Tungsten dissolution inhibitor, and polishing composition and composition for surface treatment using the same
US-2020095468-A1 · Mar 26, 2020 · US
Other polishing compositions
Other polishing compositions · Cooperative Patent Classification (CPC)
Chemical and metallurgical processes, compounds, and materials.
Related technology areas
Mapped technology topics for this CPC code.
| Metric | Value |
|---|---|
| CPC code | C09G1/06 |
| Official title | Other polishing compositions |
| Display label | Other polishing compositions |
| Total patents | 169 |
Filing trend
Year-over-year patent counts classified under this CPC code.
Filing activity over the last five years is rapidly declining.
| Year | Patents |
|---|---|
| 2015 | 11 |
| 2016 | 11 |
| 2017 | 9 |
| 2018 | 11 |
| 2019 | 14 |
| 2020 | 20 |
| 2021 | 30 |
| 2022 | 18 |
| 2023 | 18 |
| 2024 | 18 |
| 2025 | 9 |
Representative patents
Representative publications under this CPC code from precomputed stats, or recent filings when stats are unavailable.
Chemical mechanical polishing composition and method for tungsten
US-10597558-B1 · Mar 24, 2020 · US
Oxide Chemical Mechanical Planarization (CMP) Polishing Compositions
US-2020048496-A1 · Feb 13, 2020 · US
Calcium carbonate slurry
US-2020002575-A1 · Jan 2, 2020 · US
Polishing liquid and polishing method
US-2019352537-A1 · Nov 21, 2019 · US
Aliphatic UV cured polyurethane optical endpoint detection windows with high UV transparency for CMP polishing pads
US-10465097-B2 · Nov 5, 2019 · US
Barrier ruthenium chemical mechanical polishing slurry
US-2019300749-A1 · Oct 3, 2019 · US
Slurry for polishing of integrated circuit packaging
US-10319601-B2 · Jun 11, 2019 · US
Semiconductor treatment composition and treatment method
US-10319605-B2 · Jun 11, 2019 · US
Chemical mechanical polishing slurry composition for polishing polycrystalline silicon film
US-2019161645-A1 · May 30, 2019 · US
Silica-Based Composite Fine Particle Dispersion and Method for Manufacturing Same
US-2019153279-A1 · May 23, 2019 · US
Aliphatic uv cured polyurethane optical endpoint detection windows with high uv transparency for cmp polishing pads
US-2019144713-A1 · May 16, 2019 · US
Polishing agent, polishing method, and liquid additive for polishing
US-2019136089-A1 · May 9, 2019 · US
Aqueous anionic functional silica slurry and amine carboxylic acid compositions for selective nitride removal in polishing and methods of using them
US-2019092971-A1 · Mar 28, 2019 · US
NITRIDE INHIBITORS FOR HIGH SELECTIVITY OF TiN-SiN CMP APPLICATIONS
US-2019085205-A1 · Mar 21, 2019 · US
Composition for tungsten cmp
US-2019085209-A1 · Mar 21, 2019 · US
Polishing slurry for cobalt-containing substrate
US-10233356-B2 · Mar 19, 2019 · US
Aqueous silica slurry compositions for use in shallow trench isolation and methods of using them
US-10221336-B2 · Mar 5, 2019 · US
Organic Film CMP Slurry Composition and Polishing Method Using Same
US-2018362807-A1 · Dec 20, 2018 · US
Aqueous silica slurry compositions for use in shallow trench isolation and methods of using them
US-2018362805-A1 · Dec 20, 2018 · US
Frequently asked questions
Answers are generated from the same data shown on this page.
- What is CPC C09G1/06?
- CPC C09G1/06 is the Cooperative Patent Classification code for “Other polishing compositions.”
- How many patents are filed under CPC C09G1/06 (Other polishing compositions)?
- Our database includes 169 publications tagged with this CPC code.
- Is patent activity under CPC C09G1/06 growing?
- Publication counts under this code: 18 in 2024 vs 9 in 2025 (latest complete years).