Substrate rinsing systems and methods

US9859135B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-9859135-B2
Application numberUS-201514626903-A
CountryUS
Kind codeB2
Filing dateFeb 19, 2015
Priority dateDec 19, 2014
Publication dateJan 2, 2018
Grant dateJan 2, 2018

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  1. Title

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  2. Abstract

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  3. Assignees and inventors

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  4. Key dates

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  5. First independent claim

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  6. CPC / IPC classifications

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  7. Citations and related patents

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Abstract

Official abstract text for this publication.

An example waterfall apparatus includes (1) a first portion of a first width having (a) a first plenum, a second plenum, and a restricted fluid path therebetween; (b) a first coupling surface; and (c) an inlet opening that creates a fluid path between the first coupling surface and the first plenum; and (2) a second portion of a second width larger than the first width and having (a) a second coupling surface; and (b) an inlet aligned with the first portion inlet opening. The first and second coupling surfaces form a slot that extends along at least a portion of a length of the waterfall apparatus and that connects to the second plenum. Fluid introduced into the second portion inlet fills the first plenum, travels through the restricted fluid path to the second plenum, and exits the slot between the first and second portions to form a rinsing fluid waterfall.

First claim

Opening claim text (preview).

What is claimed is: 1. A waterfall apparatus configured to provide rinsing fluid to a substrate comprising: a lower portion having: a first width; a first plenum, a second plenum separated from the first plenum and located above the first plenum, and a restricted fluid path extending between the first and second plenums; and a first surface located on an upper side of the lower portion; and an inlet opening that creates a fluid path between the first surface and the first plenum; and an upper portion at least partially coupled to the lower portion having: a second width that is larger than the first width; and a second surface located on a lower side of the upper portion; and an inlet that aligns with the inlet opening of the lower portion to create a fluid path to the first plenum through the upper portion; wherein the first surface of the lower portion and the second surface of the upper portion form a slot that extends along at least a portion of a length of the waterfall apparatus and that connects to the second plenum; and wherein fluid introduced into the inlet of the upper portion fills the first plenum of the lower portion, travels through the restricted fluid path to the second plenum, and exits the slot between the upper and lower portions to form a rinsing fluid waterfall. 2. The waterfall apparatus of claim 1 wherein the slot formed between the upper and lower portions has a length that is longer than a diameter of a substrate rinsed with the waterfall apparatus. 3. The waterfall apparatus of claim 2 wherein the slot has a length that is approximately 10 to 100 mm longer than a diameter of a substrate rinsed with the waterfall apparatus. 4. The waterfall apparatus of claim 3 wherein the slot has a length that is approximately 30 to 70 mm longer than a diameter of a substrate rinsed with the waterfall apparatus. 5. The waterfall apparatus of claim 2 wherein the slot is approximately 310 to 400 mm in length. 6. The waterfall apparatus of claim 5 wherein the slot is approximately 330 to 370 mm in length. 7. The waterfall apparatus of claim 1 wherein the slot has a height of approximately less than 0.5 mm. 8. The waterfall apparatus of claim 7 wherein the slot has a height of less than approximately 0.2 mm. 9. The waterfall apparatus of claim 1 wherein the first plenum includes a first side, a second side opposite the first side and a third side extending between the first side and the second side, wherein the first side is shorter than the second side and the third side extends between the first and second sides at an angle relative to the first surface of the lower portion. 10. The waterfall apparatus of claim 9 wherein the angle of the third side is between about 1 and 10 degrees relative to the first surface. 11. The waterfall apparatus of claim 10 wherein the angle of the third side is between about 3 and 6 degrees relative to the first surface. 12. The waterfall apparatus of claim 1 wherein at least one of the restricted flow path has a length equal to a length of the slot and the first and second plenums have a length equal to a length of the slot. 13. The waterfall apparatus of claim 1 wherein the second surface of the upper portion has a width that is larger than a width of the first surface of the lower portion so that fluid travelling through the slot formed between the first and second surfaces breaks contact with the first surface prior to the second surface. 14. The waterfall apparatus of claim 1 wherein the upper portion includes a flow deflector positioned at an end of the slot that redirects rinsing fluid flowing through the slot at an angle relative to the second surface of the upper portion. 15. The waterfall apparatus of claim 14 wherein the angle is approximately 40 to 60 degrees relative to the second surface.

Assignees

Inventors

Classifications

  • by wet cleaning only (H10P70/52 takes precedence) · CPC title

  • with the semiconductor substrates being dipped in baths or vessels · CPC title

  • using mainly spraying means, e.g. nozzles · CPC title

  • Outlets formed, e.g. cut, in the circumference of tubular or spherical elements · CPC title

  • Electricity · mapped topic

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Frequently asked questions

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What does patent US9859135B2 cover?
An example waterfall apparatus includes (1) a first portion of a first width having (a) a first plenum, a second plenum, and a restricted fluid path therebetween; (b) a first coupling surface; and (c) an inlet opening that creates a fluid path between the first coupling surface and the first plenum; and (2) a second portion of a second width larger than the first width and having (a) a second c…
Who is the assignee on this patent?
Applied Materials Inc
What technology area does this patent fall under?
Primary CPC classification H10P72/0414. Mapped technology areas include Electricity.
When was this patent published?
Publication date Tue Jan 02 2018 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 4 related publications on this page (citations in our corpus or others sharing the same primary CPC).