Lithographic apparatus and device manufacturing method

Patent metadata

Field	Value
Publication number	US-9885965-B2
Application number	US-201715448438-A
Country	US
Kind code	B2
Filing date	Mar 2, 2017
Priority date	Nov 12, 2002
Publication date	Feb 6, 2018
Grant date	Feb 6, 2018

Abstract

A lithographic projection apparatus includes a support structure configured to hold a patterning device, the patterning device configured to pattern a beam of radiation according to a desired pattern; a substrate table configured to hold a substrate; a projection system configured to project the patterned beam onto a target portion of the substrate; a liquid supply system configured to provide liquid to a space between the projection system and the substrate; and a shutter configured to isolate the space from the substrate or a space to be occupied by a substrate.

First claim

The invention claimed is:

1. A device manufacturing method comprising:
providing a liquid to a space between a projection system and a substrate with a liquid supply system, said liquid being confined in said space by a seal member;
projecting a patterned beam of radiation, through said liquid, onto a target portion of the substrate held by a substrate table;
removably positioning a member adjacent to the projection system between the projection system and the substrate table so that a first side of the member faces the projection system and the second side of the member, opposite from the first side, faces the substrate table to isolate the space provided with the liquid, which contacts the first side of the member, from a second space located on the second side of the member, wherein the member is separable from the substrate table and the projection system, and wherein the member is positionable on the substrate table so that the first side is substantially coplanar with a top surface of the substrate table that receives the substrate, and
at least partly recovering the liquid from underneath the seal member through a surface of the seal member that faces the substrate, or the top surface of the substrate table or both.

2. The method according to claim 1 , further comprising positioning the member opposite the projection system such that liquid can be confined between the projection system and the member.

3. The method according to claim 1 , further comprising releasably connecting the member to an object.

4. The method according to claim 3 , further comprising releasably connecting the member to the object with a vacuum-clamp.

5. The method according to claim 3 , further comprising positioning the member on the substrate table so that the first side of the member is substantially coplanar with a primary surface of the substrate.

6. A, device manufacturing comprising:
providing a liquid to a space between a projection system and a substrate with a liquid supply system, said liquid being confined in said space by a seal member;
projecting a patterned beam of radiation, through said liquid, onto a target portion of the substrate held by a substrate table;
isolating the space from the substrate or a space to be occupied by a substrate with a shutter, wherein the shutter is positionable on the substrate table so that a primary surface of the shutter is substantially coplanar with a top surface of the substrate table that receives the substrate, and
at least partly recovering the liquid from underneath the seal member through a surface of the seal member that faces the substrate, or a top surface of the substrate table or both.

7. The method according to claim 6 , further comprising positioning the shutter on a side of the liquid supply system opposite the projection system such that liquid can be confined in the liquid supply system and between the projection system and the shutter.

8. The method according to claim 6 , further comprising releasably connecting the shutter to the seal member.

9. The method according to claim 8 , wherein the shutter is separable from the remainder of a lithographic apparatus that includes the projection system, the liquid supply system and the substrate table.

10. The method according to claim 8 , further comprising displacing the shutterfrom the liquid supply system when connected to the liquid supply system.

11. The method according to claim 10 , further comprising connecting the shutter to the liquid supply system with a magnet, a vacuum outlet, or both.

12. The method according to claim 10 , further comprising forming a seal between the liquid supply system and the shutter with a gas inlet and a vacuum outlet of the liquid supply system.

13. The method according to claim 6 , wherein the shutter comprises a channel in a surface of the shutter facing the projection system.

14. The method according to claim 13 , wherein the channel is less than or equal to 10 micrometers deep.

15. The method according to claim 6 , wherein the shutter comprises a plurality of concentric channels.

16. The method according to claim 6 , wherein the shutter comprises a plurality of radial channels.

17. The method according to claim 6 , wherein the liquid supply system comprises at least one inlet to supply the liquid onto the substrate and at least one outlet to remove the liquid after the liquid has passed under the projection system.

18. The method according to claim 6 , wherein the liquid supply system is configured to provide the liquid to a space between a final lens of the projection system and the substrate.

19. The method according to claim 6 , further comprising positioning the shutter on the substrate table so that the primary surface is substantially coplanar with a primary surface of the substrate.

Assignees

• Asml Netherlands Bv

Inventors

• Hoogendam Christiaan Alexander
• Derksen Antonius Theodorus Anna Maria
• Donders Sjoerd Nicolaas Lambertus
• Lof Joeri
• Loopstra Erik Roelof
• Mulkens Johannes Catharinus Hubertus
• Jansen Hans
• Verspay Jacobus Johannus Leonardus Hendricus
• Straaijer Alexander
• Streefkerk Bob

Classifications

• G03F7/70341

  Details of immersion lithography aspects, e.g. exposure media or control of immersion liquid supply (chemical composition of immersion liquids G03F7/2041) · CPC title

• G03F7/70866 Primary

  of mask or workpiece · CPC title

• G03F7/707 Primary

  Chucks, e.g. chucking or un-chucking operations or structural details · CPC title

• G03F9/7088

  Alignment mark detection, e.g. TTR, TTL, off-axis detection, array detector, video detection · CPC title

• G03F7/70833

  Mounting of optical systems, e.g. mounting of illumination system, projection system or stage systems on base-plate or ground · CPC title