Substrate edge residue removal systems, apparatus, and methods

Patent metadata

Field	Value
Publication number	US-2016178279-A1
Application number	US-201514602114-A
Country	US
Kind code	A1
Filing date	Jan 21, 2015
Priority date	Dec 19, 2014
Publication date	Jun 23, 2016
Grant date	—

Abstract

In one or more embodiments, a substrate edge residue removal apparatus is provided. A substrate edge residue removal apparatus includes a lower body including a gas cavity; and an upper plate removably coupled to the lower body, wherein the lower body and upper plate together form an assembly having a passageway leading from the gas cavity to a plenum and an output slit extending along a length of the plenum and in fluid communication with the plenum. Assemblies including the substrate edge residue removal apparatus and methods of cleaning substrates with the substrate edge residue removal apparatus are provided, as are numerous additional aspects.

First claim

The invention claimed is:

1 . A substrate edge residue removal apparatus, comprising:
a lower body including a gas cavity; and an upper plate removably coupled to the lower body, wherein the lower body and upper plate together form an assembly having a passageway leading from the gas cavity to a plenum and an output slit extending along a length of the plenum and in fluid communication with the plenum.

2 . The substrate edge residue removal apparatus of claim 1 wherein, in response to gas being applied to the gas cavity via a gas channel, the assembly is configured to generate an evenly distributed gas curtain along a length of the output slit, the generated gas curtain having laminar flow.

3 . The substrate edge residue removal apparatus of claim 1 wherein the assembly is rotatably mountable on a frame to allow the output slit to be angularly adjusted relative to a vertically oriented substrate to be cleaned.

4 . The substrate edge residue removal apparatus of claim 1 wherein the assembly includes a sealing member disposed around the gas cavity and adapted to prevent gas from exiting the assembly except via the output slit.

5 . The substrate edge residue removal apparatus of claim 1 wherein the assembly is adjustably mountable on a frame to allow a position of the output slit to be vertically and laterally adjusted relative to a vertically oriented substrate to be cleaned.

6 . The substrate edge residue removal apparatus of claim 1 wherein the assembly is adapted to be disassembled for cleaning.

7 . The substrate edge residue removal apparatus of claim 1 wherein the assembly is adapted to form a gas curtain from a pressurized gas supply of nitrogen and a mixture of nitrogen and isopropyl alcohol vapor.

8 . A substrate edge residue removal system, comprising:
an assembly formed from a lower body including a gas cavity and an upper plate removably coupled to the lower body wherein the assembly includes a passageway leading from the gas cavity to a plenum and an output slit extending along a length of the plenum and in fluid communication with the plenum; a frame supporting the assembly; a Marangoni drying device coupled to the frame and disposed below the assembly; and a substrate holder operable to support and to lift a substrate past the output slit of the assembly.

9 . The substrate edge residue removal system of claim 8 wherein, in response to gas being applied to the gas cavity via a gas channel, the assembly is configured to generate an evenly distributed gas curtain along a length of the output slit, the generated gas curtain having laminar flow.

10 . The substrate edge residue removal system of claim 8 wherein the assembly is rotatably mountable on the frame to allow the output slit to be angularly adjusted relative to a substrate in the substrate holder to be cleaned.

11 . The substrate edge residue removal system of claim 8 further comprising a rinsing device disposed below the Marangoni drying device.

12 . The substrate edge residue removal system of claim 8 wherein the assembly is adjustably mountable on a frame to allow a position of the output slit to be vertically and laterally adjusted relative to a substrate in the substrate holder to be cleaned.

13 . The substrate edge residue removal system of claim 8 wherein the assembly is adapted to be disassembled for cleaning.

14 . The substrate edge residue removal system of claim 8 wherein the assembly is adapted to form a gas curtain from a pressurized gas supply of nitrogen and a mixture of nitrogen and isopropyl alcohol vapor.

15 . A method of cleaning a substrate, comprising:
supporting a substrate on a substrate holder in a vertical orientation while lifting the substrate upward past a drying device; activating a substrate edge residue removal apparatus to apply a curtain of gas to a lower portion of the substrate once the substrate has been lifted past the drying device; and continuing to lift the substrate upward past the substrate edge residue removal apparatus such that the curtain of gas removes substantially all of the liquid from the substrate without leaving a residue.

16 . The method of claim 15 wherein activating the substrate edge residue removal apparatus includes opening a gas valve via a controller to flow an inert gas into the substrate edge residue removal apparatus to form a curtain of gas.

17 . The method of claim 16 wherein forming a curtain of gas includes forming a gas curtain from a pressurized gas supply of nitrogen and a mixture of nitrogen and isopropyl alcohol vapor.

18 . The method of claim 15 wherein activating the substrate edge residue removal apparatus includes aiming an output slit of the substrate edge residue removal apparatus at the lower portion of the substrate.

19 . The method of claim 15 wherein activating the substrate edge residue removal apparatus includes applying vacuum pressure to liquid on the substrate via vacuum slots in the substrate holder concurrently with applying the curtain of gas.

20 . The method of claim 15 further comprising deactivating the substrate edge residue removal apparatus once the substrate has been lifted past the substrate edge residue removal apparatus.

Assignees

• Applied Materials Inc

Inventors

• Velazquez Edwin
• Mikhaylichenko Ekaterina

Classifications

• H10P72/0414

  using mainly spraying means, e.g. nozzles · CPC title

• H10P72/0408

  for drying · CPC title

• F26B21/50 Primary

  Ducting arrangements from the source of air or other gases to the materials or objects being dried · CPC title

• F26B21/004 Primary

  Mechanical Engineering · mapped topic

• F26B25/004

  in the shape of discrete sheets (wicket conveyors F26B15/085) · CPC title