Electrostatic chuck apparatus

Patent metadata

Field	Value
Publication number	US-9837296-B2
Application number	US-201213718071-A
Country	US
Kind code	B2
Filing date	Dec 18, 2012
Priority date	Jun 21, 2011
Publication date	Dec 5, 2017
Grant date	Dec 5, 2017

Abstract

An electrostatic chuck apparatus is disclosed which can be prevented from being damaged or fractured when the temperature abruptly increases or decreases when plasma is irradiated on a plate-like specimen, the heater is heated, or the like, and can also prevent corrosion when a corrosive gas or plasma is provided. The electrostatic chuck apparatus has an electrostatic chuck portion 2 having a mounting plate 11 made of a corrosion-resistant ceramic, a supporting plate 12 which is integrated with the mounting plate 11 so as to support the mounting plate 11 and is made of an insulating ceramic having a larger thermal conductivity than the thermal conductivity of the corrosion-resistant ceramic, and an internal electrode for electrostatic adsorption 13 provided between the mounting plate 11 and the supporting plate 12 ; and a temperature-controlling base portion 3 which adjusts the electrostatic chuck portion 2 to a desired temperature.

First claim

The invention claimed is:

1. An electrostatic chuck apparatus comprising:
an electrostatic chuck portion having a mounting plate made of a corrosion-resistant ceramic which has one main surface used as a mounting surface on which a plate-like specimen is mounted, a supporting plate which is integrated with the mounting plate so as to support the mounting plate and is made of an insulating ceramic having a larger thermal conductivity than the corrosion-resistant ceramic, and an internal electrode for electrostatic adsorption provided between the mounting plate and the supporting plate; and
a temperature-controlling base portion which adjusts the electrostatic chuck portion to a desired temperature,
wherein the corrosion-resistant ceramic is composed of one or more selected from a group of yttrium aluminum garnet (YAG: Y 3 Al 5 O 12 ), Y 2 O 3 .Al 2 O 3 , Y 2 O 3 —Al 2 O 3 , and rare earth element-added yttrium aluminum oxide composite oxides, which is a composite oxide formed by adding to the yttrium aluminum oxide composite oxides with a rare earth element (RE) made of one or more selected from a group consisting of lanthanum (La), selenium (Se), praseodymium (Pr), neodymium (Nd), promethium (Pm), samarium (Sm), europium (Eu), gadolinium (Gd), terbium (Tb), dysprosium (Dy), holmium (Ho), erbium (Er), thulium (Tm), ytterbium (Yb) and lutetium (Lu), or an oxide of the rare earth elements (RE),
thickness of the mounting plate is 0.3 mm to 2.0 mm,
the supporting plate is composed of one or more selected from a group of aluminum oxide (Al 2 O 3 ), aluminum nitride (AlN), aluminum oxide-silicon carbide (Al 2 O 3 —SiC), aluminum nitride (AlN) including 3 mass % to 7 mass % of yttrium oxide (Y 2 O 3 ), and
an insulating adhesive layer is provided between the supporting plate and the internal electrode, having a variation in the in-plane thickness within 10 μm.

2. The electrostatic chuck apparatus according to claim 1 , wherein heating members are provided between the supporting plate and the temperature-controlling base portion, and the heating members are embedded in an organic insulating adhesive layer.

3. The electrostatic chuck apparatus according to claim 1 , wherein the mounting plate has a plurality of protrusion portions having a diameter smaller than the thickness of the plate-like specimen, formed on the mounting plate.

4. The electrostatic chuck apparatus according to claim 1 , wherein the yttrium aluminum oxide composite oxide is one or more selected from the group consisting of yttrium aluminum garnet (YAG: Y 3 Al 5 O 12 ), Y 2 O 3 .Al 2 O 3 and Y 2 O 3 —Al 2 O 3 .

5. The electrostatic chuck apparatus according to claim 1 , wherein the yttrium aluminum oxide composite oxide is one or more selected from the group consisting of yttrium aluminum garnet (YAG: Y3Al5O12), YiCb′AkCb and Y2O3-Al2O3.

