Semiconductor device and electronic device

US9825526B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-9825526-B2
Application numberUS-201615350516-A
CountryUS
Kind codeB2
Filing dateNov 14, 2016
Priority dateSep 3, 2012
Publication dateNov 21, 2017
Grant dateNov 21, 2017

How to read this patent

A practical reading order for non-experts. Skip the full description unless you need deep technical detail.

  1. Title

    What the patent document calls the invention.

  2. Abstract

    A short plain-language summary of the technical disclosure.

  3. Assignees and inventors

    Who owns or filed the patent and who is credited as inventor.

  4. Key dates

    Filing, priority, publication, and grant dates set the timeline.

  5. First independent claim

    The legal scope of protection — read this for what is actually claimed.

  6. CPC / IPC classifications

    Technology tags used to group this patent with similar filings.

  7. Citations and related patents

    Prior art links and similar publications in this corpus.

Abstract

Official abstract text for this publication.

To reduce a variation in the electrical characteristics of a transistor. A potential generated by a voltage converter circuit is applied to a back gate of a transistor included in a voltage conversion block. Since the back gate of the transistor is not in a floating state, a current flowing through the back channel can be controlled so as to reduce a variation in the electrical characteristics of the transistor. Further, a transistor with low off-state current is used as the transistor included in the voltage conversion block, whereby storage of the output potential is controlled.

First claim

Opening claim text (preview).

