Landing gear comprising a zinc-nickel deposit resistant to fretting
US-2017001716-A1 · Jan 5, 2017 · US
US9797048B2 · US · B2
| Field | Value |
|---|---|
| Publication number | US-9797048-B2 |
| Application number | US-201514674570-A |
| Country | US |
| Kind code | B2 |
| Filing date | Mar 31, 2015 |
| Priority date | Mar 31, 2015 |
| Publication date | Oct 24, 2017 |
| Grant date | Oct 24, 2017 |
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The present disclosure relates generally to the field of electroplating and electroless plating. More specifically, the present disclosure relates to plating solutions and plating removal/stripping solutions for stripping zinc/nickel alloy plating from substrates.
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What is claimed is: 1. A method for removing zinc/nickel alloy plating from a plated substrate comprising the steps of: immersing a plated substrate into a solution comprising a basic compound and an amine for a predetermined time, said plated substrate comprising a zinc/nickel alloy plating; and removing the zinc/nickel plating from the substrate. 2. The method of claim 1 , before, after or concurrently with the step of removing the zinc/nickel plating from the substrate, further comprising the step of: removing debris attached to the substrate by wiping, applying ultrasound, applying agitation, or combinations thereof. 3. The method of claim 1 , wherein the solution is maintained at a temperature of from about 60° F. to about 200° F. 4. The method of claim 1 , wherein the basic compound comprises sodium hydroxide, potassium hydroxide and combinations thereof. 5. The method of claim 1 , wherein the basic compound is maintained in the solution at a concentration of from about 10% to about 35% by weight. 6. The method of claim 1 , wherein the amine comprises triethanolamine, N-aminoethylethanolamine, ethylenediamine, diethylenetriamine, triethylenetetramine, tetraethylenepentamine, pentathylenehexamine, and combinations thereof. 7. The method of claim 1 , wherein the amine is maintained in the solution at a concentration of from about 1% to about 25% by weight. 8. The method of claim 1 , wherein the solution is maintained at a pH of greater than about 11. 9. The method of claim 1 , wherein the plated substrate comprises steel, stainless steel, aluminum, aluminum alloy, titanium, titanium alloy, copper, copper alloy, and combinations thereof. 10. A method for replenishing a zinc/nickel alloy plating solution comprising zinc ions and nickel ions, said method comprising the steps of: immersing a plated substrate into a solution comprising a basic compound and an amine for a predetermined time, said plated substrate comprising a zinc/nickel alloy plating; and removing zinc ions and nickel ions from the substrate. 11. The method of claim 10 , wherein the solution is maintained at a temperature of from about 60° F. to about 200° F. 12. The method of claim 10 , wherein the basic compound is maintained in the solution at a concentration of from about 10% to about 35% by weight. 13. The method of claim 10 , wherein the amine is maintained in the solution at a concentration of from about 1% to about 25% by weight. 14. The method of claim 10 , wherein the basic compound comprises sodium hydroxide, potassium hydroxide and combinations thereof. 15. The method of claim 10 , wherein the amine comprises triethanolamine, N-aminoethylethanolamine, ethylenediamine, diethylenetriamine, triethylenetetramine, tetraethylenepentamine, pentathylenehexamine, and combinations thereof. 16. A plating solution for plating zinc/nickel-containing alloy onto a substrate, said plating solution comprising: an amount of basic compound in an amount of from about 10% to about 35% by weight; wherein an amount of zinc and nickel ions are replenished to the plating solution by immersing a substrate plated with a zinc/nickel alloy, stripping zinc ions and nickel ions from the substrate, and returning the zinc ions and nickel ions to the plating solution. 17. The plating solution of claim 16 further comprising: an amount of amine in an amount of from about 1% to about 25% by weight, wherein the amine comprises triethanolamine, N-aminoethylethanolamine, ethylenediamine, diethylenetriamine, triethylenetetramine, tetraethylenepentamine, pentathylenehexamine, and combinations thereof. 18. The plating solution of claim 16 , wherein the basic compound comprises sodium hydroxide, potassium hydroxide and combinations thereof.
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