Substrate processing apparatus, method of manufacturing semiconductor device and non-transitory computer-readable recording medium

Patent metadata

Field	Value
Publication number	US-9587314-B2
Application number	US-201414551900-A
Country	US
Kind code	B2
Filing date	Nov 24, 2014
Priority date	Nov 29, 2013
Publication date	Mar 7, 2017
Grant date	Mar 7, 2017

Abstract

Provided is a substrate processing apparatus including a substrate processing chamber configured to process a substrate; a gas supply unit configured to alternately supply a first processing gas and a second processing gas to the substrate when processing the substrate; a substrate support unit including a support mechanism configured to support a portion of a back side of the substrate and a support unit configured to support the support mechanism; a heating unit configured to heat the substrate from the back side thereof; a standby chamber configured to accommodate the substrate support unit in standby position; and a control unit configured to control at least one of the gas supply unit and a gas exhaust unit in a manner that an inner pressure of the substrate processing chamber is higher than that of the standby chamber.

First claim

What is claimed is:

1. A method of manufacturing a semiconductor device, comprising:
(a) transferring a substrate from a standby chamber to a substrate processing position in a substrate processing chamber by a substrate support unit;
(b) supplying an inert gas into the substrate processing chamber with the substrate in the substrate processing position such that an inner pressure of the substrate processing chamber is higher than that of the standby chamber;
(c) alternately supplying a first processing gas and a second processing gas to the substrate while heating the substrate from a back side thereof after performing (b); and
(d) starting a supply of the inert gas into the standby chamber after a supply of the second processing gas starts and stopping the supply of the inert gas into the standby chamber before the supply of the second processing gas stops.

2. The method of claim 1 , further comprising:
(e) reducing an amount of the inert gas supplied into the substrate processing chamber between supplies of the first processing gas and the second processing gas in (c).

3. The method of claim 1 , further comprising:
(e) starting a supply of the inert gas into the standby chamber after a supply of the first processing gas starts and stopping the supply of the inert gas into the standby chamber before the supply of the first processing gas stops.

4. The method of claim 2 , further comprising:
(f) starting a supply of the inert gas into the standby chamber after a supply of the first processing gas starts and stopping the supply of the inert gas into the standby chamber before the supply of the first processing gas stops.

5. The method of claim 1 , wherein the inert gas is supplied from an outer circumferential side of the substrate into the substrate processing chamber in (b).

6. The method of claim 1 , wherein
a narrow-space region around the substrate processing position is defined between the substrate support unit and a narrow-space forming member when the substrate support unit is in the substrate processing position in (a), and
the inert gas is supplied to the narrow-space region in (c).

7. A non-transitory computer-readable recording medium storing a program for causing a computer to control a substrate processing apparatus to perform:
(a) transferring a substrate from a standby chamber to a substrate processing position in a substrate processing chamber by a substrate support unit; and
(b) supplying an inert gas into the substrate processing chamber with the substrate in the substrate processing position such that an inner pressure of the substrate processing chamber is higher than that of the standby chamber;
(c) alternately supplying a first processing gas and a second processing gas to the substrate while heating the substrate from a back side thereof after performing (b); and
(d) starting a supply of the inert gas into the standby chamber after a supply of the second processing gas starts and stopping the supply of the inert gas into the standby chamber before the supply of the second processing gas stops.

8. The non-transitory computer-readable recording medium of claim 7 , further comprising:
(e) reducing an amount of the inert gas supplied into the substrate processing chamber between supplies of the first processing gas and the second processing gas in (c).

9. The non-transitory computer-readable recording medium of claim 7 , further comprising:
(e) starting a supply of the inert gas into the standby chamber after a supply of the first processing gas starts and stopping the supply of the inert gas into the standby chamber before the supply of the first processing gas stops.

10. The non-transitory computer-readable recording medium of claim 8 , further comprising:
(f) starting a supply of the inert gas into the standby chamber after a supply of the first processing gas starts and stopping the supply of the inert gas into the standby chamber before the supply of the first processing gas stops.

11. The non-transitory computer-readable recording medium of claim 7 , wherein the inert gas is supplied from an outer circumferential side of the substrate into the substrate processing chamber in (b).

12. The non-transitory computer-readable recording medium of claim 7 , wherein
a narrow-space region around the substrate processing position is defined between the substrate support unit and a narrow-space forming member when the substrate support unit is in the substrate processing position in (a), and
the inert gas is supplied to the narrow-space region in (c).

Assignees

• Hitachi Int Electric Inc

Inventors

• Sato Taketoshi
• Hiramatsu Hiroaki
• Hirochi Yukitomo

Classifications

• C23C16/481

  by radiant heating of the substrate · CPC title

• C23C16/4583

  the substrate being supported substantially horizontally · CPC title

• C23C16/45557

  Pulsed pressure or control pressure · CPC title

• C23C16/45519

  Inert gas curtains · CPC title

• C23C16/4412

  Details relating to the exhausts, e.g. pumps, filters, scrubbers, particle traps · CPC title