Electrostatic chuck
US-2024297063-A1 · Sep 5, 2024 · US
the substrate being supported substantially horizontally
the substrate being supported substantially horizontally · Cooperative Patent Classification (CPC)
Chemical and metallurgical processes, compounds, and materials.
Related technology areas
Mapped technology topics for this CPC code.
| Metric | Value |
|---|---|
| CPC code | C23C16/4583 |
| Official title | {the substrate being supported substantially horizontally} |
| Display label | the substrate being supported substantially horizontally |
| Total patents | 1,386 |
Filing trend
Year-over-year patent counts classified under this CPC code.
Filing activity over the last five years is growing.
| Year | Patents |
|---|---|
| 2015 | 64 |
| 2016 | 65 |
| 2017 | 63 |
| 2018 | 96 |
| 2019 | 81 |
| 2020 | 130 |
| 2021 | 116 |
| 2022 | 157 |
| 2023 | 159 |
| 2024 | 212 |
| 2025 | 205 |
| 2026 | 38 |
Representative patents
Representative publications under this CPC code from precomputed stats, or recent filings when stats are unavailable.
Vertical heat treatment apparatus and method of operating vertical heat treatment apparatus
US-2015376789-A1 · Dec 31, 2015 · US
Hydrophobization treatment apparatus, hydrophobization treatment method, and hydrophobization treatment recording medium
US-2015361559-A1 · Dec 17, 2015 · US
Coating apparatus for resin container, and resin container manufacturing system
US-2015354057-A1 · Dec 10, 2015 · US
Hollow cathode discharge (hcd) suppressing capacitively coupled plasma electrode and gas distribution faceplate
US-2015345020-A1 · Dec 3, 2015 · US
Film deposition apparatus
US-2015345015-A1 · Dec 3, 2015 · US
Plasma processing method and apparatus
US-2015340208-A1 · Nov 26, 2015 · US
Thermal processing susceptor
US-2015340266-A1 · Nov 26, 2015 · US
Tiled showerhead for a semiconductor chemical vapor deposition reactor
US-9175393-B1 · Nov 3, 2015 · US
Substrate processing apparatus, method for manufacturing semiconductor device and computer-readable recording medium
US-2015307988-A1 · Oct 29, 2015 · US
Apparatus for fabricating flat panel display, and apparatus and method for detecting quantity of static electricity thereof
US-9170441-B2 · Oct 27, 2015 · US
Wafer carrier track
US-9169554-B2 · Oct 27, 2015 · US
Substrate loading in an ald reactor
US-2015299859-A1 · Oct 22, 2015 · US
Substrate processing apparatus, non-transitory computer-readable recording medium thereof and semiconductor manufacturing method by employing thereof
US-2015292082-A1 · Oct 15, 2015 · US
Carbon component and method for manufacturing the same
US-9156743-B2 · Oct 13, 2015 · US
Methods for Discretized Processing and Process Sequence Integration of Regions of a Substrate
US-2015287616-A1 · Oct 8, 2015 · US
Gas supply pipe, and gas treatment equipment
US-2015275369-A1 · Oct 1, 2015 · US
Purge chamber, and substrate-processing apparatus including same
US-2015267291-A1 · Sep 24, 2015 · US
Operating method of vertical heat treatment apparatus, storage medium, and vertical heat treatment apparatus
US-2015267293-A1 · Sep 24, 2015 · US
Removable substrate tray and assembly and reactor including same
US-2015267295-A1 · Sep 24, 2015 · US
Frequently asked questions
Answers are generated from the same data shown on this page.
- What is CPC C23C16/4583?
- CPC C23C16/4583 is the Cooperative Patent Classification code for “the substrate being supported substantially horizontally.”
- How many patents are filed under CPC C23C16/4583 (the substrate being supported substantially horizontally)?
- Our database includes 1,386 publications tagged with this CPC code.
- Is patent activity under CPC C23C16/4583 growing?
- Publication counts under this code: 212 in 2024 vs 205 in 2025 (latest complete years).