Systems and processes for production of trisilylamine
US-12410056-B2 · Sep 9, 2025 · US
containing one or more hydrogen atoms
containing one or more hydrogen atoms · Cooperative Patent Classification (CPC)
Chemical and metallurgical processes, compounds, and materials.
Related technology areas
Mapped technology topics for this CPC code.
| Metric | Value |
|---|---|
| CPC code | C01B21/087 |
| Official title | containing one or more hydrogen atoms |
| Display label | containing one or more hydrogen atoms |
| Total patents | 60 |
Filing trend
Year-over-year patent counts classified under this CPC code.
Filing activity over the last five years is declining.
| Year | Patents |
|---|---|
| 2015 | 8 |
| 2016 | 10 |
| 2017 | 5 |
| 2018 | 3 |
| 2019 | 9 |
| 2020 | 7 |
| 2021 | 10 |
| 2022 | 2 |
| 2023 | 3 |
| 2025 | 3 |
Representative patents
Representative publications under this CPC code from precomputed stats, or recent filings when stats are unavailable.
Ru-based catalysts for ammonia synthesis at mild conditions
US-2025161922-A1 · May 22, 2025 · US
Production of anhydrous quaternary ammonium hydroxides
US-2025026643-A1 · Jan 23, 2025 · US
Si-containing film forming precursors and methods of using the same
US-11820654-B2 · Nov 21, 2023 · US
Perhydropolysilazane compositions and methods for forming oxide films using same
US-11739220-B2 · Aug 29, 2023 · US
Si-containing film forming precursors and methods of using the same
US-11699584-B2 · Jul 11, 2023 · US
Systems and processes for production of trisilylamine
US-2022332579-A1 · Oct 20, 2022 · US
Chlorodisilazanes
US-2022119947-A1 · Apr 21, 2022 · US
Si-containing film forming precursors and methods of using the same
US-2021395890-A1 · Dec 23, 2021 · US
N—H free and Si-rich per-hydridopolysilzane compositions, their synthesis, and applications
US-11203528-B2 · Dec 21, 2021 · US
Method for producing dialkylamido element compounds
US-2021388006-A1 · Dec 16, 2021 · US
Composition for forming silica layer, silica layer and electronic device incorporating silica layer
US-11201052-B2 · Dec 14, 2021 · US
Si-containing film forming precursors and methods of using the same
US-11124876-B2 · Sep 21, 2021 · US
Process that can withstand high currents, for producing ammonia
US-2021285113-A1 · Sep 16, 2021 · US
Si-CONTAINING FILM FORMING PRECURSORS AND METHODS OF USING THE SAME
US-2021225635-A1 · Jul 22, 2021 · US
Method and precursors for manufacturing 3D devices
US-10985013-B2 · Apr 20, 2021 · US
Perhydropolysilazane compositions and methods for forming oxide films using same
US-2021087406-A1 · Mar 25, 2021 · US
Composition for forming silica layer and silica layer
US-2021053832-A1 · Feb 25, 2021 · US
Method for making an organoaminosilane; a method for making a silylamine from the organoaminosilane
US-10875877-B2 · Dec 29, 2020 · US
Process for production of ammonia and derivatives, in particular urea
US-10858313-B2 · Dec 8, 2020 · US
Frequently asked questions
Answers are generated from the same data shown on this page.
- What is CPC C01B21/087?
- CPC C01B21/087 is the Cooperative Patent Classification code for “containing one or more hydrogen atoms.”
- How many patents are filed under CPC C01B21/087 (containing one or more hydrogen atoms)?
- Our database includes 60 publications tagged with this CPC code.
- Is patent activity under CPC C01B21/087 growing?
- Publication counts under this code: 3 in 2023 vs 3 in 2025 (latest complete years).