Exposure apparatus and a method for exposing a photosensitive element and a method for preparing a printing form from the photosensitive element

US9529263B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-9529263-B2
Application numberUS-201514922478-A
CountryUS
Kind codeB2
Filing dateOct 26, 2015
Priority dateApr 18, 2013
Publication dateDec 27, 2016
Grant dateDec 27, 2016

How to read this patent

A practical reading order for non-experts. Skip the full description unless you need deep technical detail.

  1. Title

    What the patent document calls the invention.

  2. Abstract

    A short plain-language summary of the technical disclosure.

  3. Assignees and inventors

    Who owns or filed the patent and who is credited as inventor.

  4. Key dates

    Filing, priority, publication, and grant dates set the timeline.

  5. First independent claim

    The legal scope of protection — read this for what is actually claimed.

  6. CPC / IPC classifications

    Technology tags used to group this patent with similar filings.

  7. Citations and related patents

    Prior art links and similar publications in this corpus.

Abstract

Official abstract text for this publication.

The invention pertains to an exposure apparatus, a method for exposing a photosensitive element to radiation using the exposure apparatus, and a method for preparing a printing form from the photosensitive element. The exposure apparatus includes a base assembly having an exposure bed that supports the photosensitive element, and a lamp housing assembly having two or more lamps. The lamp housing assembly includes an air distribution assembly having an air chamber that is disposed adjacent to the lamps and pressurized to provide uniform distribution of air exiting the air chamber to impinge a backside of each of the lamps. The air exiting the chamber and impinging the lamps is controlled by monitoring the temperature of the lamps and/or the irradiance emitting from the lamps.

First claim

Opening claim text (preview).

We claim: 1. A method for preparing a relief printing form from a photosensitive element having a layer of a photopolymerizable composition comprising: (a) imagewise exposing the photosensitive element through a mask to actinic radiation; (b) forming at least a cured portion and at least a uncured portion of the layer; and (c) treating the exposed element to remove the uncured portions thereby forming a relief structure suitable for printing; wherein step (a) is comprised of: exposing the photosensitive element with the actinic radiation from at least two lamps adjacent to each other at a target temperature and at a target irradiance, each lamp having a tubular length and a backside; impinging air on the backside of each of the at least two lamps at a volumetric rate from an air chamber that is adjacent the backside of the at least two lamps and has one or more openings that are aligned to the tubular length for each of the at least two lamps, wherein the air in the chamber is pressurized by at least one blower to uniformly distribute the air exiting each of the one or more openings at a volumetric rate; and controlling the volumetric rate of the air impinging the at least two lamps by selecting from measuring a temperature of at least one of the lamps to provide a measured temperature, and signaling the at least one blower to adjust the air exiting the one or more openings if the measured temperature is different from the target temperature; measuring irradiance of at least one of the lamps to provide a measured irradiance, and signaling the at least one blower to adjust the air exiting the one or more openings if the measured irradiance is different from the target irradiance; or measuring both the temperature of at least one of the lamps to provide a measured temperature and the irradiance of at least one of the lamps, that can be the same or different from the lamp for temperature measurement, to provide a measured irradiance, and signaling the at least one blower to adjust the air exiting the one or more openings if the measure temperature is different from the target temperature and if the measured irradiance is different from the target irradiance. 2. The method of claim 1 , wherein the at least one blower has a frequency that changes to adjust the volumetric rate of the air exiting the one or more openings. 3. The method of claim 1 , further comprising supporting the photosensitive element on an exposure bed parallel to the at least two lamps. 4. The method of claim 1 , wherein the measured temperature is greater than the target temperature, further comprising increasing the volumetric rate of air impinging each of the lamps. 5. The method of claim 1 , wherein the measured irradiance is less than the target irradiance, further comprising increasing the volumetric rate of air impinging each of the lamps. 6. The method of claim 1 , wherein the target temperature is between 30 and 60° C. and the target irradiance is from 17 to 22 milliWatts/cm 2 .

Assignees

Inventors

Classifications

  • characterised by the reflectors, diffusers, light or heat filtering means or anti-reflective means used · CPC title

  • Environment aspects, e.g. pressure of beam-path gas, temperature (pollution aspects G03F7/70916) · CPC title

  • Dose control, i.e. achievement of a desired dose · CPC title

  • Exposure; Apparatus therefor (photographic printing apparatus for making copies G03B27/00) · CPC title

  • Exposure without an original mask, e.g. using a programmed deflection of a point source, by scanning, by drawing with a light beam, using an addressed light or corpuscular source (G03F7/70 takes precedence) · CPC title

Patent family

Related publications grouped by family.

External sources

Frequently asked questions

Answers are generated from the same data shown on this page.

What does patent US9529263B2 cover?
The invention pertains to an exposure apparatus, a method for exposing a photosensitive element to radiation using the exposure apparatus, and a method for preparing a printing form from the photosensitive element. The exposure apparatus includes a base assembly having an exposure bed that supports the photosensitive element, and a lamp housing assembly having two or more lamps. The lamp housin…
Who is the assignee on this patent?
Du Pont
What technology area does this patent fall under?
Primary CPC classification G03F7/201. Mapped technology areas include Physics.
When was this patent published?
Publication date Tue Dec 27 2016 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 8 related publications on this page (citations in our corpus or others sharing the same primary CPC).