External element made of zirconia with selectively conductive zones for electronic applications
US-2019004481-A1 · Jan 3, 2019 · US
US9708225B2 · US · B2
| Field | Value |
|---|---|
| Publication number | US-9708225-B2 |
| Application number | US-201514943842-A |
| Country | US |
| Kind code | B2 |
| Filing date | Nov 17, 2015 |
| Priority date | Nov 17, 2015 |
| Publication date | Jul 18, 2017 |
| Grant date | Jul 18, 2017 |
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A method of treating a ceramic surface containing zirconia, whereby the ceramic surface is ablated by directing a laser beam with a diameter of 200-400 μm produced by a CO 2 laser with a pulse frequency of 1200-1800 Hz onto the ceramic surface, and a N 2 assist gas is concurrently applied with a pressure of 550-650 KPa co-axially with the laser beam to form an ablated ceramic surface comprising microgrooves with ZrN present on a surface of the microgrooves, wherein the ablated ceramic surface has a higher surface hydrophobicity than the ceramic surface prior to the ablating.
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The invention claimed is: 1. A method of treating a ceramic surface comprising zirconia, the method comprising: ablating the ceramic surface by directing a laser beam with a diameter of 200-400 μm produced by a CO 2 laser with a pulse frequency of 1200-1800 Hz onto the ceramic surface; and concurrently exposing the ceramic surface to a N 2 assist gas with a pressure of 550-650 KPa to form an ablated ceramic surface comprising microgrooves with ZrN present on a surface of the microgrooves, wherein the N 2 assist gas and the laser beam are oriented co-axially; wherein the ceramic surface is not pretreated with particles selected from the group consisting of TiC and B 4 C prior to the ablating; wherein the ablated ceramic surface has a Vickers hardness of 19.2-23 GPa; and wherein the ablated ceramic surface has a higher surface hydrophobicity than the ceramic surface prior to the ablating. 2. The method of claim 1 , wherein the ceramic surface comprises yttria stabilized zirconia. 3. The method of claim 1 , wherein the ceramic surface is ablated with a laser beam having a power ranging from 1.5-2.5 kW. 4. The method of claim 1 , wherein the ceramic surface is ablated with a laser beam with a scanning speed ranging from 7-13 cm·s −1 . 5. The method of claim 1 , wherein the ceramic surface is ablated with a laser beam penetration depth of 3-8 μm. 6. The method of claim 1 , wherein the ablated ceramic surface has a surface roughness ranging from 0.25-0.35 μm when measured on a 1 μm×1 μm area. 7. The method of claim 1 , wherein the microgrooves have an average width of 40-60 μm and an average distance between the microgrooves is 20-30 μm. 8. The method of claim 1 , wherein the ablated ceramic surface has a surface energy of 40-55 mJ/m 2 . 9. The method of claim 1 , wherein the ablated ceramic surface has an average water droplet contact angle of 98-121.4°. 10. The method of claim 1 , which increases the surface hydrophobicity of the ceramic surface by at least 100% relative to a ceramic surface that is not treated by the ablating and the concurrently exposing as measured by an average water droplet contact angle. 11. The method of claim 1 , wherein the ablated ceramic surface has an average glycerol droplet contact angle of 93-120°. 12. The method of claim 1 , wherein the ablated ceramic surface has an average diiodomethane droplet contact angle of 35-45°. 13. The method of claim 1 , wherein the ablated ceramic surface has a Vickers hardness of 19.2 GPa. 14. The method of claim 1 , wherein the ablated ceramic surface has a residual stress of −1.7 to −1.5 GPa. 15. The method of claim 1 , wherein the ablated ceramic surface has a fracture toughness of 6.5-9.0 MPa·√m. 16. The method of claim 1 , wherein the ceramic surface is not pretreated with a film, a resin, nanostructures, or any combination thereof prior to the ablating. 17. The method of claim 1 , further comprising coating the ablated ceramic surface with a hydrophobic layer to form a superhydrophobic ceramic surface. 18. The method of claim 17 , wherein the hydrophobic layer comprises at least one selected from the group consisting of a fluorocarbon, a perfluorocarbon, a resin, a hydrophobic fatty acid, and a hydrophobic self-assembled monolayer. 19. A method of treating a yttria stabilized zirconia surface, comprising: ablating the yttria stabilized zirconia surface by directing a laser beam produced by a laser with a pulse frequency of 1200-1800 Hz onto the yttria stabilized zirconia surface; and concurrently exposing the yttria stabilized zirconia surface to a N 2 assist gas with a pressure of 550-650 KPa to form an ablated yttria stabilized zirconia surface comprising microgrooves with ZrN present on a surface of the microgrooves, wherein the N 2 assist gas and the laser beam are oriented co-axially; wherein the yttria stabilized zirconia surface is not pretreated with particles selected from the group consisting of TiC and B 4 C prior to the ablating; wherein the ablated yttria stabilized zirconia surface has a surface hydrophobicity that is at least 100% higher than a yttria stabilized zirconia surface that is not treated by the ablating and the concurrently exposing as measured by an average water droplet contact angle; and wherein the ablated yttria stabilized zirconia surface has a Vickers hardness of 19.2-23 GPa. 20. A method of treating a yttria stabilized zirconia surface, comprising: ablating the yttria stabilized zirconia surface by directing a laser beam produced by a CO 2 laser with a pulse frequency of 1200-1800 Hz onto the yttria stabilized zirconia surface; and concurrently exposing the yttria stabilized zirconia surface to a N 2 assist gas with a pressure of 550-650 KPa to form an ablated yttria stabilized zirconia surface comprising microgrooves with ZrN present on a surface of the microgrooves, wherein the N 2 assist gas and the laser beam are oriented co-axially; wherein the ablated yttria stabilized zirconia surface has a Vickers hardness of 19.2-23 GPa; wherein the ablated yttria stabilized zirconia surface has a higher surface hydrophobicity than the yttria stabilized zirconia surface; and wherein the yttria stabilized zirconia is not pretreated with particles selected from the group consisting of TiC and B 4 C, a film, a resin, nanostructures, or any combination thereof prior to the ablating.
using a fluid stream, e.g. a jet of gas, in conjunction with the laser beam; Nozzles therefor (B23K26/12 takes precedence) · CPC title
Stabilised zirconias, e.g. YSZ or cerium stabilised zirconia · CPC title
coating or impregnating with a product reacting with the substrate, e.g. generating a metal coating by surface reduction of a ceramic substrate · CPC title
Pre-treatment of the joining surfaces, e.g. cleaning, machining · CPC title
for coating {or applying engobing layers}(glazing, engobing C04B) · CPC title
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