High voltage isolation of an inductively coupled plasma ion source with a liquid that is not actively pumped

Patent metadata

Field	Value
Publication number	US-9591735-B2
Application number	US-201214128030-A
Country	US
Kind code	B2
Filing date	Jun 21, 2012
Priority date	Jun 21, 2011
Publication date	Mar 7, 2017
Grant date	Mar 7, 2017

Abstract

An inductively-coupled plasma source for a focused charged particle beam system includes a plasma chamber and a fluid that is not actively pumped surrounding the plasma chamber for providing high voltage isolation between the plasma chamber and nearby parts which are at ground potential, such as a conductive shield. One or more cooling devices cool the plasma chamber by using evaporative cooling and heat pipes to dissipate the heat from the plasma chamber into a surrounding environment.

First claim

We claim as follows:

1. A charged particle beam system, comprising:
a plasma source having:
a plasma chamber having a wall composed of a dielectric material, the wall having an interior surface and an exterior surface;
a conductor coiled at least one time around the plasma chamber;
a first fluid surrounding and in thermal contact with at least a portion of the plasma chamber, in which the fluid is not actively pumped; and

a source electrode for electrically biasing the plasma to a high voltage;
one or more focusing lenses for focusing charged particles from the plasma source onto a sample; and
at least one heat pipe containing a second fluid, a portion of the at least one heat pipe is in thermal contact with the first fluid such that heat from the first fluid can dissipate through the at least one heat pipe into the second fluid to cool the first fluid, said second fluid being separate from the first fluid surrounding and in thermal contact with at least a portion of the plasma chamber.

2. The charged particle beam system of claim 1 in which a portion of the first fluid is positioned between the plasma chamber and the conductor.

3. The charged particle beam system of claim 1 in which the first fluid has a dielectric constant greater than 5.

4. The charged particle beam system of claim 1 in which the first fluid comprises water or a fluorine compound.

5. The charged particle beam system of claim 1 further comprising a conductive shield positioned between the plasma chamber and the conductor, at least a portion of the first fluid positioned between the plasma chamber and the conductive shield.

6. The charged particle beam system of claim 5 further comprising at least one cooling device for cooling the first fluid.

7. The charged particle beam system of claim 6 in which the at least one cooling device comprises a thermoelectric cooler.

8. The charged particle beam system of claim 1 , further comprising a cooling fin in thermal contact with the at least one heat pipe, the cooling fin for dissipating heat from the at least one heat pipe and transferring the heat into a surrounding environment.

9. A method of maintaining a plasma source, comprising:
providing a plasma chamber for containing a plasma;
providing radio frequency energy to the plasma chamber from a radio frequency coil;
providing a conductive shield between the coil and the plasma chamber;
providing a first fluid between the conductive shield and the plasma chamber; wherein the fluid provides high voltage isolation of the plasma chamber and the fluid is not actively pumped; and
providing at least one heat pipe containing a second fluid, a portion of the at least one heat pipe is in thermal contact with the first fluid such that heat from the first fluid can dissipate through the at least one heat pipe into the second fluid to cool the first fluid, said second fluid being separate from the first fluid surrounding and in thermal contact with at least a portion of the plasma chamber.

10. The method of claim 9 further comprising providing at least one cooling device in thermal contact with the plasma chamber for cooling the plasma chamber.

11. The method of claim 10 in which providing at least one cooling device comprises providing a cooling tube for circulating a cooling fluid or a thermoelectric cooler.

12. The method of claim 9 in which providing a fluid between the conductive shield and the plasma chamber comprises providing water or a fluorine compound.

13. The method of claim 9 further comprising providing a heat pipe for cooling the plasma chamber, in which a portion of the heat pipe is in thermal contact with the fluid.

14. The method of claim 13 in which a portion of the fluid between the conductive shield and the plasma chamber is evaporated to produce a vapor, the heat from the vapor being dissipated by the heat pipe and transferred to a surrounding environment to cool the plasma chamber.

15. A method of providing high voltage isolation to a plasma source of a charged particle beam system, comprising:
directing energy to maintain a plasma in a plasma chamber;
conducting heat from the wall of the plasma chamber to a first fluid, a portion of the fluid in thermal contact with the wall of the plasma chamber; and
cooling the first fluid by means of a heat pipe in thermal contact with the first fluid such that heat from the first fluid can dissipate through the at least one heat pipe into a second fluid to cool the first fluid, said second fluid being separate from the first fluid surrounding and in thermal contact with at least a portion of the plasma chamber.

16. The method of claim 15 in which the first fluid is not actively pumped.

17. The method of claim 15 in which the first fluid is maintained in a jacket surrounding the plasma chamber, the jacket connected to the heat pipe such that a portion of the vapor rises through the heat pipe.

Assignees

• Kellogg Sean
• Wells Andrew B
• Mcginn James B
• Parker N William
• Utlaut Mark W
• Fei Co

Inventors

• Kellogg Sean
• Wells Andrew B
• Mcginn James B
• Parker N William
• Utlaut Mark W

Classifications

• H01J27/16 Primary

  using high-frequency excitation, e.g. microwave excitation · CPC title

• H01J2237/31749

  Focused ion beam · CPC title

• H01J2237/0817

  Microwaves · CPC title

• H05H2001/4652

  Electricity · mapped topic

• H01J37/08

  Ion sources; Ion guns · CPC title