Polymer compound, negative resist composition, laminate, patterning process, and compound

US9969829B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-9969829-B2
Application numberUS-201715399220-A
CountryUS
Kind codeB2
Filing dateJan 5, 2017
Priority dateJan 25, 2016
Publication dateMay 15, 2018
Grant dateMay 15, 2018

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  1. Title

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  2. Abstract

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  3. Assignees and inventors

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  4. Key dates

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  5. First independent claim

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  6. CPC / IPC classifications

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  7. Citations and related patents

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Abstract

Official abstract text for this publication.

The present invention provides a polymer compound containing a repeating unit shown by the following general formula (1). There can be provided a polymer compound usable in a negative resist composition that can achieve high resolution of 50 nm or less and small LER and cause very few defects, a negative resist composition using the polymer compound, and a patterning process using the negative resist composition.

First claim

Opening claim text (preview).

What is claimed is: 1. A polymer compound comprising a repeating unit shown by the following general formula (1), wherein A represents a single bond or an alkylene group having 1 to 10 carbon atoms and optionally containing an ether oxygen atom in a chain of the alkylene group; R 1 represents a hydrogen atom, a fluorine atom, a methyl group, or a trifluoromethyl group; R 2 represents a hydrogen atom, a halogen atom, a linear, branched, or cyclic acyloxy group having 2 to 8 carbon atoms and optionally substituted with halogen, a linear, branched, or cyclic alkyl group having 1 to 6 carbon atoms and optionally substituted with halogen, or a linear, branched, or cyclic alkoxy group having 1 to 6 carbon atoms and optionally substituted with halogen; L represents a hydrogen atom, a linear, branched, or cyclic monovalent aliphatic hydrocarbon group having 1 to 10 carbon atoms and optionally containing an ether oxygen atom, a carbonyl group, or a carbonyloxy group in a chain of the hydrocarbon group, or a monovalent aromatic group optionally containing a substituent; “f” represents an integer of 1 to 3; “s” represents 0; “a” represents an integer of 5+2s−f; “m” represents 0 or 1; Rx and Ry represent a hydrogen atom or a substituent shown by the following (i) or (ii), provided that Rx and Ry are not a hydrogen atom at the same time: (i) a monovalent aromatic group optionally containing a substituent; (ii) an alkyl group having 1 to 15 carbon atoms or an aralkyl group having 7 to 15 carbon atoms, each optionally substituted with a halogen atom except for fluorine, a hydroxyl group, or an alkoxy group, in which carbon atoms contained in Rx and Ry and directly bonded to the carbon atom bonded to Rx and Ry are not bonded to hydrogen atoms. 2. The polymer compound according to claim 1 , further comprising one or more of a repeating unit shown by the following general formula (2) and a repeating unit shown by the following general formula (3), wherein B and C represent a single bond or an alkylene group having 1 to 10 carbon atoms and optionally containing an ether oxygen atom in a chain of the alkylene group; D represent a single bond or a linear, branched, or cyclic v+1-valent aliphatic hydrocarbon group optionally substituted with a fluorine atom and optionally containing an ether oxygen atom, a carbonyl group, or a carbonyloxy group in a chain of the hydrocarbon group; R 1 represents a hydrogen atom, a fluorine atom, a methyl group, or a trifluoromethyl group; R 3 and R 4 independently represent a hydrogen atom, a halogen atom, a linear, branched, or cyclic acyloxy group having 2 to 8 carbon atoms and optionally substituted with halogen, a linear, branched, or cyclic alkyl group having 1 to 6 carbon atoms and optionally substituted with halogen, or a linear, branched, or cyclic alkoxy group having 1 to 6 carbon atoms and optionally substituted with halogen; Rf 1 and Rf 2 represent an alkyl group having 1 to 6 carbon atoms and at least one fluorine atom, and Rf 1 and D may be bonded to form a ring together with the carbon atom to which Rf 1 and Dare bonded; “g” represents an integer of 0 to 3; “h” represents 1 or 2; “r” represents 0 or 1; “v” represents 1 or 2; “t” and “u” represent an integer of 0 to 2; “b” represents an integer of 5+2t−g; “c” represents an integer of 5+2u−h; and “n” and “p” independently represent 0 or 1, provided that when “r” is 0, “p” is 1 and C is a single bond. 3. The polymer compound according to claim 1 , further comprising one or more of a repeating unit shown by the following general formula (4) and a repeating unit shown by the following general formula (5), wherein R5 and R6 independently represent a hydrogen atom, a halogen atom, a linear, branched, or cyclic acyloxy group having 2 to 8 carbon atoms and optionally substituted with halogen, a linear, branched, or cyclic alkyl group having 1 to 6 carbon atoms and optionally substituted with halogen, or a linear, branched, or cyclic alkoxy group having 1 to 6 carbon atoms and optionally substituted with halogen; “i” and “j” represent an integer of 0 to 3; “d” represents an integer of 0 to 5; and “e” represents an integer of 0 to 3. 