What is claimed is: 1. A semiconductor device comprising: a first transistor; a second transistor; a third transistor; a first capacitor; a second capacitor; and a third capacitor, wherein each of the first transistor and the third transistor comprises a channel formation region comprising an oxide semiconductor, wherein the second transistor comprises a channel formation region comprising silicon, wherein a gate of the first transistor is directly connected to one of a source and a drain of the first transistor, wherein a back gate of the first transistor is directly connected to the one of the source and the drain of the first transistor, wherein the one of the source and the drain of the first transistor is directly connected to the first capacitor, wherein a gate of the second transistor is directly connected to one of a source and a drain of the second transistor, wherein the one of the source and the drain of the second transistor is directly connected to the other of the source and the drain of the first transistor, wherein the one of the source and the drain of the second transistor is directly connected to a first electrode of the second capacitor, wherein a second electrode of the second capacitor is supplied with a first clock signal, wherein one of a source and a drain of the third transistor is directly connected to the third capacitor, and wherein a back gate of the third transistor is electrically connected to the one of the source and the drain of the first transistor. 2. The semiconductor device according to claim 1 , wherein a memory circuit comprises the third transistor and the third capacitor. 3. The semiconductor device according to claim 2 , wherein the memory circuit is a part of a register of a CPU core. 4. The semiconductor device according to claim 1 , wherein a voltage converter circuit comprises the first transistor, the first capacitor, the second transistor and the second capacitor, and wherein the voltage converter circuit is configured to generate a potential by using the first clock signal. 5. The semiconductor device according to claim 1 , wherein the second transistor is an n-channel transistor. 6. The semiconductor device according to claim 1 , further comprising: a fourth transistor; and a fourth capacitor, wherein a gate of the fourth transistor is directly connected to one of a source and a drain of the fourth transistor, wherein the one of the source and the drain of the fourth transistor is directly connected to the other of the source and the drain of the second transistor, wherein the one of the source and the drain of the fourth transistor is directly connected to a first electrode of the fourth capacitor, and wherein a second electrode of the fourth capacitor is supplied with a second clock signal. 7. A semiconductor device comprising: a first transistor; a second transistor; a third transistor; a first capacitor; a second capacitor; and a third capacitor, wherein each of the first transistor, the second transistor and the third transistor comprises a channel formation region comprising an oxide semiconductor, wherein a gate of the first transistor is directly connected to one of a source and a drain of the first transistor, wherein a back gate of the first transistor is directly connected to the one of the source and the drain of the first transistor, wherein the one of the source and the drain of the first transistor is directly connected to the first capacitor, wherein a gate of the second transistor is directly connected to one of a source and a drain of the second transistor, wherein the one of the source and the drain of the second transistor is directly connected to the other of the source and the drain of the first transistor, wherein the one of the source and the drain of the second transistor is directly connected to a first electrode of the second capacitor, wherein a second electrode of the second capacitor is supplied with a first clock signal, wherein one of a source and a drain of the third transistor is directly connected to the third capacitor, and wherein a back gate of the third transistor is electrically connected to the one of the source and the drain of the first transistor. 8. The semiconductor device according to claim 7 , wherein a memory circuit comprises the third transistor and the third capacitor. 9. The semiconductor device according to claim 8 , wherein the memory circuit is a part of a register of a CPU core. 10. The semiconductor device according to claim 7 , wherein a voltage converter circuit comprises the first transistor, the first capacitor, the second transistor and the second capacitor, and wherein the voltage converter circuit is configured to generate a potential by using the first clock signal. 11. The semiconductor device according to claim 7 , wherein the second transistor is an n-channel transistor. 12. The semiconductor device according to claim 7 , further comprising: a fourth transistor; and a fourth capacitor, wherein a gate of the fourth transistor is directly connected to one of a source and a drain of the fourth transistor, wherein the one of the source and the drain of the fourth transistor is directly connected to the other of the source and the drain of the second transistor, wherein the one of the source and the drain of the fourth transistor is directly connected to a first electrode of the fourth capacitor, and wherein a second electrode of the fourth capacitor is supplied with a second clock signal. 13. A semiconductor device comprising: a first transistor; a second transistor; a third transistor; a first capacitor; a second capacitor; and a third capacitor, wherein the first transistor comprises a channel formation region comprising an oxide semiconductor, wherein a gate of the first transistor is directly connected to one of a source and a drain of the first transistor, wherein a back gate of the first transistor is directly connected to the one of the source and the drain of the first transistor, wherein the one of the source and the drain of the first transistor is directly connected to the first capacitor, wherein a gate of the second transistor is directly connected to one of a source and a drain of the second transistor, wherein the one of the source and the drain of the second transistor is directly connected to the other of the source and the drain of the first transistor, wherein the one of the source and the drain of the second transistor is directly connected to a first electrode of the second capacitor, wherein a second electrode of the second capacitor is supplied with a first clock signal, wherein one of a source and a drain of the third transistor is directly connected to the third capacitor, and wherein a back gate of the third transistor is electrically connected to the one of the source and the drain of the first transistor. 14. The semiconductor device according to claim 13 , wherein a memory circuit comprises the third transistor and the third capacitor. 15. The semiconductor device according to claim 14 , wherein the memory circuit is a part of a register of a CPU core. 16. The semiconductor device according to claim 13 , wherein a voltage converter circuit comprises the first transistor, the first capacitor, the second transistor and the second capacitor, and wherein the voltage converter circuit is configured to generate a potential by using the first clock signal. 17. The semiconductor device according to claim 13 ,

Assignees

Inventors

Classifications

  • G06F1/3234Primary

    Power saving characterised by the action undertaken · CPC title

  • Substrate bias-voltage generators (for static stores G11C5/146) · CPC title

  • Substrate bias generators (G11C5/141 takes precedence) · CPC title

  • Cross-Sectional Technologies · mapped topic

  • Charge pumps of the Schenkel-type · CPC title

Patent family

Related publications grouped by family.

External sources

Frequently asked questions

Answers are generated from the same data shown on this page.

What does patent US9825526B2 cover?
To reduce a variation in the electrical characteristics of a transistor. A potential generated by a voltage converter circuit is applied to a back gate of a transistor included in a voltage conversion block. Since the back gate of the transistor is not in a floating state, a current flowing through the back channel can be controlled so as to reduce a variation in the electrical characteristics …
Who is the assignee on this patent?
Semiconductor Energy Lab
What technology area does this patent fall under?
Primary CPC classification G06F1/3234. Mapped technology areas include Physics.
When was this patent published?
Publication date Tue Nov 21 2017 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 8 related publications on this page (citations in our corpus or others sharing the same primary CPC).