High throughput cooled ion implantation system and method

Patent metadata

Field	Value
Publication number	US-9607803-B2
Application number	US-201514817893-A
Country	US
Kind code	B2
Filing date	Aug 4, 2015
Priority date	Aug 4, 2015
Publication date	Mar 28, 2017
Grant date	Mar 28, 2017

Abstract

An ion implantation system has a process chamber having a process environment, and an ion implantation apparatus configured to implant ions into a workpiece supported by a chuck within the process chamber. A load lock chamber isolates the process (vacuum) environment from an atmospheric environment, wherein a load lock workpiece support supports the workpiece therein. An isolation chamber is coupled to the process chamber with a pre-implant cooling environment defined therein. An isolation gate valve selectively isolates the pre-implant cooling environment from the process environment wherein the isolation chamber comprises a pre-implant cooling workpiece support for supporting and cooling the workpiece. The isolation gate valve is the only access path for the workpiece to enter and exit the isolation chamber. A pressurized gas selectively pressurizes the pre-implant cooling environment to a pre-implant cooling pressure that is greater than the process pressure for expeditious cooling of the workpiece. A workpiece transfer arm transfer the workpiece between the load lock chamber, isolation chamber, and chuck. A controller controls the workpiece transfer arm selectively cools the workpiece to a pre-implant cooling temperature in the isolation chamber at the pre-implant cooling pressure via a control of the isolation gate valve, pre-implant cooling workpiece support, and pressurized gas source.

First claim

The invention claimed is:

1. An ion implantation system, comprising:
an ion source configured to provide a plurality of ions to a workpiece positioned in a process chamber, wherein the process chamber has a process environment associated therewith;
a chuck configured to support the workpiece within the process chamber during exposure of the workpiece to the plurality of ions;
a load lock chamber operably coupled to the process chamber, said load lock chamber being configured to enable transfer of the workpiece to and from an atmospheric environment and the process environment, said load lock chamber including a load lock workpiece support configured to support the workpiece during the transfer of the workpiece;
an isolation chamber operably coupled to the process chamber and having a pre-implant cooling environment defined therein, wherein the isolation chamber comprises an isolation gate valve configured to selectively isolate the pre-implant cooling environment from the process environment and to selectively permit access of the workpiece to the pre-implant cooling environment, wherein the isolation chamber comprises a pre-implant cooling workpiece support configured to support and cool the workpiece within the pre-implant cooling environment, and wherein the isolation gate valve defines the only access path for the workpiece to enter and exit the isolation chamber to or from the process chamber;
a pressurized gas source operably coupled to the isolation chamber, wherein the pressurized gas source is configured to selectively pressurize the pre-implant cooling environment to a pre-implant cooling pressure when the isolation gate valve is closed, and wherein the pre-implant cooling pressure is greater than a process pressure of the process environment;
a workpiece transfer arm configured to selectively transfer the workpiece between two or more of the load lock chamber, the isolation chamber, and the process chamber; and
a controller configured to selectively transfer the workpiece between the load lock workpiece support, the pre-implant cooling workpiece support, and the chuck via a control of the workpiece transfer arm, and wherein the controller is further configured to selectively cool the workpiece to a pre-implant cooling temperature within the isolation chamber at the pre-implant cooling pressure via a control of the isolation gate valve, the pre-implant cooling workpiece support, and the pressurized gas source.

2. The ion implantation system of claim 1 , further comprising a vacuum source operably coupled to the isolation chamber, wherein the controller is further configured to selectively evacuate the isolation chamber to approximately the process pressure via a control of the vacuum source and the pre-chill gate valve.

3. The ion implantation system of claim 2 , wherein the controller is configured to selectively evacuate the isolation chamber after the workpiece is cooled to the pre-implant cooling temperature at the pre-implant cooling pressure.

4. The ion implantation system of claim 1 , wherein the pre-implant cooling pressure is selected from a range of pressures extending from the process pressure to atmospheric pressure.

5. The ion implantation system of claim 1 , wherein the pre-implant cooling pressure is greater than atmospheric pressure.

