Photosensitive composition, cured film and production process thereof, and electronic part

US9541827B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-9541827-B2
Application numberUS-201414166856-A
CountryUS
Kind codeB2
Filing dateJan 29, 2014
Priority dateFeb 21, 2013
Publication dateJan 10, 2017
Grant dateJan 10, 2017

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  1. Title

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  2. Abstract

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  3. Assignees and inventors

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  4. Key dates

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  5. First independent claim

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  6. CPC / IPC classifications

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  7. Citations and related patents

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Abstract

Official abstract text for this publication.

It is an object of the present invention to improve the curability of a resin composition and a photosensitive composition suitably employed to form e.g., a surface protecting film and an interlaminar insulating film of e.g., an electronic part, while reducing the internal stress remaining in a substrate when the composition is used to form a cured film on the substrate. The photosensitive composition includes a resin (A) having a phenolic hydroxyl group, a crosslinking agent (B1) having at least two oxazoline groups and a crosslinking agent (B2) having at least two groups represented by —CH 2 OR (wherein R is a hydrogen atom, an alkyl group having 1 to 10 carbon atoms or an acetyl group) and a photosensitive acid-generating agent (C).

First claim

Opening claim text (preview).

What is claimed is: 1. A photosensitive composition comprising: a resin (A) having a phenolic hydroxyl group; a crosslinking agent (B1) having at least two oxazoline groups; a crosslinking agent (B2) having at least two groups represented by —CH 2 OR, wherein R is a hydrogen atom, an alkyl group having 1 to 10 carbon atoms or an acetyl group; and a photosensitive acid-generating agent (C), wherein a mass ratio of the crosslinking agent (B1) to the crosslinking agent (B2) (B1:B2) is in the range of 1.5:1 to 3:1, and wherein the crosslinking agent (B2) comprises at least one selected from a melamine-based crosslinking agent, a guanamine-based crosslinking agent, a phenol compound having a methylol group, a phenol compound having an alkylmethylol group and a phenol compound having an acetoxymethyl group. 2. The photosensitive composition according to claim 1 , wherein the total of the contents of the crosslinking agent (B1) and of the crosslinking agent (B2) is 50 to 100% by mass based on 100% by mass of the whole of a crosslinking agen (B) contained in the composition. 3. The photosensitive composition according to claim 1 , wherein the crosslinking agent (B1) has two to three oxazoline groups. 4. The photosensitive composition according to claim 1 , wherein the photosensitive acid-generating agent (C) comprises a compound having a quinone diazide group. 5. A resin composition comprising: a resin (A) having a phenolic hydroxyl group; a crosslinking agent (B1) having at least two oxazoline groups; and a crosslinking agent (B2) having at least two groups represented by —CH 2 OR, wherein R is a hydrogen atom, an alkyl group having 1 to 10 carbon atoms or an acetyl group, wherein a mass ratio of the crosslinking agent (B1) to the crosslinking agent (B2) (B1:B2) is in the range of 1.5:1 to 3:1, and wherein the crosslinking agent (B2) comprises at least one selected from a melamine-based crosslinking agent, a guanamine-based crosslinking agent, a phenol compound having a methylol group, a phenol compound having an alkylmethylol group and a phenol compound having an acetoxymethyl group. 6. A cured film obtained from the photosensitive composition according to claim 1 . 7. A process for producing a patterned cured film comprising: applying the photosensitive composition according to claim 1 on a support to form a resin coating film; exposing the resin coating film; developing the resin coating film by using an alkaline developing solution to form a pattern; and heat-curing the pattern to form a patterned cured film. 8. A cured film obtained from the resin composition according to claim 5 . 9. A process for producing a cured film comprising: applying the resin composition according to claim 5 on a support to form a resin coating film; and heat-curing the resin coating film to form a cured film. 10. An electronic part comprising the cured film according to claim 6 . 11. An electronic part comprising the cured film according to claim 8 . 12. The photosensitive composition according to claim 1 , further comprising an adhesion assistant. 13. The resin composition according to claim 5 , further comprising an adhesion assistant.

Assignees

Inventors

Classifications

  • G03F7/0381Primary

    using a combination of a phenolic resin and a polyoxyethylene resin · CPC title

  • C09D125/18Primary

    Homopolymers or copolymers of aromatic monomers containing elements other than carbon and hydrogen · CPC title

  • Condensation products of carbonyl compounds and phenolic compounds, e.g. novolak resins · CPC title

  • Hydrolysis · CPC title

  • Polyamides or polyimides · CPC title

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Frequently asked questions

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What does patent US9541827B2 cover?
It is an object of the present invention to improve the curability of a resin composition and a photosensitive composition suitably employed to form e.g., a surface protecting film and an interlaminar insulating film of e.g., an electronic part, while reducing the internal stress remaining in a substrate when the composition is used to form a cured film on the substrate. The photosensitive comp…
Who is the assignee on this patent?
Jsr Corp
What technology area does this patent fall under?
Primary CPC classification G03F7/0381. Mapped technology areas include Physics.
When was this patent published?
Publication date Tue Jan 10 2017 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 8 related publications on this page (citations in our corpus or others sharing the same primary CPC).