6. An electrostatic chuck apparatus comprising:
an electrostatic chuck portion having a mounting plate made of a corrosion-resistant ceramic which has one main surface used as a mounting surface on which a plate-like specimen is mounted, a supporting plate which is integrated with the mounting plate so as to support the mounting plate and is made of an insulating ceramic having a larger thermal conductivity than the corrosion-resistant ceramic, and an internal electrode for electrostatic adsorption provided between the mounting plate and the supporting plate; and
a temperature-controlling base portion which adjusts the electrostatic chuck portion to a desired temperature,
wherein the corrosion-resistant ceramic is composed of one or more selected from a group of yttrium aluminum garnet (YAG: Y 3 Al 5 O 12 ), Y 2 O 3 .Al 2 O 3 , Y 2 O 3 —Al 2 O 3 , and rare earth element-added yttrium aluminum oxide composite oxides,
thickness of the mounting plate is 0.3 mm to 2.0 mm,
the supporting plate is composed of one or more selected from a group of aluminum oxide (Al 2 O 3 ), aluminum nitride (AlN), aluminum oxide-silicon carbide (Al 2 O 3 —SiC), aluminum nitride (AlN) including 3 mass % to 7 mass % of yttrium oxide (Y 2 O 3 ),
an insulating adhesive layer is provided between the supporting plate and the internal electrode, having a variation in the in-plane thickness within 10 μm, and
wherein the additive ratio of the rare earth element (RE) or the oxide of the rare earth element (RE) added to the yttrium aluminum oxide composite oxide in the rare earth element (RE)-added yttrium aluminum oxide composite oxide ranges from 0.01 mass % to 20 mass % with respect to the total amount of the yttrium aluminum oxide composite oxide.

7. The electrostatic chuck apparatus according to claim 1 , wherein the internal electrode for electrostatic adsorption is formed of one or more selected from the group consisting of an aluminum oxide-tantalum carbide (Al 2 O 3 —Ta 4 C 5 ) conductive composite sintered compact, an aluminum oxide-tungsten (Al 2 O 3 —W) conductive composite sintered compact, an aluminum oxide-silicon carbide (Al 2 O 3 -SiC) conductive composite sintered compact, an aluminum nitride-tungsten (AlN—W) conductive composite sintered compact, an aluminum nitride-tantalum (AlN-Ta) conductive composite sintered compact , an yttrium oxide-molybdenum (Y 2 O 3 —Mo) conductive composite sintered compact, tungsten (W), tantalum (Ta) and molybdenum (Mo).

8. The electrostatic chuck apparatus according to claim 1 , wherein the internal electrode for electrostatic adsorption has a thickness ranging from 0.1 μm to 100 μm.

9. The electrostatic chuck apparatus according to claim 1 , wherein the insulating adhesive layer is composed of a sheet-like or film-like adhesive resin made of a polyimide resin, a silicone resin or an epoxy resin.

10. The electrostatic chuck apparatus according to claim 1 , wherein the insulating adhesive layer has a thickness ranging from 10 μm to 100 μm.

11. The electrostatic chuck apparatus according to claim 1 , wherein the thickness of the electrostatic chuck portion has a thickness ranging from 0.7 mm to 5.0 mm.

12. An electrostatic chuck apparatus comprising:
an electrostatic chuck portion having a mounting plate made of a corrosion-resistant ceramic which has one main surface used as a mounting surface on which a plate-like specimen is mounted, a supporting plate which is integrated with the mounting plate so as to support the mounting plate and is made of an insulating ceramic having a larger thermal conductivity than the corrosion-resistant ceramic, and an internal electrode for electrostatic adsorption provided between the mounting plate and the supporting plate; and
a temperature-controlling base portion which adjusts the electrostatic chuck portion to a desired temperature,
wherein the corrosion-resistant ceramic is composed of one or more selected from a group of yttrium aluminum oxide composite oxides, rare earth element-added yttrium aluminum oxide composite oxides, and yttrium oxides,
thickness of the mounting plate is 0.3 mm to 2.0 mm,
the supporting plate is composed of one or more selected from a group of aluminum oxide (Al 2 O 3 ), aluminum nitride (AlN), aluminum oxide-silicon carbide (Al 2 O 3 —SiC), aluminum nitride (ALN) including 3 mass % to 7 mass % of yttrium oxide (Y 2 O 3 ),
an insulating adhesive layer is provided between the supporting plate and the internal electrode, having a variation in the in-plane thickness within 10 μm, and
wherein the electrostatic chuck apparatus is equipped with a heater element which is embedded in an organic insulating adhesive layer provided between the supporting plate and the temperature-controlling base portion, and the organic insulating adhesive layer contains a filler made of surface-coated aluminum nitride (AlN)

Assignees

• Sumitomo Osaka Cement Co Ltd

Inventors

• Maeta Shinichi
• Moriya Yoshiaki
• Furuuchi Kei

Classifications

• H10P72/0602

  Temperature monitoring · CPC title

• H10P72/72 Primary

  using electrostatic chucks · CPC title

• H01L21/67248

  Electricity · mapped topic

• H01L21/6831 Primary

  Electricity · mapped topic