6. The ion implantation system of claim 1 , wherein the pressurized gas source comprises a dry gas comprised of one or more of desiccated air, nitrogen, and helium.

7. The ion implantation system of claim 1 , wherein the pre-implant cooling workpiece support comprises a chilled platen configured to contact a bottom surface of the workpiece, thereby supporting and cooling the workpiece within the pre-implant cooling environment.

8. The ion implantation system of claim 7 , wherein the chilled platen comprises one or more coolant passages defined therein, wherein the chilled platen is configured to cool the workpiece via a circulation of a coolant fluid through the coolant passages.

9. The ion implantation system of claim 8 , wherein the chuck further comprises chuck coolant passages defined therein, and wherein the coolant fluid further circulates through the chuck coolant passages.

10. The ion implantation system of claim 1 , wherein the chuck comprises an electrostatic clamp configured to cool the workpiece to a process temperature.

11. The ion implantation system of claim 10 , wherein the chuck comprises chuck coolant passages defined therein, wherein the chuck is further configured to cool the workpiece to the process temperature via a circulation of a coolant fluid through the chuck coolant passages.

12. The ion implantation system of claim 10 , wherein the process temperature is lower than the pre-implant cooling temperature.

13. The ion implantation system of claim 1 , wherein the isolation chamber is adjacent to the load lock chamber.

14. The ion implantation system of claim 1 , further comprising a post-heat station operably coupled to the process chamber, wherein the post-heat station comprises a heated workpiece support configured to heat the workpiece to a post-heat temperature that is greater than a dew point of the atmospheric environment.

15. The ion implantation system of claim 14 , wherein the post-heat station is defined within the load lock chamber.

16. The ion implantation system of claim 1 , wherein the pre-implant cooling workpiece support comprises one or more of a Peltier cooler, an expansion chamber, a cryogenic head, and a circulatory refrigeration loop.

17. The ion implantation system of claim 1 , wherein the isolation chamber further comprises a pin lifter mechanism configured to selectively raise and lower the workpiece with respect to the pre-implant cooling workpiece support.

18. The ion implantation system of claim 1 , wherein the controller is further configured to determine the pre-implant cooling temperature based, at least in part, on a desired process throughput.

19. The ion implantation system of claim 1 , further comprising a temperature monitoring system configured to measure a temperature of the workpiece at the isolation chamber, wherein the controller is further configured to control the selective cooling of the workpiece to the pre-implant cooling temperature based, at least in part, on the measured temperature of the workpiece.

20. A method for implanting ions into a workpiece at sub-ambient temperatures, the method comprising:
providing a workpiece in an atmospheric environment at an atmospheric temperature and atmospheric pressure;
transferring the workpiece from the atmospheric environment to a load lock chamber of an ion implantation system;
lowering the pressure within the load lock chamber to a process pressure associated with a process environment of a process chamber;
transferring the workpiece at the process pressure from the load lock chamber, through the process chamber, and onto a pre-implant cooling workpiece support in an isolation chamber;
isolating the workpiece from the process pressure of the process chamber within the isolation chamber;
raising the pressure within the isolation chamber to a pre-implant cooling pressure that is greater than the process pressure;
cooling the workpiece to a pre-implant cooling temperature in the isolation chamber at the pre-implant cooling pressure via the pre-implant cooling workpiece support;
lowering the pressure within the isolation chamber to the process pressure;
transferring the workpiece from the isolation chamber to a chuck residing in the process environmen

Assignees

• Axcelis Tech Inc

Inventors

• Huseinovic Armin
• Ferrara Joseph
• Terry Brian

Classifications

• H10P72/0434

  mainly by convection · CPC title

• H10P30/226

  at a temperature lower than room temperature · CPC title

• H10P72/0471

  comprising at least one ion or electron beam chamber · CPC title

• H10P72/72

  using electrostatic chucks · CPC title

• H01J37/20 Primary

  Means for supporting or positioning the object or the material; Means for adjusting diaphragms or lenses associated with the support · CPC title