Exposure head and exposure device

Patent metadata

Field	Value
Publication number	US-9513563-B2
Application number	US-201414490638-A
Country	US
Kind code	B2
Filing date	Sep 18, 2014
Priority date	Mar 19, 2012
Publication date	Dec 6, 2016
Grant date	Dec 6, 2016

Abstract

An exposure head according to the invention includes: a transparent substrate; a plurality of exposure light sources which is formed in the transparent substrate and emits exposure light; at least one condensing lens which condenses the exposure light from the exposure light sources on the exposure object; an imaging unit which is disposed on the opposite side to the condensing lens with the transparent substrate interposed therebetween and images the exposure object; and a control unit which controls the turning on of the exposure light sources based on image information imaged by the imaging unit. An exposure device according to the invention includes the exposure head according to the invention. By virtue of such a configuration, it is possible to improve alignment precision of the exposure object and to improve exposure precision of the exposure object.

First claim

What is claimed is:

1. An exposure head which exposes an exposure object, comprising:
a transparent substrate;
a plurality of exposure light sources which is formed in the transparent substrate and emits exposure light;
at least one condensing lens which condenses the exposure light from the exposure light sources on the exposure object;
an imaging unit which is disposed on the opposite side to the condensing lens with the transparent substrate interposed therebetween and images the exposure object; and
a control unit which controls the turning on of the exposure light sources based on image information imaged by the imaging unit.

2. The exposure head according to claim 1 ,
wherein the transparent substrate, the exposure light sources, the condensing lens, and the imaging unit are formed integrally with each other.

3. The exposure head according to claim 1 ,
wherein the control unit detects a positional deviation of the exposure object based on the image information imaged by the imaging unit, and determines exposure light sources to be turned on in response to the positional deviation.

4. The exposure head according to claim 1 ,
wherein the exposure light sources include light-emitting diodes, laser diodes, or organic ELs, disposed in an array.

5. The exposure head according to claim 1 ,
wherein the transparent substrate is formed of sapphire.

6. The exposure head according to claim 1 ,
wherein a cooling layer including a coolant is provided between the transparent substrate and the condensing lens.

7. The exposure head according to claim 6 ,
wherein the cooling layer uses an antifreeze as the coolant.

8. The exposure head according to claim 1 ,
wherein mirrors are disposed on the opposite side to the condensing lens with the transparent substrate interposed therebetween and reflects the exposure light from the exposure light sources toward the transparent substrate.

9. An exposure device comprising:
the exposure head according to claim 1 .

10. An exposure device comprising:
the exposure head according to claim 2 .

11. An exposure device comprising:
the exposure head according to claim 3 .

12. An exposure device comprising:
the exposure head according to claim 4 .

13. An exposure device comprising:
the exposure head according to claim 5 .

14. An exposure device comprising:
the exposure head according to claim 6 .

15. An exposure device comprising:
the exposure head according to claim 7 .

16. An exposure device comprising:
the exposure head according to claim 8 .

Assignees

• V Tech Co Ltd

Inventors

• Kajiyama Koichi
• Mizumura Michinobu

Classifications

• G03F7/201 Primary

  characterised by an oblique exposure; characterised by the use of plural sources; characterised by the rotation of the optical device; characterised by a relative movement of the optical device, the light source, the sensitive system or the mask · CPC title

• G03F7/2041

  in the presence of a fluid, e.g. immersion; using fluid cooling means · CPC title

• G03F7/70891

  Temperature · CPC title

• G03F7/70191 Primary

  Optical correction elements, filters or phase plates for controlling intensity, wavelength, polarisation, phase or the like · CPC title

• G03F7/70341

  Details of immersion lithography aspects, e.g. exposure media or control of immersion liquid supply (chemical composition of immersion liquids G03F7/2041) · CPC title