Scanning ion beam deposition and etch
US-12176178-B2 · Dec 24, 2024 · US
US9734984B2 · US · B2
| Field | Value |
|---|---|
| Publication number | US-9734984-B2 |
| Application number | US-201615001717-A |
| Country | US |
| Kind code | B2 |
| Filing date | Jan 20, 2016 |
| Priority date | Jan 21, 2015 |
| Publication date | Aug 15, 2017 |
| Grant date | Aug 15, 2017 |
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A current quantity measuring method of multi-beams irradiates with a charged particle beam, amplifies an electric signal corresponding to multi-beams passed through a plurality of aperture holes of an aperture member having the plurality of aperture holes to form multi-beams by irradiation with the charged particle beam, receives the electric signal amplified in the minute current measurement unit and counting the number of electrons in the multi-beams, calculates a current quantity of the multi-beams passed through the plurality of aperture holes by using a product of the calculated number of electrons in the multi-beams and elementary charge, and corrects irradiation time of the charged particle beam of each of the plurality of aperture holes on the basis of the calculated current quantity.
Opening claim text (preview).
The invention claimed is: 1. A current quantity measuring method of multi-beams, the method comprising: irradiating with a charged particle beam; converting, in a minute current measurement unit, multi-beams passed through a plurality of aperture holes of an aperture member having the plurality of aperture holes for forming the multi-beams by irradiation with the charged particle beam, into an electric signal, and then amplifying the electric signal; receiving, in a digitizer, the electric signal amplified in the minute current measurement unit and counting the number of electrons in the multi-beams; calculating a current quantity of the multi-beams passed through the plurality of aperture holes by using a product of the calculated number of electrons in the multi-beams and elementary charge; and correcting, in a correction unit, irradiation time of the charged particle beam of each of the plurality of aperture holes on the basis of the calculated current quantity. 2. The current quantity measuring method according to claim 1 , wherein, in counting the number of electrons in the multi-beams, a reference value for a wave height value of the signal input to the digitizer is provided previously, and in a case where the wave height value is within a range between thresholds including the reference value, the number of electrons in the multi-beams is counted as one. 3. The current quantity measuring method according to claim 2 , comprising: converting the input signal to a voltage signal after amplifying the electric signal corresponding to the multi-beams, wherein the voltage signal is input to the digitizer. 4. The current quantity measuring method according to claim 3 , wherein in counting the number of electrons in the multi-beams, the number of electrons in charged particle beams passed through a corresponding aperture hole is counted by each of the plurality of aperture holes. 5. A multi-charged particle beam drawing control device comprising: a minute current measuring unit to convert multi-beams passed through a plurality of aperture holes of an aperture member having the plurality of aperture holes for forming the multi-beams by irradiation with the charged particle beam, into an electric signal, and then to amplify the electric signal; a digitizer to receive the electric signal amplified in the minute current measurement unit, counting the number of electrons in the multi-beams by each of the plurality of apertures, and calculating a current quantity of the multi-beams passed through the plurality of aperture holes by using a product of the calculated number of electrons in the multi-beams and elementary charge; and a correction unit configured to correct irradiation time of the charged particle beam of every one of the plurality of aperture holes on the basis of the calculated current quantity. 6. The multi-charged particle beam drawing control device according to claim 5 , wherein in the counting of the number of electrons in the multi-beams, a reference value for a wave height value of the signal input to the digitizer is provided previously, and in a case where the wave height value is within a range between thresholds including the reference value, the number of electrons in the multi-beams is counted as one. 7. The multi-charge particle beam drawing control device according to claim 6 , wherein the minute current measuring unit comprises a converter configured to convert the input signal to a voltage signal, and the voltage signal is input to the digitizer. 8. A multi-charge particle beam drawing device comprising: a stage to mount a sample and to be moved consecutively; an emitter to emit a charged particle beam; an aperture member having a plurality of aperture holes by irradiating an area including all the aperture holes with the charged particle beam so that the charged particle beam passes through the aperture holes to form multi beams; a blanking plate having a plurality of blankers, each blanker conducting blanking control of the corresponding beam in the multi-beams passed through the plurality of aperture holes; a minute current measurement unit to convert the multi-beams passed through the plurality of aperture holes in the blanking plate, into an electric signal, and then to amplify the electric signal; a digitizer to receive the electric signal amplified in the minute current measurement unit, counting the number of electrons in the multi-beams by every one of the plurality of apertures, and calculating a current quantity of the multi-beams passed through the plurality of aperture holes by using a product of the calculated number of electrons in the multi-beams and elementary charge; and a correction unit to correct irradiation time of the charged particle beam by every one of the plurality of aperture holes on the basis of the calculated current quantity. 9. The multi-charged particle beam drawing device according to claim 8 , wherein in the counting of the number of electrons in the multi-beams, a reference value for a wave height value of the signal input to the digitizer is provided previously, and in a case where the wave height value is within a range between thresholds including the reference value, the number of electrons in the multi-beams is counted as one. 10. The multi-charged particle beam drawing device according to claim 9 , wherein the minute current measuring unit comprises a converter to convert the electric signal to a voltage signal, and the voltage signal is input to the digitizer, the digitizer calculating the number of electrons by every one of the plurality of aperture holes based on the voltage signal.
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