Lithographic apparatus and device manufacturing method

Patent metadata

Field	Value
Publication number	US-9366972-B2
Application number	US-201514701236-A
Country	US
Kind code	B2
Filing date	Apr 30, 2015
Priority date	Nov 12, 2002
Publication date	Jun 14, 2016
Grant date	Jun 14, 2016

Abstract

A lithographic projection apparatus includes a support structure to hold a patterning device, the patterning device configured to pattern a beam of radiation according to a desired pattern; a projection system to project the patterned beam onto a target portion of a substrate; a substrate table configured to hold the substrate, the substrate table including a support surface to support an intermediary plate between the projection system and at least one of the substrate and an object positioned on the substrate table and not in contact with the at least one of the substrate and the object; and a liquid supply system to provide a liquid, through which the beam is to be projected, in a space between the projection system and the at least one of the substrate and the object.

First claim

The invention claimed is:

1. A lithographic apparatus comprising:
a support structure configured to hold a patterning device, the patterning device configured to pattern a beam of radiation according to a desired pattern;
a projection system configured to project the patterned beam onto a target portion of a substrate;
a substrate table configured to hold the substrate;
an edge seal member configured to at least partly surround an edge of at least one of said substrate and an object positioned on said substrate table, and
a liquid supply system configured to provide a liquid in a space between a final element of said projection system and said at least one of said substrate and said object,
wherein said substrate table comprises a hydrophobic layer adjacent an edge portion of said edge seal member and adjacent said at least one of said substrate and said object, said hydrophobic layer arranged to face an opposite side of said edge seal member to said projection system and to face an opposite side of said at least one of said substrate and said object to said projection system.

2. The lithographic apparatus of claim 1 , wherein said hydrophobic layer has a contact angle of greater than 90° with said liquid.

3. The lithographic apparatus of claim 1 , wherein the hydrophobic layer is in contact with the opposite side of the edge seal member.

4. The lithographic apparatus of claim 1 , wherein the hydrophobic layer is out of contact with the opposite side of the at least one of said substrate and said object when the at least one of said substrate and said object is positioned on the substrate table.

5. The lithographic apparatus of claim 4 , wherein a gap between the hydrophobic layer and the opposite side of the at least one of said substrate and said object is about 10 μm.

6. The lithographic apparatus of claim 1 , wherein the hydrophobic layer is made of an inorganic material.

7. The lithographic apparatus of claim 1 , wherein the hydrophobic layer is made of Teflon or silicon rubber.

8. The lithographic apparatus of claim 1 , wherein the edge seal member is configured to provide a primary surface facing said projection system substantially co-planar with a primary surface of said at least one of said substrate and said object.

9. The lithographic apparatus of claim 1 , wherein, in use, said liquid supply system provides liquid to a localized area of at least one of said object, said edge seal member and said substrate.

10. The lithographic apparatus of claim 1 , wherein the edge seal member is an integral part of the substrate table.

11. The lithographic apparatus of claim 1 , wherein the edge seal member is movable relative to the substrate table.

12. A support for contacting an undersurface of a substrate and holding the substrate, at least a portion of a top surface of the substrate to be immersed in liquid, the support comprising:
a substrate table configured to hold a substrate;
an edge seal member configured to at least partly surround an edge of at least one of said substrate and an object positioned on said substrate table, and
a hydrophobic layer adjacent an edge portion of said edge seal member and adjacent said at least one of said substrate and said object, the hydrophobic layer arranged to face the undersurface of the substrate.

13. The support of claim 12 , wherein the edge seal member is an integral part of the substrate table.

14. The support of claim 12 , wherein the edge seal member is movable relative to the substrate table.

15. The support of claim 12 , wherein the edge seal member has a top surface for receiving the liquid and an undersurface that is opposite the top surface, wherein the hydrophobic layer is in contact with the undersurface of the edge seal member.

16. The support of claim 12 , wherein the hydrophobic layer is out of contact with the undersurface of the substrate when the substrate is positioned on the substrate table.

17. The support of claim 12 , wherein a gap between the hydrophobic layer and the undersurface of the substrate is about 10 μm.

18. The support of claim 12 , wherein the hydrophobic layer is made of an inorganic material.

19. The support of claim 12 , wherein the hydrophobic layer is made of Teflon or silicon rubber.

20. The support of claim 12 , wherein the top surface of the edge seal member is substantially co-planar with the top surface of said at least one of said substrate and said object.

Assignees

• Asml Netherlands Bv

Inventors

• Lof Joeri
• Butler Hans
• Donders Sjoerd Nicolaas Lambertus
• Kolesnychenko Aleksey Yurievich
• Loopstra Erik Roelof
• Meijer Hendricus Johannes Maria
• Mertens Jeroen Johannes Sophia Maria
• Mulkens Johannes Catharinus Hubertus
• Ritsema Roelof Aeilko Siebrand
• Van Schaik Frank
• Sengers Timotheus Franciscus
• Simon Klaus
• De Smit Joannes Theodoor
• Straaijer Alexander
• Van Santen Helmar

Classifications

• G03F7/70341 Primary

  Details of immersion lithography aspects, e.g. exposure media or control of immersion liquid supply (chemical composition of immersion liquids G03F7/2041) · CPC title

• G03F7/7085

  Detection arrangement, e.g. detectors of apparatus alignment possibly mounted on wafers, exposure dose, photo-cleaning flux, stray light, thermal load · CPC title

• G03F7/707

  Chucks, e.g. chucking or un-chucking operations or structural details · CPC title

• G03F7/20 Primary

  Exposure; Apparatus therefor (photographic printing apparatus for making copies G03B27/00) · CPC title

• G03F7/70866

  of mask or workpiece · CPC title