: 5 in 2024 vs 5 in 2025 (latest complete years).