Automatic tuning of atomic force microscope

Patent metadata

Field	Value
Publication number	US-9678103-B2
Application number	US-201113283756-A
Country	US
Kind code	B2
Filing date	Oct 28, 2011
Priority date	Oct 28, 2011
Publication date	Jun 13, 2017
Grant date	Jun 13, 2017

Abstract

An atomic force microscope (AFM) comprises a physical system and a controller comprising a plurality of digital filters and configured to control the physical system. The AFM is tuned by performing automatic loop shaping on a loop response defined by a frequency response of the physical system and a frequency response of the controller, and adjusting a gain of the controller according to a peak in a magnitude of the loop response.

First claim

The invention claimed is:

1. A method of tuning an atomic force microscope (AFM) comprising a physical system and a controller configured to control the physical system, the method comprising:
determining a frequency response of the controller based on a set of filter coefficients;
determining a loop response of the controller and the physical system based on the determined frequency response of the controller and a measured frequency response of the physical system;
aligning a magnitude of the determined loop response with a desired loop shape;
determining a value of an error function between the aligned magnitude of the determined loop response and the desired loop shape; and
adjusting the set of filter coefficients to improve the value of the error function and to reduce off-surface resonance of a cantilever arm of the AFM.

2. The method of claim 1 , further comprising generating an initial set of filter coefficients for a filter to be appended to the controller, comprising:
locating minima and maxima of the error function;
determining a weighting function to determine a relative importance of each of the minima and maxima;
locating one of the minima or maxima with a highest weight according to the weighting function, and pairing it with a closest maximum or minimum, respectively; and
deriving the initial set of filter coefficients from the paired minimum and maximum.

3. The method of claim 1 , further comprising generating a filter to be appended to the controller, comprising:
locating a maximum of the error function;
fitting a curve to a portion of the error function around the located maximum; and
inverting the curve to generate a response characteristic of the filter.

4. The method of claim 3 , wherein the filter is a biquadratic filter.

5. The method of claim 1 , wherein the set of filter coefficients corresponds to at least one proportional-integral derivative (PID) filter and at least one biquadratic filter.

6. The method of claim 1 , further comprising adjusting a gain of the controller based on a gain or phase margin of the loop response.

7. The method of claim 1 , wherein aligning the magnitude of the determined loop response with the desired loop shape comprises aligning a low frequency region of the magnitude of the determined loop response with a low frequency region of the desired loop shape.

8. A system for tuning an atomic force microscope (AFM) comprising a physical system and a controller comprising a plurality of digital filters and configured to control the physical system, the system comprising:
a loop shaping component that performs automatic loop shaping on a loop response defined by a frequency response of the physical system and a frequency response of the controller, the loop shaping component configured to determine the loop response of the controller and the physical system based on a frequency response of the controller and a measured frequency response of the physical system, wherein the frequency response of the controller is determined based on a set of filter coefficients; and
a gain adjustment component that adjusts a gain of the controller according to a local maximum magnitude of the loop response, wherein the controller is adapted to:
align a magnitude of the determined loop response with a desired loop shape;
determine a value of an error function between the aligned magnitude of the determined loop response and the desired loop shape; and
adjust the set of filter coefficients to improve the value of the error function and to reduce off-surface resonance of a cantilever arm of the AFM.

9. The system of claim 8 , wherein the loop shaping component initializes a set of filter coefficients for a filter, appends the filter to at least one other filter already included the controller, determines the loop response with the controller having the appended filter, and optimizes the set of filter coefficients with respect to the desired loop shape of the loop response.

10. The system of claim 9 , wherein the filter is a biquadratic filter and the at least one other filter comprises a proportional-integral derivative (PID) filter.

11. The system of claim 8 , wherein the gain adjustment component adjusts the gain of the controller such that a magnitude of the loop response is lower than a predefined gain margin where a phase of the loop response is less than or equal to −180°.

12. The system of claim 8 , wherein the gain adjustment component adjusts the gain of the controller such that a phase of the loop response is greater than a predefined phase margin minus 180° where a magnitude of the loop response is greater than or equal to one.

Assignees

• Abramovitch Daniel Y
• Moon Christopher Ryan
• Keysight Technologies Inc

Inventors

• Abramovitch Daniel Y
• Moon Christopher Ryan

Classifications

• G01Q20/02

  by optical means · CPC title

• G01Q60/24

  AFM [Atomic Force Microscopy] or apparatus therefor, e.g. AFM probes · CPC title

• B82Y35/00

  Methods or apparatus for measurement or analysis of nanostructures · CPC title

• G01Q10/065 Primary

  Feedback mechanisms, i.e. wherein the signal for driving the probe is modified by a signal coming from the probe itself · CPC title