Illumination optical unit for a metrology system and metrology system comprising such an illumination optical unit

Patent metadata

Field	Value
Publication number	US-9904060-B2
Application number	US-201414311420-A
Country	US
Kind code	B2
Filing date	Jun 23, 2014
Priority date	Jun 28, 2013
Publication date	Feb 27, 2018
Grant date	Feb 27, 2018

Abstract

An illumination optical unit serves for illuminating objects to be examined by a metrology system. The illumination optical unit has an optical pupil shaping assembly for generating a defined distribution of illumination angles of illumination light over an object field in which an object to be examined can be arranged. An optical field shaping assembly for generating a defined intensity distribution of the illumination light over the object field is disposed downstream of the pupil shaping assembly in the beam path of the illumination light. The field shaping assembly has at least one optical field shaping element arranged in the region of a pupil plane of the illumination optical unit. This results in an illumination optical unit which ensures an illumination which can be set in a defined manner with regard to an intensity distribution and an illumination angle distribution over the entire object field.

First claim

What is claimed is:

1. An illumination optical unit for illuminating objects to be examined by a metrology system, comprising:
an optical pupil shaping assembly for generating a defined distribution of illumination angles of illumination light over an object field in which an object to be examined can be arranged;
an optical field shaping assembly disposed downstream of the pupil shaping assembly in the beam path of the illumination light and serving for generating a defined intensity distribution of the illumination light over the object field,
wherein the field shaping assembly comprises at least one optical field shaping element arranged in the region of a pupil plane of the illumination optical unit, and the field shaping element downstream of the pupil shaping assembly is rotatable in a driven manner about an axis; and
a rotary drive to rotate the field shaping element downstream of the pupil shaping assembly about the axis, in which the angle of the axis of rotation with respect to the beam path of the illumination light in the region of the field shaping element is at least 0° and less than 30°.

2. The illumination optical unit according to claim 1 , wherein the field shaping element comprises a diffusing plate.

3. The illumination optical unit according to claim 1 , comprising a depolarizer in the beam path of the illumination light upstream of the pupil shaping assembly.

4. The illumination optical unit according to claim 1 , comprising a pupil homogenizing assembly in the beam path of the illumination light upstream of the pupil shaping assembly for generating a defined intensity distribution of the illumination light over a pupil of the illumination optical unit.

5. The illumination optical unit according to claim 1 , wherein the pupil shaping assembly comprises at least one micromirror array.

6. The illumination optical unit according to claim 5 , wherein the micromirror array for pupil shaping comprises a diffraction-reflection grating for the illumination light.

7. The illumination optical unit according to claim 6 wherein the beam path of the illumination light onto the at least one micromirror array is configured in such a way that the illumination light is incident on micromirrors of the micromirror array with an input divergence which is less than a diffraction angle of a first order of diffraction of the diffraction-reflection grating formed by the micromirror array.

8. The illumination optical unit according to claim 5 , wherein the micromirror array comprises micromirrors which can be adjusted continuously within a tilting angle range.

9. The illumination optical unit according to claim 5 , wherein the micromirror array comprises micromirrors which can be switched discretely between two tilting angles.

10. The illumination optical unit according to claim 5 , wherein the beam path of the illumination light onto the at least one micromirror array is configured in such a way that the illumination light is incident on a micromirror principal plane of the micromirror array with an angle of incidence which is greater than 0°.

11. The illumination optical unit according to claim 1 , wherein the pupil shaping assembly comprises at least one spatial filter stop.

12. The illumination optical unit according to claim 1 , comprising a field stop in the beam path downstream of the field shaping assembly.

13. The illumination optical unit according to claim 1 , comprising at least one optical relay assembly in the beam path downstream of the field shaping assembly for the imaging generation of at least one further pupil plane in the beam path downstream of the pupil plane in which the field shaping element is arranged.

14. The illumination optical unit according to claim 1 , comprising a tube lens in the beam path of the illumination light downstream of the field shaping assembly.

15. The illumination optical unit according to claim 14 , comprising a condenser lens in the beam path of the illumination light between the tube lens and the object field.

16. A metrology system for examining objects, comprising:
an illumination optical unit according to claim 1 , and
a detection device for the spatially resolved detection of an illumination light intensity in the object field.

17. The metrology system according to claim 16 , comprising an energy monitoring unit for monitoring an energy of the illumination light which is incident on the object field.

18. The metrology system according to claim 16 , comprising a pupil monitoring unit for monitoring the distribution of the illumination angles of the illumination light which is incident on the object field.

19. A method for illuminating objects to be examined by a metrology system, the method comprising:
generating, using an optical pupil shaping assembly of an illumination optical unit, a defined distribution of illumination angles of illumination light over an object field in which an object to be examined can be arranged;
generating, using an optical field shaping assembly disposed downstream of the pupil shaping assembly in the beam path of the illumination light, a defined intensity distribution of the illumination light over the object field, in which the field shaping assembly comprises at least one optical field shaping element arranged in the region of a pupil plane of the illumination optical unit, and the field shaping element downstream of the pupil shaping assembly is rotatable in a driven manner about an axis;
tilting the axis of rotation of the field shaping element such that the angle of the axis of rotation of the field shaping element downstream of the pupil shaping assembly with respect to the beam path of the illumination light in the region of the field shaping element is at least 0° and less than 30°; and
rotating the field shaping element about the axis.

20. The method of claim 19 , wherein the field shaping element comprises a diffusing plate.

21. The method of claim 19 , comprising providing depolarized illumination light to the pupil shaping assembly.

22. The method of claim 19 , comprising generating, by using a pupil homogenizing assembly in the beam path of the illumination light upstream of the pupil shaping assembly, a defined intensity distribution of the illumination light over a pupil of the illumination optical unit.

23. The method of claim 19 in which the pupil shaping assembly comprises at least one micromirror array.

24. The method of claim 23 in which the micromirror array for pupil shaping comprises a diffraction-reflection grating for the illumination light.

25. The method of claim 24 , comprising configuring the beam path of the illumination light onto the at least one micromirror array in such a way that the illumination light is incident on micromirrors of the micromirror array with an input divergence which is less than a diffraction angle of a first order of diffraction of the diffraction-reflection grating formed by the micromirror array.

26. The method of claim 23 in which the micromirror array comprises micromirrors that can be adjusted continuously within a tilting angle range.

27. The method of claim 23 in which the micromirror array comprises micromirrors that can be switched discretely between two tilting angles.

28. The method of claim 23 , comprising configuring the beam path of the illumination light onto the at least one micromirror array in such a

Assignees

• Zeiss Carl Ag
• Zeiss Carl Smt Gmbh

Inventors

• Frank Thomas
• Doering Dirk
• Seitz Holger
• Laengle Mario
• Matejka Ulrich

Classifications

• G02B26/0833

  the reflecting element being a micromechanical device, e.g. a MEMS mirror, DMD (G02B26/0825 takes precedence; micromechanical devices in general B81B) · CPC title

• G02B27/0961 Primary

  Lens arrays (lens arrays per se G02B3/0006) · CPC title

• G02B27/0905

  Dividing and/or superposing multiple light beams · CPC title

• G03F1/84

  Inspecting · CPC title

• G02B26/0808

  by means of one or more diffracting elements · CPC title