Electrodynamic mass analysis with RF biased ion source
US-11587778-B2 · Feb 21, 2023 · US
using high-frequency excitation, e.g. microwave excitation
using high-frequency excitation, e.g. microwave excitation · Cooperative Patent Classification (CPC)
Electric circuits, power, telecommunications, and semiconductors.
Related technology areas
Mapped technology topics for this CPC code.
| Metric | Value |
|---|---|
| CPC code | H01J27/16 |
| Official title | using high-frequency excitation, e.g. microwave excitation |
| Display label | using high-frequency excitation, e.g. microwave excitation |
| Total patents | 64 |
Filing trend
Year-over-year patent counts classified under this CPC code.
Filing activity over the last five years is growing.
| Year | Patents |
|---|---|
| 2015 | 10 |
| 2016 | 11 |
| 2017 | 16 |
| 2018 | 7 |
| 2019 | 8 |
| 2020 | 1 |
| 2021 | 3 |
| 2022 | 3 |
| 2023 | 3 |
| 2025 | 2 |
Representative patents
Representative publications under this CPC code from precomputed stats, or recent filings when stats are unavailable.
Grid assembly and ion beam etching apparatus
US-11508545-B2 · Nov 22, 2022 · US
Multi-source ion beam etch system
US-11387071-B2 · Jul 12, 2022 · US
Electrodynamic mass analysis with rf biased ion source
US-2022139691-A1 · May 5, 2022 · US
Ion source, circular accelerator using same, and particle beam therapy system
US-2021393986-A1 · Dec 23, 2021 · US
Charged particle beam apparatus
US-11017988-B2 · May 25, 2021 · US
Multi-source ion beam etch system
US-2021104374-A1 · Apr 8, 2021 · US
Charged particle beam apparatus
US-2020135437-A1 · Apr 30, 2020 · US
Ion implantation processes and apparatus
US-10497532-B2 · Dec 3, 2019 · US
Ion generator
US-10361058-B2 · Jul 23, 2019 · US
Negative ribbon ion beams from pulsed plasmas
US-10290470-B2 · May 14, 2019 · US
Plasma processing apparatus
US-2019131108-A1 · May 2, 2019 · US
Means of introducing an analyte into liquid sampling atmospheric pressure glow discharge
US-10269525-B2 · Apr 23, 2019 · US
MPD thruster that accelerates electrodeless plasma and electrodeless plasma accelerating method using MPD thruster
US-10260487-B2 · Apr 16, 2019 · US
Positive and negative ion source based on radio-frequency inductively coupled discharge
US-2019051486-A1 · Feb 14, 2019 · US
Positive and negative ion source based on radio-frequency inductively coupled discharge
US-10204758-B1 · Feb 12, 2019 · US
RF ion source with dynamic volume control
US-10134568-B2 · Nov 20, 2018 · US
Ion generator
US-2018254166-A1 · Sep 6, 2018 · US
Rf ion source with dynamic volume control
US-2018138020-A1 · May 17, 2018 · US
Vaporizer for ion source
US-9928983-B2 · Mar 27, 2018 · US
Frequently asked questions
Answers are generated from the same data shown on this page.
- What is CPC H01J27/16?
- CPC H01J27/16 is the Cooperative Patent Classification code for “using high-frequency excitation, e.g. microwave excitation.”
- How many patents are filed under CPC H01J27/16 (using high-frequency excitation, e.g. microwave excitation)?
- Our database includes 64 publications tagged with this CPC code.
- Is patent activity under CPC H01J27/16 growing?
- Publication counts under this code: 3 in 2023 vs 2 in 2025 (latest complete years).