4. The polymer compound according to claim 2 , further comprising one or more of a repeating unit shown by the following general formula (4) and a repeating unit shown by the following general formula (5), wherein R5 and R6 independently represent a hydrogen atom, a halogen atom, a linear, branched, or cyclic acyloxy group having 2 to 8 carbon atoms and optionally substituted with halogen, a linear, branched, or cyclic alkyl group having 1 to 6 carbon atoms and optionally substituted with halogen, or a linear, branched, or cyclic alkoxy group having 1 to 6 carbon atoms and optionally substituted with halogen; “i” and “j” represent an integer of 0 to 3; “d” represents an integer of 0 to 5; and “e” represents an integer of 0 to 3. 5. The polymer compound according to claim 1 , further comprising one or more of a repeating unit shown by the following general formula (a1), a repeating unit shown by the following general formula (a2), and a repeating unit shown by the following general formula (a3), wherein R 12 independently represents a hydrogen atom or a methyl group; R13 represents a single bond, a phenylene group, —O—R 22 —, or —C(═O)—Z 2 —R 22 —, where Z 2 represents an oxygen atom or NH, and R 22 represents a phenylene group or a linear, branched, or cyclic alkylene group or alkenylene group having 1 to 6 carbon atoms and optionally containing a carbonyl group, an ester group, an ether group, or a hydroxyl group; K represents a single bond or —Z 3 —C(═O)—O—, where Z 3 represents a linear, branched, or cyclic divalent hydrocarbon group having 1 to 20 carbon atoms and optionally substituted with a heteroatom; Z 1 represents a single bond, a methylene group, an ethylene group, a phenylene group, a fluorinated phenylene group, -0_R 23 _, or —C(=0)-Z 4 —R 23 _, where Z 4 represents an oxygen atom or NH, and R 23 represents a phenylene group or a linear, branched, or cyclic alkylene group or alkenylene group having 1 to 6 carbon atoms and optionally containing a carbonyl group, an ester group, an ether group, or a hydroxyl group; M − represents a non-nucleophilic counter ion; R 14 , R 15 , R 16 , R 17 , R 18 , R 19 , R 20 , and R 21 independently represent a linear monovalent hydrocarbon group having 1 to 20 carbon atoms or a branched or cyclic monovalent hydrocarbon group having 3 to 20 carbon atoms, each optionally substituted with or containing a heteroatom, R 14 and R 15 may be bonded to each other to form a ring together with the sulfur atom in the formula, and two or more of R 16 , R 17 , and R 18 or two or more of R 19 , R 20 , and R 21 may be bonded to each other to form a ring together with the sulfur atom in the formula. 6. The polymer compound according to claim 2 , further comprising one or more of a repeating unit shown by the following general formula (a1), a repeating unit shown by the following general formula (a2), and a repeating unit shown by the following general formula (a3), wherein R 12 independently represents a hydrogen atom or a

Assignees

Inventors

Classifications

  • Homopolymers or copolymers of aromatic monomers containing elements other than carbon and hydrogen · CPC title

  • containing two or more rings · CPC title

  • and one oxygen in the alcohol moiety · CPC title

  • as molar percentages · CPC title

  • Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof · CPC title

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What does patent US9969829B2 cover?
The present invention provides a polymer compound containing a repeating unit shown by the following general formula (1). There can be provided a polymer compound usable in a negative resist composition that can achieve high resolution of 50 nm or less and small LER and cause very few defects, a negative resist composition using the polymer compound, and a patterning process using the negative …
Who is the assignee on this patent?
Shinetsu Chemical Co
What technology area does this patent fall under?
Primary CPC classification G03F7/004. Mapped technology areas include Physics.
When was this patent published?
Publication date Tue May 15 2018 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 9 related publications on this page (citations in our corpus or others sharing the same primary CPC).