Positive type resist composition for use in liquid immersion exposure and a method of forming the pattern using the same

Patent metadata

Field	Value
Publication number	US-9316912-B2
Application number	US-201414449415-A
Country	US
Kind code	B2
Filing date	Aug 1, 2014
Priority date	Jul 7, 2004
Publication date	Apr 19, 2016
Grant date	Apr 19, 2016

Abstract

A positive type resist composition for use in liquid immersion exposure comprises: (A) a resin having a monocyclic or polycyclic cycloaliphatic hydrocarbon structure, the resin increasing its solubility in an alkali developer by an action of acid; (B) a compound generating acid upon irradiation with one of an actinic ray and a radiation; (C) an alkali soluble compound having an alkyl group of 5 or more carbon atoms; and (D) a solvent.

First claim

What is claimed is:

1. A resist composition for ArF exposure, comprising:
(A) a resin having a monocyclic or polycyclic cycloaliphatic hydrocarbon structure, the resin increasing its solubility in an alkali developer by an action of acid;
(B) a compound generating acid upon irradiation with one of an actinic ray and a radiation;
(C) a resin containing an alkyl group having 2 or more carbon atoms; and
(D) a solvent,
wherein the structure of resin (A) and the structure of resin (C) are not in the same compound,
a content of the resin (C) is 1 to 10 mass % on the basis of the total solid content of the resist composition,
the resin (C) contains an alkali soluble group, and
the resin (C) contains a fluorine atom.

2. The resist composition for ArF exposure according to claim 1 ,
wherein the resin (C) contains an unsubstituted alkyl group having 2 to 20 carbon atoms.

3. The resist composition for ArF exposure according to claim 2 ,
wherein the resin (C) contains a repeating unit derived from a (meth)acrylic acid derivative having an substituted alkyl group having 2 to 20 carbon atoms.

4. The resist composition for ArF exposure according to claim 3 ,
wherein the resin (A) contains a lactone group.

5. The resist composition for ArF exposure according to claim 4 ,
wherein the resin (A) contains no aromatic group.

6. The resist composition for ArF exposure according to claim 1 ,
wherein the resin (C) contains an alkyl group having 5 or more carbon atoms.

7. The resist composition for ArF exposure according to claim 6 ,
wherein the resin (C) contains a fluorinated alkyl group having 5 or more carbon atoms.

8. The resist composition for ArF exposure according to claim 1 ,
wherein the resin (C) contains a carboxyl group as the alkali soluble group.

9. The resist composition for ArF exposure according to claim 1 ,
wherein the resin (C) contains a fluorinated alcohol as the alkali soluble group.

10. The resist composition for ArF exposure according to claim 6 ,
wherein the resin (C) contains a group which is solubilized by hydrolyzation with an alkali developer.

11. The resist composition for ArF exposure according to claim 10 ,
wherein the resin (C) contains a lactone group as the group which is solubilized by hydrolyzation with an alkali developer.

12. The resist composition for ArF exposure according to claim 10 ,
wherein the resin (C) contains an ester group as the group which is solubilized by hydrolyzation with an alkali developer.

13. The resist composition for ArF exposure according to claim 10 ,
wherein the resin (C) contains a sulfone amide group as the group which is solubilized by hydrolyzation with an alkali developer.

14. A resist film formed by using the resist composition for ArF exposure according to claim 1 .

15. A pattern forming method, comprising exposing the resist film according to claim 14 with an ArF excimer laser.

16. The pattern forming method according to claim 15 ,
wherein the exposing is an immersion exposure.

Assignees

• Fujifilm Corp

Inventors

• Kobayashi Hiromi
• Inabe Haruki

Classifications

• H10P76/2041

  Photolithographic processes · CPC title

• C08F220/26

  Esters containing oxygen in addition to the carboxy oxygen · CPC title

• C08F220/22

  Esters containing halogen · CPC title

• C08F214/18

  Monomers containing fluorine · CPC title

• G03F7/322

  Aqueous alkaline compositions · CPC title